靶電極 的英文怎麼說

中文拼音 [bǎdiànjí]
靶電極 英文
target electrode
  • 靶 : 1. （射擊的目標） target 2. （轡革; 韁繩） bridle; halter; reins
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 極 : i 名詞1 （頂點; 盡頭） the utmost point; extreme 2 （地球的南北兩端; 磁體的兩端; 電源或電器上電流...
  • 電極 : electrode; pole
  1. This article studies on a novel method about detector calibration and monochromator calibration by using silicon pin photodiode. the detector and the monochromator of one spectrum measurement system had been calibrated using the method, and the spectrum distribution of one laser - produced plasmas ( lpp ) source with jet gas target was measured. the use of a specific combination of the silicon photodiode and multiplayer reflect films is the notable character in monochromator calibration

    本文研究了一種利用光電二極體傳遞標準探測器標定普通探測器和單色儀系統的方法，實際標定了所用的探測器和單色儀系統，測得了噴氣靶激光等離子體光源的相對光譜分佈，設計出絕對光譜分佈的測量方法，並且利用labview的g語言及相應的數據採集卡等硬體設備構造出一套智能化、高效率的測量系統，完成了多層膜反射率測量工作。
  2. The results of simulations are : i ) energies of the incident ions to the target are determined mainly by the voltage across the cathode sheath, with a majority of ions " energy vary around the sheath voltage ; ions nearly normally bombard the target ; ions mainly locate above the sputtering holes because of the influence of the magnetic field, and the incident ions mainly come from the region ; the ions undergo several collisions during transportation, but that do n ' t matter much

    主要模擬結果有： ? ）入射離子到達靶面時的能量主要受到了射頻輝光放電中陰極殼層西北工業大學碩士學位論文李陽平電壓的影響，大部分離子的入射能量在陰極殼層電壓值附近，離子濺射時接近於垂直入射;射頻輝光放電受到陰極磁場的影響，等離子體中的離子主要集中在靶面濺射坑的上方，且入射離子主要來自這個區域;入射離子在輸運過程中和背景氣體分子有少量的碰撞，但影響不太大。
  3. Aluminum alloy films and sputtering targets for semiconductor integrated circuit wiring and electrodes

    集成電路電極布線用鋁合金薄膜及其濺射靶材
  4. Uniform and compact plzt and sno _ 2 ceramic targets, which diameter were 212mm and 221mm, respectively, had been successfully fabricated. ( 2 ) a rotating magnetic field rf magnetron sputtering system had been designed and set up, which showed high utilization efficiency of target, high films uniformity, and high deposition rate, etc. ( 3 ) the plzt and sno _ 2 thin films were investigated by afm, xrd, sem, and spectral photometer. the optimized processing parameters of preparing these films had been found

    並以此為基礎分別制備了緻密、均勻、平整、直徑為212mm的plzt和221mm的sno _ 2陶瓷濺射靶材; （ 2 ）為克服現有磁控濺射設備的不足，提出了一種新的磁控濺射方案，採用該方案的設備具有:靶材利用率高、鍍膜均勻、成膜速度快等特點; （ 3 ）運用afm 、 xrd 、 sem以及雙光路分光光度計等分析手段對plzt和sno _ 2薄膜的微結構和性能進行研究，找到了制備plzt電光薄膜和sno2透明電極材料的最佳工藝條件。
  5. Many measures were adopted to decrease bombard in order to improve the solar cells propertivity, such as decreasing target voltage, increasing target distance, accelerating the movement of the substrate. by optimizing the experimental conditions, short - circuit current was increased by 3. 7ma / cm2, the conversion efficiency was increased by 2 %, the stability was improved

    在硅薄膜電池的zno ： al al背反射電極應用方面，通過減小靶電壓、適當增加靶距和基片的運行速度來減小對電池的轟擊，改善電池性能，通過優化實驗條件，使電池的短路電流提升了3 . 7ma cm ~ 2 ，效率增加了2 ，穩定性得到改善。
  6. Main products are w crucible, w electrode, w tube, w target, applying to rare earth metal extracting quartz glass. x - rary tuck. we can and shape according to users request

    主要產品有鎢坩堝、鎢電極、鎢筒、鎢靶、適用於稀土冶煉、石英玻璃行業、 x光管等，也可根據客戶要求，製作不同規格，形狀的鎢製品。
  7. In the work, mid - frequency pulse magnetron sputtering is used to prepare znoral thin films used as the back reflector of the thin silicon films solar cells. the best techological condition was obtained by optimizing the preparing conditions, ( var is decided by the deposition rate, target voltage : 265v, gas pressure : 0. 6pa, the high base vacuum is expected

