高頻等離子體 的英文怎麼說

中文拼音 [gāobīnděnglízitǐ]
高頻等離子體 英文
high-frequency piston
  • 高 : Ⅰ形容詞1 （從下向上距離大; 離地面遠） tall; high 2 （在一般標準或平均程度之上; 等級在上的） above...
  • 頻 : Ⅰ形容詞（次數多） frequent Ⅱ副詞（屢次） frequently; repeatedly Ⅲ名詞1 [物理學] （物體每秒鐘振動...
  • 等 : Ⅰ量詞1 （等級） class; grade; rank 2 （種; 類） kind; sort; type Ⅱ形容詞（程度或數量上相同） equa...
  • 離 : Ⅰ動詞1 （離開） leave; part from; be away from; separate 2 （背離） go against 3 （缺少） dispens...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 體 : 體構詞成分。
  • 高頻 : high frequency
  • 離子 : [物理學] ion
  1. Determination of cao, mgo, sio2, fe2o3, tio2 in alundum powder by icp - aes

    剛玉粉中氧化鈣氧化鎂二氧化硅三氧化二鐵二氧化鈦的電感耦合高頻等離子體發射光譜法測定
  2. Some by - products of this work can be used as routine tools in the uv laser laboratory. commercial video ccd cameras are used to image uv laser and soft x rays, window glass as a fluorescer is used to indirectly measure the uv laser beam profile with high energy density, and a special glass which permits uv light to pass through while absorbs the visible, is introduced into the uv beam profiling in strong visible stray light environment

    實驗中發展了一些測量技術，例如用可見光視頻ccd直接測量紫外激光的光束分佈和激光等離子體產生的x光二維圖象，利用窗玻璃作為熒光體測量能量密度較高的紫外光束分佈，利用可見吸收紫外透射玻璃製成的衰減器測量有嚴重背景光的紫外光束分佈，可以作為實驗室的常規測量工具，並有一定的推廣價值。
  3. During ion source operating, alternating axial magnetic field and azimuthal electric field in discharge tube ionize hydrogen gas purified by hot palladium pipe, and form plasma, hi fifties year, research reports studied on rf ion source are numerous however most of them are concerned about application, and research reports relevant to discharge theory or experiment model are unfrequent

    離子源工作時，放電空間交變的軸向磁場和渦漩電場激發放電管中經鈀管純化后通入的氫氣電離，形成等離子體。 50多年來，關于高頻離子源的研究報告很多，但是，這些研究主要都集中在應用研究方面，有關高頻無極環形放電離子源的理論與實驗模型研究不是很多。
  4. Three typical ion source, radio - frequency ion source, duoplasmatron ion source and penning ion source, are usually used in neutron generator

    在通過d - t反應產生中子的低能倍壓加速器中，一般採用三種類型的離子源：高頻離子源（ rf ） 、潘寧離子源（ pig ）和雙等離子體離子源（ dp ） 。
  5. Finally, the characteristics of ion curren extraction in different conditions are simulationed with magic software, and the parameter of best emission surface is obtained

    最後，採用magic程序對高頻離子源不同引出參數下的束流引出特性進行了數值模擬，得到了獲得最佳的引出離子束所要求的等離子體發射面參數。
  6. In the thesis, most advanced, relative, foreign high - tech has been pursued. feasibility analysis has n ' t been carried out by synthesizing much relative knowledge such as electromagnetism theory, plasma technology, aerodynamics, electronic technology etc until the scheme is confirmed, that is, a uniform, one atmosphere, controllable, glow - charge surface plasma can be generated and flow can be accelerated by changing electric field

    本文追蹤目前國外最先進的技術，綜合電磁理論、等離子體技術、空氣動力學、電子技術等相關知識進行可行性分析，確定了研究方案，即利用電流體力學（ ehd ）方法在一個大氣壓下產生高效、均勻、可控的射頻輝光等離子體，同時，通過改變電場促使流動加速。
  7. In the process of maintaining and upgrading 8410 icp direct reading spectrometer, maintaining and adjusting of - 145 v switching power supply of icp high frequency generator are often required

    摘要在維修和改造8410型電感耦合等離子體直讀光譜儀過程中，經常需要對icp高頻發生器中的開關電源進行維修和調整。
  8. Due to great advantage of the excimer laser in photoelectron material, photoelectron technology research, so in this thesis, a xecl excimer laser is designed in order to solve some problem in semiconductor film, cmr film, quartz film and other kind of film application, optical etching field, interaction between laser and material, material plasma study. the parameters of the excimer laser is e also measured and analyzed

    因此本文以氣相沉積、外延生長、巨磁薄膜、金剛石及其它薄膜制備及后續的光刻，激光與物質的相互作用，等離子體研究為目的，研製獲得了激光脈寬18ns ，單脈沖能量150mj ，矩形光斑大小2cm 1cm ，束散角3mrad ，最高重復頻率5hz的xecl準分子激光器。
  9. Based on the viewpoint of interaction between waves in plasmas, the partial differential equation that causes the spectral lines broadening has been deduced from radiation transfer equation of high - frequency electromagnetic waves in plasmas. the numerical solution has been obtained by using the fortran program we compiled. we concretely calculated the spectral lines widths of and fraunhoferx 3704 in corona, fj / a4923. 9 in dwarf nova oy car and f. / a4934 in the variable star rr lyrae

