電鏡表面積 的英文怎麼說

中文拼音 [diànjìngbiǎomiànjī]
電鏡表面積 英文
electron microscope surface area
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 鏡 : Ⅰ名詞1 （鏡子） looking glass; mirror 2 （幫助視力或做光學實驗的器具） lens; glass 3 （姓氏） a s...
  • 表 : Ⅰ名詞1 （外面;外表） outside; surface; external 2 （中表親戚） the relationship between the child...
  • 面 : Ⅰ名詞1 （頭的前部; 臉） face 2 （物體的表面） surface; top 3 （外露的一層或正面） outside; the ri...
  • 積 : Ⅰ動詞（積累） amass; store up; accumulate Ⅱ形容詞（長時間積累下來的） long standing; long pending...
  • 表面積 : superficial area
  • 表面 : surface; superficies; boundary; face; rind; sheet; skin; outside; appearance
  1. Scanning electron microcopy images show that metal nickel or cobalt are uniformly deposited on the surface of carbon nanotubes

    掃描電鏡結果表明金屬鎳、鉆沉積在碳納米管表面上。
  2. The photograph of sem showed that its surface have homogenously coated with nickel, although the hollow glass beads were crashed by agitation and heating. after pretreatment and nickel plating, the dispersity of mica powders evidently improved and the infrared emissivity decreased from 0. 85 to 0. 43, and has certain wave absorbability of radar

    對雲母的化學鍍鎳工藝研究中，發現經過預處理后雲母表面獲得了鎳層，通過掃描電鏡分析，鍍鎳后雲母的分散性提高，表面狀態發生了較大的變化，法向積分發射率顯著降低，由0 . 85降低為0 . 43 。
  3. Incremental length diffraction coefficients ( ildc ) is adopted to calculate the contribution of edge diffraction. in order to improve the accuracy of calculation, multi - scattering is discussed, based on the two former contributions and ray - tracing method. geometrical optics ( go ) and physical optics ( po ) are used to calculate the multi - reflection between facets and facets

    對于鏡面反射採用物理光學法計算其散射貢獻，結合基於面元的目標模型的表示，採用離散的積分形式，將面電流積分化簡為線積分，簡化計算復雜度；對于邊緣繞射，運用增量長度繞射系數理論計算目標邊緣繞射場；在多次反射中，則以光線跟蹤方法為基礎，採用幾何光學、物理光學相結合的方法分析考慮多次散射場。
  4. The results under scanning electron microscope were that the compound eye of miers is semi - globular. the surface area of the compound eyes is about 25. 12mm2. the ommatidia that form the compound eye are hexagon. on the back of the compound eye there is a thumb - shaped area where have no ommatidia

    掃描電鏡觀察顯示三疣梭子蟹的復眼外形為半球形，復眼表面積約為25 . 12mm ~ 2 ，背面有一拇指狀的無眼區，組成復眼的小眼為長六邊形；刀額新對蝦的復眼外形為球形，背面無拇指狀的無眼區，組成復眼的小眼為四邊形。
  5. Using the microwave selective heating property for materials, by setup equivalent equation, and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd, three temperature distribution modes were established, including temperature distribution comprehensive mode of inhomogeneous plasma, temperature distribution composite mode of composite substrate materials, temperature distribution perturbation mode of composite materials, which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate. and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter. as an important part, this thesis researched the nucleation and growth of diamond films in mpcvd, systematically researched the effects of substrate pretreatment, methane concentration, deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd, characterized the films qualities in laser raman spectra ( raman ), x - ray diffraction ( xrd ), scanning electron microscopy ( sem ), infrared transmission spectra ( ir ), atomic force microscopy ( afm ), determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system

