afm atomic force microscope 中文意思是什麼

afm atomic force microscope 解釋
原子力顯微鏡
  • afm : 1. American Federation of Musicians 美國音樂家聯合會。2. Air Force Medal （英國）空軍獎章。
  • atomic : adj. 1. 原子的。2. 極微的。3. 強大的。
  • force : n 1 力，勢。2 體力，氣力，精力，魄力。3 暴力，壓力；兵力，武力。4 〈pl 〉 部隊，軍隊，兵力。5 勢...
  • microscope : n 顯微鏡。 a binocular microscope 雙目顯微鏡。 an electron microscope 電子顯微鏡。 a field ion em...
  1. In this paper, the flow pattern defects ( fpds ) were revealed by secco etchant and their shape, distribution on wafer and tip structure were studied in details by optical microscope and atomic force microscope ( afm ). the relationship between etching time and the tip structure of fpds was also discussed. furthermore, by studying the effect of rapid thermal annealing ( rta ) on the density of fpds in ar, the annihilation mechanism of fpds was discussed in this paper

    本文將cz硅單晶片在secco腐蝕液中擇優腐蝕后，用光學顯微鏡和原子力顯微鏡對流動圖形缺陷（ flowpatterndefects ， fpds ）在矽片中的形態、分佈及其端部的微觀結構進行了仔細地觀察和研究，並討論了腐蝕時間對fpds缺陷端部結構的影響；本文還通過研究ar氣氛下快速退火（ rapidthermalannealing ， rta ）對fpds缺陷密度的影響，初步探討了fpds的消除機理。
  2. Abstract : molecular deposition ( md ) film, a nano film, is assembled by the interaction of static charge between cationic and anionic compounds. the micro - friction properties of an md film on silica has been studied with atomic force microscope ( afm ). it has been found that the md film has lower coefficient of friction as compared with the original surface of silica. moreover, based on the analyses of the surface force versus distance curves, photographic image, friction force image, and modulated force image, it is concluded that the friction reduction effect of md film on silica is attributed to the surface adhesion reduction and surface micro - modification

    文摘:利用原子力顯微鏡對石英巖表面單層分子沉積膜的微觀摩擦特性進行了研究，發現該分子沉積膜具有一定的減摩性.通過對其表面力-位移曲線、表面形貌像、調制力像和摩擦力像的進一步分析表明，石英巖表面分子沉積膜具有減摩作用的原因在於它能夠降低表面的粘著力並對表面具有微觀修飾作用
  3. Afm, atomic force microscope

    原子間力?微鏡
  4. Atomic force microscope, afm

    原子力顯微鏡
  5. Besides, the growth of gasb expitaxy film was monitored by reflection high energy electron diffraction ( rheed ). the rheed images and intesity oscillation are collected by computer system. it showed that the gasb film prepared in 400 was amorphous and it became monocrystalline when the temperature rose to 500. atomic force microscope ( afm ) was applied to analyse the surface morphology of the films which were grown in diffrent growth rates or substrate temperature. the analysis were compared to simulation results. the experiment results indicated it was easy to form clusters when the rate of growth is high or

    此外，本文通過反射式高能電子衍射（ rheed ）監測了gasb外延薄膜的生長，利用rheed強度振蕩的計算機採集系統實現了rheed圖像和rheed強度振蕩的實時監測。實驗發現在400生長的gasb薄膜為非晶態，溫度升高到500薄膜轉變為單晶。利用原子力顯微鏡對不同生長速率和襯底溫度生長的gasb薄膜的表面形貌進行觀察分析，並與模擬結果進行比較。
  6. The surface morphologies of thin films were observed by using scan electron microscope ( sem ) and atomic force microscope ( afm ). based on grazing incidence x - ray diffraction ( gixrd ) equipment, we find that residual stress exist in magnetron sputtering plct film, in addition, the ferroelectric properties of plct thin films were measured by radiant premier lc type multifunctional ferroelectric properties test system

    利用廣角x射線衍射技術對不同濺射工藝下plct薄膜的相結構進行了研究;採用掃描電子顯微鏡（ sem ）和原子力顯微鏡（ afm ）分別觀察了薄膜的表面形貌;利用掠入射x射線衍射（ gixrd ）測量了薄膜的殘余應力。
  7. The gettering processes usually are estimated by gettering of au to nanocavity in silicon. in this paper, the characteristics of nanocavity gettering mechanism, diffusion and distributing of aurum and ion implantation in silicon were described. in this work, many bumps on the polishing surface of the silicon, after a he + impantation in and subsequently a hot - treatment, were observed using atomic force microscope ( afm )

    我們注意到，在研究氫、氦離子注入誘生微孔的吸除作用時多以對金雜質的吸除效果來對吸除工藝進行評估，因此本文對微孔吸除機理、金在硅中的擴散和分佈以及半導體中離子注入的特點進行了描述。
  8. Determined by dsc. whereafter, the surface micro - morphology of both sides of tini sma thin film deposited on glass was investigated by atomic force microscope ( afm ), and the difference of morphology between the two sides is observed. it has been shown that, in the growing surface of sputtered tini film, the trend of grain to accumulating along the normal direction like a column is clearly observed, and the grain is very loose which resulted in more microcavities, but in the surface facing to glass substrate, grain is so compact that there are hardly microcavities

