電阻加熱退火 的英文怎麼說

中文拼音 [diànjiātuìhuǒ]
電阻加熱退火 英文
resistance annealing
  • : Ⅰ名詞1 (有電荷存在和電荷變化的現象) electricity 2 (電報) telegram; cable Ⅱ動詞1 (觸電) give...
  • : 動詞(阻擋; 阻礙) block; hinder; impede; obstruct
  • 退 : 動詞1 (向後移動) retreat; draw back; move back 2 (使向後移動) cause to move back; remove; wit...
  • : fire
  • 電阻 : (物質阻礙電流通過的性質) resistance; electric resistance (電路中兩點間在一定壓力下決定電流強度...
  • 退火 : [冶金學] anneal; annealing; back-out
  1. The resistivity of the films drops compared with the as - grown films, but the temperature of maximum magnetoresistance reaches 287k, very close to the room temperature. therefore it is not only an important improvement to fabricate the cmr bolometer which can work near room temperature, but also a prospective research for other applications such as magnetic - sensors, spintronics devices and infrared detectors

    同時,退后薄膜的率明顯下降,外5t磁場時,最大磁率溫度點上升到287k ,接近於室溫,這不僅為製作室溫超巨磁測輻射儀打下了堅實的基礎,也為其它許多器件的應用提供了可能。
  2. Besides, scan rate and cycle period also affect the result ; co - deposition of dualistic oxide is a focus of research, as an element in the same group, ir is selected. deposition rate of composition is decreased by the adding of ir composition, and when the proportion of ir exceeded 50 %, composition procession can be ceased. but cooperation of ir and ru oxide can highly increase the specific capacitance of active material ; annealing treatment under a certain temperature can help to change the hydrate ru composition into mixture state ru oxide, accordingly increase the stabilization of active material

    研究表明:解液的配製過程中,氯化釕濃度、溶液ph值、陳化時間、溶液溫度對鍍效果均有影響,其中溶液ph值是最主要的影響因素;在儀器的使用條件探索中,理論結合實驗確定了本鍍液體系循環伏安勢窗的理想范圍,並發現循環伏安掃描速度和掃描周期對鍍結果也有較大影響;混合氧化物的共沉澱是目前研究點,在此選用與釕同一族的銥作為共沉澱元素,銥的入會礙氧化物的沉積速度,銥的比例超過50 %會使沉積作用停止,但是二元氧化物的協同作用使沉積的活性物質比容量大大提高;一定溫度下退后處理作用會使水合釕化物轉變成混合價態的氧化釕,從而提高活性物質的穩定性。
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