    該系統可通過沉積參數的精確控制，以控制沉積過程，減少金剛石膜生長過程中的缺陷，並採用光纖光譜儀檢測分析等離子體的可見光光譜以監測微波等離體化學氣相沉積過程；利用微波對材料的選擇加熱特性，通過構造等效方程，並首次將電磁場攝動理論引入到mpcvd的基片加熱材料的設計中，建立了非均勻等離子體溫度場綜合模型、復合介質基片材料的復合溫度場模型及復合介質材料溫度場攝動模型，為mpcvd的基片加熱系統設計提供了一條全新的技術路線以指導基片加熱材料的制備，並對基片加熱材料進行了設計和優選，以獲取大面積均勻的溫度場區，甚至獲得大於基片臺尺寸的均勻溫度區；作為研究重點之一，開展了微波等離體化學氣相沉積金剛石的成核與生長研究，系統地研究了在（ 100 ）單晶硅基片上mpcvd沉積金剛石膜的實驗過程中，基片預處理、甲烷濃度、沉積氣壓、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響，分別用raman光譜、 x射線衍射（ xrd ） 、掃描電鏡（ sem ） 、紅外透射光譜（ ir ） 、原子力顯微鏡（ afm ）對薄膜進行了表徵，確立了該系統上mpcvd金剛石膜的最佳的實驗工藝參數。
  6. Furthermore, in vitro studies including x - ray powder diffraction ( xrd ), scanning electron microscopy ( sem ), surface area analysis ( bet ), and dissolution were performed to determine differences between low potency ( completely miscible ) and high potency ( partially miscible ) compositions

    此外，通過粉末x -射線衍射（ xrd ） ，電子顯微鏡掃描檢查，表面積分析（ bet ）和溶出度等體外實驗來確定低效（完全混合）和高效（部分混合）組分間的差異。
  7. It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography

    在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造，高分辨、大面積光柵和網格製造，在抗蝕劑性能測試、面形測量和計量等領域，干涉光刻技術都具有廣闊的應用前景。
  8. The relationship between sputtering conditions and the depositional speed shows : with working pressure 1. 2 pa, sputtering power 180w, the depositional speed of tio2 thin film is 40nm / h, and increases with the increasing of sputtering power. it can be also founded that the depositional speed is nearly proportional to the working pressure : within the range of 0. 3pa to 1. 6pa, the depositional speed increases linearly with the increase of ar pressure. with the enhancement of the substrate ' s temperature of sputtering or annealing, the resulted thin films show a tendency of decreasing in thickness, and increasing in refractivity

    本實驗是採用磁控濺射方法，在不同的溫度下制備了tio _ 2薄膜，並對薄膜進行了不同溫度和時間的退火處理，通過原子力顯微鏡（ afm ） 、 x射線衍射（ xrd ） 、掃描電鏡（ sem ）等檢測手段對薄膜的表面形貌和組成結構進行了分析，結果如下： （ 1 ）濺射工藝條件與薄膜沉積速度的關系表明：採用1 . 2pa工作氣壓， 180w的射頻功率tio _ 2薄膜的沉積速率為40nm h ，並隨射頻功率的增加而提高，呈近似的線性關系，在0 . 3pa 1 . 6pa氣壓范圍中，氬氣壓強升高沉積速率迅速增加，濺射溫度提高和退火處理能使薄膜的厚度減小和折射率提高。
  9. The results of eds spectra, atomic images and high - magnification tem images reveal that nickel has been deposited on the surface of silicon carbide nanoparticles and the deposited nickel and silicon carbide are bound tightly

    透射電鏡、能量散射分析以及原子像顯示金屬鎳沉積在a一sic納米粒子的表面上，且它們結合得很緊密。
  10. In addtion, the growth rate of low temperature insb buffer layer was 0. 26 m / h, which was obtained by rheed intensity oscillation curves. growth temperature of insb epilayers were investigated with sem and dcxrd, and it was found that the optimum temperature was 440. a 2. 1 m insb layer grown at 440 had an x - ray rocking curve of 412 arcsec, the strain relaxtion was about 99. 02 %

    通過掃描電鏡形貌觀察與能譜分析發現:溫度較低時sb的表面遷移率低，容易在表面堆積;結合x射線雙晶衍射分析，確定高溫insb外延生長的最佳襯底溫度為440 ，該溫度下生長2 . 1 m的樣品x射線半高峰寬為412 ，應變弛豫99 . 02 % 。
  11. Based on the experiment and analysis, the optimum conditions for preparation of si02 films have been studied. furthermore, using the inverse designing idea of fgms, fe / mo and mo / sio2 fgms have been successfully prepared. finally, the composition and microstructure of the materials have been measured by x - ray debey powder diffraction ( xrd ), x - ray photoelectron spectroscopy ( xps ), scanning electon microscope ( sem ), step instrument and metallgical microscope