    本文採用中頻脈沖磁控濺射法，通過優化zno ： al薄膜的制備工藝，如靶電壓、本底真空度、工作氣壓、襯底溫度、 o _ 2 ar ，得到可用於硅薄膜太陽能電池背電極的zno ： al薄膜。
  8. The shg was found in as - prepared films and the intensity of film with 20 % se was bigger then that of 10 % se films. this phenomenon indicated that the film had been poled during the fabrication, due to the influence of electric field and magnetic field

    結果表明薄膜的制備方法影響了薄膜的微觀結構，磁控濺射過程中，電場和磁場影響了靶材原子的沉積，使玻璃薄膜中的電偶極子在一定程度上得到了定向排布，使薄膜呈現出顯著的二階非線性效應。
  9. As the partial pressure of o2 increases the cathode voltage of the target increases in order to maintain the same current intensity and the sedimentation rate gradually decreases

    氧氣分壓的增大，維持同樣濺射電流強度的靶陰極電壓增大，薄膜的沉積速率逐漸減小。
  10. He then made a series of action films which are considered his best and are representative of locally produced works. mr. woo made his way to hollywood in 1993 and, with perseverance, succeeded in adapting himself to the american system of film - making. he produced blockbusters like

    九三年，吳先生進軍荷里活，拍制《終極標靶》 ，初時在工作上面對不少限制，但他鍥而不舍，適應荷里活的電影製作方式，繼而拍制多部動作片如《奪面雙雄》及
  11. Secondly, basing on the theory of on - off gain of small signal, the raman gain coefficient for frequency shift between 0. 5 and 20 thz of standard sigle mode optical fiber is measured by pump - probe method through a super luminescent diode ( sld ) as a broadband small signal probe source. thirdly, numerical simulation analysis of gain characteristic of raman fiber amplifier for c band wdm signal light is made according to the raman gain coefficient of the fiber measured before through target and four rank runge - kutta method. at the invariability of wavelength and maximum power of each of two pumps, schematic of powers of two pumps for best flatness on c band wdm optical gain was found out, at the same time, the factors of resulting in gain saturation is analyzed, too

    本文首先應用經典的電磁理論對拉曼光纖放大器的工作機制進行了分析，然後，根據小信號理論推導出的開關增益求出了光纖拉曼增益系數的表達式，採用泵浦-探測波的方法，利用超輻射激光二極體（ superluminescentdiode簡稱sld ）作為探測光源，測量了所用標準單模光纖頻移為0 . 5 - 20thz的拉曼增益系數，之後根據所測得的光纖的拉曼增益系數譜對應用該類光纖構成的放大c波段wdm光信號的拉曼光纖放大器的增益特性採用打靶法和四階龍格- - -庫塔進行了數值計算，在給定了兩個泵浦光源的波長和最大功率后，找出了反向泵浦情況下使c波段wdm光源增益最平坦的兩個泵浦的各自最佳功率，同時也分析了導致信號光飽和的原因。
  12. The main purpose of this article - is to simulate the whole process of the generation and transportation of the vapor phase particles of the film in rf magnetron sputtering, which contains transportation of ions in rf glow discharge, sputtering of target and transportation of sputtered atoms, via models that are established on the basis of the physics of sheath theory for the rf magnetron glow discharge, sputtering theory and transportation theory

    本論文對射頻磁控濺射中入射離子的產生和輸運、離子對靶材的濺射、濺射原子的輸運過程進行了綜合考慮，根據射頻輝光放電的陰極殼層理論、粒子的輸運理論、離子對靶材的濺射理論建立模型，進行了計算機模擬。
  13. Ways to improve the response speed of phototransistors and the design of the hardware and software of system will be discussed in great details

    詳細說明了在設計光電靶時，應如何提高光敏三極體的響應速度以適應系統的需要以及系統硬、軟體的設計思想和實現原理。
  14. Because computing exactitude contrail is completed after the event by shooting range photic measure equipment, better quality track record to image collected by photoelectricity sensor become a very important work it exists the problem of data transmission rate low in the process of storing data to hd from high frame frequency and great array ccd camera

    由於靶場光測設備對目標精確軌跡計算的工作要在事後完成，因此對光電傳感器採集到的圖像數據高質量記錄就成為一項極其重要的工作。從電視測量系統的高幀頻、大陣列的數字ccd像機採集並存儲數據到硬盤的過程中，存在數據傳輸速率低不能滿足要求的問題。
  15. At last an experiment x - ray source equipment was constructed using cnts as cathode. the field emission of cnts was measured and cu " ka spectrum was detected. those implied that practical miniature x - ray source could be accomplished

    為了驗證場發射陰極x射線源的可行性，實驗上以碳納米材料為陰極，測得了其場發射電流曲線和銅靶的k _譜線，表明完全可以採用碳納米管製造微型x光源。
分享友人
分享到 Line

分享到臉書