顯微鏡高分辨 的英文怎麼說

中文拼音 [xiǎnwéijìnggāofēnbān]
顯微鏡高分辨 英文
high resolution
  • 顯 : Ⅰ形容詞1 （明顯） apparent; obvious; noticeable; evident 2 （有名聲有權勢的） illustrious and inf...
  • 鏡 : Ⅰ名詞1 （鏡子） looking glass; mirror 2 （幫助視力或做光學實驗的器具） lens; glass 3 （姓氏） a s...
  • 高 : Ⅰ形容詞1 （從下向上距離大; 離地面遠） tall; high 2 （在一般標準或平均程度之上; 等級在上的） above...
  • 分 : 分Ⅰ名詞1. （成分） component 2. （職責和權利的限度） what is within one's duty or rights Ⅱ同 「份」Ⅲ動詞[書面語] （料想） judge
  • 辨 : Ⅰ動詞（辨別; 分辨; 明察） distinguish; discriminate; differentiate; recognize Ⅱ名詞（姓氏） a surname
  • 顯微鏡 : microscope
  • 顯微 : microadiography
  1. Though, the lateral resolution of cm has been enhanced to be 1. 4 times of that of a conventional optical microscope under the same aperture focus ratio, it is still two orders of magnitude lower than the axial resolution of itself. so, it is urgent to further improve the lateral resolution of cm

    然而，盡管共焦顯微鏡的橫向分辨力已提高到相同孔焦比的普通光學顯微鏡的1 . 4倍，但與其本身的軸向分辨力相比，橫向分辨力仍低2個數量級，因此進一步改善共焦顯微鏡橫向分辨力的研究顯得尤為迫切。
  2. High resolution electron microscope

    高分辨電子顯微鏡
  3. No5 ： image processing based on the combination of high - resolution electron microscopy and electron diffraction ( invited paper ), f. h. li, microscopy research and technique, 40 ( 1998 ) 86 - 100

    場發射高分辨電子顯微鏡在揭示原子解析度晶體缺陷上的應用（特邀論文） ，李方華，科儀新知， 21 （ 1999 ） 8 - 15
  4. No3 : revealing crystal defects at atomic level by field - emmission hrem ( invited lecture ), f. h. li, proceedings 7th asia - pacific electron microscopy conference, singapore, june24 - 30, 2000, pp. 26 - 27

    場發射高分辨電子顯微鏡在揭示原子解析度晶體缺陷上的應用（特邀論文） ，李方華，科儀新知， 21 （ 1999 ） 8 - 15
  5. This research has studied the microstructure of cathode materials systematically by the means of high resolution transmission electron microscopy and scanning electron microscopy, surveyed the electron emission performance of la2o3, - mo, la2o3 - y2o3 - mo, la2o3 - sc2c > 3 - mo cathode with the self - designed electron emission surveyor and analyzed the elements changing of the surface of mo - la2o3 - sc2c > 3 cathode in - situ. while it was heated to different temperature. at last, the relationship of the microstructure of cathode, diffusion of active matter and electron emission performances has been discussed

    本研究採用高分辨掃描電鏡、透射電鏡對稀土鉬鎢陰極材料的顯微結構進行了系統研究；利用本課題研究組設計研製的電子發射測量儀對la2o3 - mo ， la2o3 - sc2o3 - mo ， la2o3 ? y2o3 - mo三種陰極（以下稱鑭?鉬陰極、鑭鈧?鉬陰極、鑭釔?鉬陰極）的發射性能進行了測量；利用經改造后的俄歇電子能譜儀「原位」分析了發射性能較好的鑭鈧鉬陰極在不同溫度下表面活性元素的變化情況。
  6. In modern imaging and measurement field, neither the near field optical microscope nor the conventional far field optical microscope is able to meet the technical need of large scale and high spatial resolution

    近場光學顯微鏡和傳統的遠場光學顯微鏡都已無法滿足現代成像檢測對大范圍、高空間分辨能力的技術要求。
  7. More recent studies show nanowires products with narrow dismeter distribution around 5 - 10mn and lengths ranging from several hundred nanometers to several micrometers can be obtained if the mixture solution of naoh and koh was replaced by koh solution. the nanowires were analyzed by a range of methods including powder x - ray diffraction ( xrd ), high resolution electron microscopy ( hrem ), selected area electron diffraction ( saed ), electron energy loss spectroscopy ( eels ), xrd and hrem image simulations. the structure of nanowires is determinded to be of the type of k2ti6oi3

    利用x射線衍射（ xri ） ） 、高分辨電子顯微鏡（ hrtem ） 、選區電子衍射（ saed ） 、電子能量損失譜（ eels ）以及x射線衍射和高分辨像模擬等分析測試手段，初步分析了這種納米線的生長機理，探討了她的結構和光學性能，實驗結果顯示這種納米線具有kzti6o ; 3的結構，紫外一可見光吸收光譜顯示， kzti6ol3納米線禁帶寬度約為3 . 45ev 。
  8. It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography

    在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造，高分辨、大面積光柵和網格製造，在抗蝕劑性能測試、面形測量和計量等領域，干涉光刻技術都具有廣闊的應用前景。
  9. The morphology and structure of ti - dlc films were investigated by high resolution electron microscopy ( hrem ), atomic force microscopy ( afm ), scanning electron microscopy ( sem ) and raman spectroscopy. the mechanical properties were investigated by a mts nano indenter xp system with a berkovich indenter. the ti - dlc film with a titanium content of 27at. %

    利用高分辨電子顯微鏡（ hrem ） 、原子力顯微鏡（ afm ） 、掃描電鏡（ sem ）和拉曼光譜儀等手段分析了沉積ti - dlc薄膜的成分、形貌和結構，使用帶berkovich壓頭的納米壓痕儀（ mtsnanoindenterxp ）測試了薄膜的力學性能。
  10. Confocal microscope ( cm ), with a higher resolution capability and 3d optical sectioning property, can implement sample detection with large scale and no damnification

    共焦顯微鏡，憑借其較高的分辨能力和三維光學層析特性，可實現樣品大范圍、無損傷探測。
  11. Consisted mainly of amorphous phase. hrem images showed that the ti - dlc film had a lamellar structure. the tic phase with a size of 5 nm was located at the titanium - rich regions surrounded by amorphous carbon structures in the ti - dlc film

    Ti - dlc膜的結構主要為非晶相，高分辨電子顯微鏡分析（ hrem ）表明ti - dlc膜成層狀分佈，膜內存在著富ti區和貧ti區， tic顆粒尺寸大約為5nm 。
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