    本文從等離子體波與波相互作用觀點出發，由高頻電磁波輻射轉移方程導出了引起譜線寬度變化的偏微分方程，編寫fortran程序求解偏微分方程的數值解，具體計算了日冕綠線f _ exiv 5303和夫朗禾費線3704 、矮新星oycarf _ eii 4923 . 9 、天琴rr型變星f _ ei 4934的譜線加寬值，對以上各譜線加寬中的等離子體致寬效應作了初步計算。
  10. ( 3 ) chapter v. plasma characteristics of rf ion source is investigated. a zero - dimensional numerical dynamic colisional radiative atomic and molecular ( cram ) model is suggested to simulate the microphysical process. all species " population number densities in plasma are calculated in non - thermodynamics equilibrium condition, and proton content in extracted ion current are measured with 60 ? magnetic analyzer

    （ 3 ）提出了高頻離子源等離子體的零維cram模型（ collisionalradiativeatomicandmolecularmodel ） ，計算了非平衡態（ nte ）下等離子體中分子、電子、離子、基態原子、激發態原子等粒子濃度，並在zf - 200kev中子發生器上，用60磁分析器實驗測定了引出束流的質子比。
  11. The saturation time in our simulation is consistent with the prediction of the theory. furthermore, we also studied the propagation of two pulses with inverse phase. in this case, the wakefield excited by the first pulse will be absorbed by the second pulse which shifts to higher frequency

    此外，我們還研究「位相相反」的兩個脈沖在稀薄等離子體中的傳播，第二個激光脈沖由於吸收了前一脈沖激發的靜電場，頻率向高頻方向漂移，得到頻移的大小與符合理論推測。
  12. The numerical results of the dispersion relation show some nonlinear effects : for a fixed geometry of a waveguid, beam parameters and plasma density, the increment of the modulation parameter may lead to a slight increment of the operating frequency, however, as the modulation parameter increases further, saturation may occur and the dispersion relations are hard to be separated, it is due to the overmodulation of the microwave power, this phenomenon itself belongs to the nonlinear effects

    對於一定的波導、電子注參量和等離子體密度值，等離子體調制系數的增加，使工作頻率略微升高。但是，隨著等離子體調制系數的進一步增加，色散曲線變得彼此之間不可分辨，可以認為是等離子體的過調制導致了柵的飽和。這一現象是非線性的，可見，等離子體柵和調制場中文摘要是非線性關系，等離子體柵是非線性j 。
  13. That is to say, high frequency modulational field radiated from the antenna system of moving bodies influents the charge distribution in plasma, while the disturbance of the charge distribution influents the field conversely

    也就是說，在壓縮區內，飛行體天線輻射出的高頻調制場，影響著等離子體中的電荷分佈，而電荷分佈的擾動又反過來影響場量。
  14. Among of them, radio - frequency ion source is in most wide used for the reasons of its high proton content, long life and reliable performance, etc. h - type radio - frequency ion source is a kind of plasma ion source

    其中，高頻離子源以其很高的質子比（ 70 - 90 ） 、長壽命和可靠的性能而得到了最廣泛的應用。高頻h型放電離子源屬于等離子體離子源。
  15. Plasma characteristics of a rf ion source are investigated by emission spectroscopy. the spatiotemporal spectral line intensities of the first three atomic lines in hydrogen bahner series ( = 656. 28, 486. 13, 434. 05nm ) of rf ion source plasma, are measured with calibrated optical multichannel analyzer ( oma ). some plasma parameters, including electron temperature, hydrogen atom density and hydrogen ion density, are calculated and analyzed using partial local thermodynamic equilibrium ( plte ) theory and abel transform

    實驗採用絕對定標后的光學多道分析系統（ oma ）測定了離子源等離子體不同時間和空間位置的氫原子巴耳末譜線系中前三條譜線（ = 656 . 28 ， 486 . 13 ， 434 . 05nm ）的強度，並採用plte的理論和abel變換方法，計算出了高頻離子源等離子體的電子溫度、氫原子濃度、氫離子濃度等參數在放電的不同階段和徑向分佈情況，並進行了簡要分析。
  16. General rules for high frequency plasma mass spectrometry

    高頻等離子體質譜法通用規則
  17. Rf plasma enhanced cvd system

    高頻等離子體增強
  18. Rf plasma system 9200 is a barrel - type batch stripping system with optional high temperature capabilities for photoresist removal, nitride etch, and other cleaning applications in semiconductor and mems fabs

    射頻等離子體9200是桶式爐脫模體，擁有可控制的高溫系統可去除光阻材料、氮化物蝕刻和半導體與微型機電系統等方面的清洗功能
  19. In addition, for a dispersive high frequency system, because of the requirement of the phase in - step between the beam and electromagnetic wave, the bandwidth are expected to be located in a narrow range

    另外，對干填充等離子體的色散高頻系統，由干電子注和電磁波互作用的同步要求，系統帶寬必然分佈在某一有限范圍內。
  20. We combined the cvd technique with the pecvd technique by adding a dc or rf electric field to the reacting region of cvd device, and improved the inputting method of reaction gases, then had executed a diamond film growth system. the advantages of our system are : ( 1 ) reaction power, which can enhance the density of the plasma in the reacting region, is supplied with the heat filament and the dc electric field, or with the heat filament and the rf electric field both of them can be controlled precisely and they are complementary to each other

    將熱絲cvd技術與pecvd技術相結合，在薄膜的成核和生長階段分別給反應區再施加一個直流和射頻電場，同時改進反應氣體的進氣方式，製成具有下列兩大特點的金剛石薄膜生長系統： （ 1 ）反應功率由熱絲和直流電場或熱絲和射頻電場共同提供，兩者互相補充，可精確控制，大大提高了反應區的等離子體密度； （ 2 ）能精確控制反應氣體的分佈、流量及流速。
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