    在系統實驗的基礎上探討sio _ 2薄膜沉積工藝條件及其影響因素，獲取了sio _ 2薄膜的最佳工藝條件；採用功能梯度材料（ fgm ）的逆設計思想，在最佳沉積條件的基礎上成功制備出fe mo和mo sio _ 2功能梯度材料，並以x射線衍射， x射線光電子能譜，電鏡掃描，膜臺階儀，金相顯微鏡等手段對材料進行成分測定和表面形態結構分析。
  12. Surface morphology and composition of the a1 film were characterized with field emission scanning electron microscopy ( fesem ) and energy dispersive spectroscopy ( eds ) to optimize a1 film growth conditions

    利用場發射掃描電鏡（ fesem ）及能量散射譜（ eds ）分析儀對沉積的鋁層進行了表面形貌的表徵和化學組分的分析。
  13. Carbon nanofibers, well - aligned carbon nanorods and alignend carbon nanotubes could be synthesized on the porous aao template with catalysts by chemical vapor deposition method. the morphology of co and fe - co alloys deposited in the template and the microstructure of the carbon nanostructures synthesized on the template were systematically investigated by means of sem, tem, eds and raman spectrum

    採用掃描電子顯微鏡（ sem ） 、透射電子顯微鏡（ tem ） 、能譜儀（ eds ）和喇曼光譜（ raman ）等對在多孔aao模板上電沉積得到的co和fe ? co合金催化劑的表面形貌以及在多孔aao模板上制備得到的碳納米結構進行了系統的觀察分析。
  14. The surface morphology and root - mean - square surface roughness of the sio _ 2 films are characterized by scanning electron microscopy ( sem ) and atomic force microscopy ( afm ). the compositional properties of the sio _ 2 films are analyzed by x - ray photoelectron spectroscopy ( xps ). the effects of experiment parameters are discussed

    對採用不同實驗參數沉積得到的硅基sio _ 2光波導薄膜材料，用掃描電子顯微鏡（ sem ） 、原子力顯微鏡（ afm ） 、 x射線光電子能譜（ xps ）等方法對材料的表面形貌、粗糙度以及化學組成等特徵進行了研究。
  15. Coating cracks and defects are main reasons for the limited oxidation resistance of sic - c / sic. in this thesis, surface modification of sic coating was carried out with physical vapor deposition ( pvd ) and ion implantation & deposition, using al, b and si. effects of the modified coatings on the oxidation resistance of sic - c / sic were studied with sem, xrd and aes and so on

    本文採用了物理氣相沉積方法和離子注入沉積方法，以al 、 b 、 si為改性元素，對sic塗層表面進行改性，封填裂紋和缺陷；結合掃描電鏡（ sem ） 、 x射線衍射（ xrd ）和俄歇能譜（ aes ）分析，研究了改性層對sic - c sic復合材料抗氧化性能的影響。
  16. The hydroxyl - terminated and carboxyl - terminated pu - prepolymer were prepared and cured respectively with pf. the molecule structures of two composite systems were characterized by means of ft - ir, and cured - sample morphologies were analyzed by sem. by means of the measurement of properties of pf, impact strength, volume shrinkage and thermal stability of pf / pu composite, effect of pu on pf has been investigated and the toughening differentials have been compared, then two kinds of toughening mechanisms have been discussed

    文中利用紅外光譜對pf / pu共混物的分子結構進行了定性分析，利用掃描電鏡對共混物沖擊斷面形貌進行了表徵、用簡支梁沖擊試驗機按國標測試pf / pu共混物的沖擊強度，並按國標測試共混物體積收縮率，最後利用熱重分析對pf / pu共混物的熱穩定性進行測試。
  17. Scanning electric microscope ( sem ) photographs were used to examine the structure of surface soil experienced a rainstorm, for the purpose of understanding the mechanism of soil crusting. it approved that soil crusting consists of depositional crust and structural crust. the curves of infiltration with time revealed four stages of crust formation

    用電子掃描顯微鏡（ sem ）照片對比了土壤表面結構，分析了土壤的結皮機理，可以認為土壤結皮是由結構結皮和沉積結皮構成，入滲量與時間的歷時曲線反映了結皮的四個形成過程。
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