高密度靶 的英文怎麼說
中文拼音 [gāomìdùbǎ]
高密度靶
英文
high density target- 高 : Ⅰ形容詞1 (從下向上距離大; 離地面遠) tall; high 2 (在一般標準或平均程度之上; 等級在上的) above...
- 密 : Ⅰ名詞1 (秘密) secret 2 [紡織] (密度) density 3 (姓氏) a surname Ⅱ形容詞1 (距離近; 空隙小)...
- 度 : 度動詞[書面語] (推測; 估計) surmise; estimate
- 靶 : 1. (射擊的目標) target 2. (轡革; 韁繩) bridle; halter; reins
- 高密度 : high density高密度存儲(器) high-density storage; 高密度組裝 high-density assembly
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Some tendency of tn5gusa5 transposition were found that all preferred sites of tn5gusa5 in xcc 8004 genomic dna are in at - rich regions ; target sequences of tn5gusa5 have some features that the probabilities of guanine and cytosine are high respectively at the head and tail base of target sequence ; the level of gene transcription does not influence insertion density of tn5gusa5 significantly
結果表明, tn5gusa5插入位點有一定的規律性: tn5gusa5在xcc8004基因組上傾向于插入低gc含量( 50左右的區域插入密度最高)區段;插入位點的靶序列有一定的特異性,在靶序列的首位鳥嘌呤出現的幾率高,而在靶序列的末位胞嘧啶出現幾率高; tn5gusa5的插入密度與該區段基因的轉錄水平無明顯關系。In the hipib film deposition, high purity graphite was employed as target. relations between process parameters and the microstructure, as well as different physical properties of diamond - like carbon ( dlc ) film deposited by hipib ablated plasma were studied by adjusting the distance between target and substrate, which affects the intensity and ion energy of hipib ablated plasma, and the temperature of substrate in the film deposition processes. the mechanism of film deposition by hipib ablated plasma was explored also
在薄膜沉積方面,利用高純石墨作靶材,調整薄膜沉積過程中的靶基距(燒蝕等離子體密度、離子能量)和基片溫度,研究實驗工藝對hipib燒蝕等離子體方法制備的dlc薄膜的微觀結構和宏觀物理性能的影響,探討了hipib燒蝕等離子體沉積dlc薄膜的成膜機理。Lipid target : ldl, non ? high - density lipoprotein cholesterol, or hdl
調脂治療的靶點: ldl 、非高密度脂蛋白膽固醇,還是hdl ?In order to make the theoretical calculation feasible, we first obtain an analytical formalism of partial integrals with respect to the coordinates of the core and target in the phase - shift functions and their cross terms of scattering matrix elements, if the density distributions of the core and target are fitted to a few gaussian forms. then the rest multidimensional integrals with respect to the impact parameter and coordinates of halo nucleons are performed by a monte carlo method
為使理論計算變得可行,我們在核芯和靶核密度採用多個高斯分佈擬合的情況下,解析求解了各個散射矩陣元中的光學相移函數及交叉項含有的與暈核核芯、靶核密度分佈有關的積分;同時對與碰撞參數和暈核子坐標有關的積分(八重以上,並且積分維數隨暈核子數很快增加)採用蒙特卡洛方法計算。Uniform and compact plzt and sno _ 2 ceramic targets, which diameter were 212mm and 221mm, respectively, had been successfully fabricated. ( 2 ) a rotating magnetic field rf magnetron sputtering system had been designed and set up, which showed high utilization efficiency of target, high films uniformity, and high deposition rate, etc. ( 3 ) the plzt and sno _ 2 thin films were investigated by afm, xrd, sem, and spectral photometer. the optimized processing parameters of preparing these films had been found
並以此為基礎分別制備了緻密、均勻、平整、直徑為212mm的plzt和221mm的sno _ 2陶瓷濺射靶材; ( 2 )為克服現有磁控濺射設備的不足,提出了一種新的磁控濺射方案,採用該方案的設備具有:靶材利用率高、鍍膜均勻、成膜速度快等特點; ( 3 )運用afm 、 xrd 、 sem以及雙光路分光光度計等分析手段對plzt和sno _ 2薄膜的微結構和性能進行研究,找到了制備plzt電光薄膜和sno2透明電極材料的最佳工藝條件。The density of this target was 5. 21 g / cm3, which was 94 % of the theoretic density of the licoo _ 2 。 in cold pressing and sintering process different percentage of binder were added to the target and the best percentage was found
其中使用碳化硅模具,制備出純度和密度較高的熱壓靶材,靶材密度為5 . 21g / cm3 ,達到licoo _ 2理論密度的94 % 。分享友人