    通過濺射法，在玻璃襯底上淀積了tini薄膜，並在600進行了真空退火， dsc法測得其馬氏體逆相變峰值溫度為75 ，利用原子力顯微鏡，對玻璃基tini形狀記憶合金薄膜的襯底面與生長面進行了表面微觀形貌分析，發現：生長面晶粒呈現出沿薄膜法線方向柱狀堆積的趨勢，晶粒緻密性差，微孔洞多；而襯底面晶粒緻密，幾乎沒有微孔洞存在。
  9. The phase structure of different cu - fe thin films were studied by using grazing incidence x - ray analysis ( gixa ). the texture and residual stress of different cu - fe thin films were measured by scan of x - ray diffraction ( xrd ) and 2 scan with different. the thicknesses of different thin films were characterized by means of small angle x - ray scattering ( saxs ) technique. by using atomic force microscope ( afm ) measured surface roughness of thin films. the component of different thin film was characterized by energy disperse spectrum ( eds ) and x - ray fluorescence ( xrf ). the magnetic properties of cu - fe thin films were measured by means of vibrating sample magnetometer ( vsm ). in addition, the giant magnetoresistance ( gmr ) effects of different films were also measured. the original resistance of the film fabricated by a direction - current magnetron sputtering system is directly affected by bias voltage

    利用掠入射x射線分析（ gixa ）技術對不同cu - fe薄膜的相結構進行了研究;利用xrd掃描及不同角度的2掃描對薄膜進行了結晶織構及殘余應力分析;運用小角x射線散射（ saxs ）技術測量了薄膜的厚度;採用原子力顯微鏡（ afm ）觀察了薄膜的表面形貌;運用能量損失譜（ eds ）及x射線熒光光譜（ xrf ）對薄膜進行了成分標定;使用振動樣品磁強計測量了不同cu - fe過飽和固溶體薄膜的磁性能;最後利用自製的磁阻性能測試設備測量了真空磁場熱處理前後不同薄膜的巨磁阻值。
  10. In this article, we discussed advantages of scanning near - field optical microscope ( snom ) over conventional optical microscope, atomic force microscope ( afm ), and scanning tunneling microscope ( stm )

    摘要本文首先介紹近場光學顯微鏡的基本原理，然後介紹近場光學顯微鏡與傳統光學顯微鏡、原子力顯微鏡、掃描隧道顯微鏡相比，在生物膜研究方面的優勢。
  11. ( 2 ) zno thin films were prepared on glass substrates by sol - gel spin - coating method. the optical properties and surface morphologies of the films were investigated using photoluminescence ( pl ), optical transmission spectra, and atomic force microscope ( afm ), respectively

    （ 2 ）利用sol - gel旋塗法在普通蓋玻片上生長了zno薄膜，用光學透射譜、光致發光譜和原子力顯微術研究了zno薄膜的光學性質和表面形貌。
  12. The bzt thin film has good properties in high frequency. the essential principle, technology process and advantages of the ba ( zr0. 3ti0. 7 ) o3 ( bzt ) ferroelectric thin films grown on pt / ti / sio2 / si substrates and quartz substrates by sol - gel process are introduced. the heat - treatment technology was fixed according to the dsc - tg measurement, afm ( atomic force microscope ) and fe - sem ( field emission - scanning electrical microscope )

    我們通過在pt / ti / sio2 / si襯底和石英襯底上制備ba （ zr0 . 3ti0 . 7 ） o3鐵電薄膜，了解了溶膠-凝膠法（ sol - gel ）制備薄膜的基本原理、工藝過程及工藝特點;並對所制得的ba （ zr0 . 3ti0 . 7 ） o3薄膜的前驅體溶液和干凝膠進行了差熱與熱失重（ dsc - tg ）分析，確定了溶膠在熱處理各個階段的反應情況。
  13. We give some useful analyses and the computer simulations for the ion etching process. compared with the atomic force microscope ( afm ) scanning photograph of the etching surface, the theoretical results prove that these simulation analyses assure the precision required by this problem, so these mathematical models are reasonable and correct. the analysis method in this paper is useful to analyze etching process, and it can also afford some valuable reference to etching technology

    在本論文我們主要利用這個數學模型，對使用離子束刻蝕製作單臺階光柵的臺階與溝槽部分的表面面形隨時間的演變過程分別進行了計算機模擬分析，並通過把理論結果與在實驗中得到的刻蝕表面在原子力顯微鏡（ afm ）下拍攝的照片進行比較，結果說明這種模擬分析能夠保證對該問題分析所要求的精度，從而也證明了理論模型的合理性和正確性。
  14. Molecular beam epitaxy ( mbe ) has been used to grow insb heteroepilayer on gaas ( 001 ) substrate with optimized low temperature buffer layer. the surface morphology and crystal quality of insb epilayers have been investigated by means of atomic force microscope ( afm ), scanning electron microscopy ( sem ) and double crystals x - ray diffraction ( dcxrd )

    本文採用分子束外延（ mbe ）方法在gaas （ 001 ）襯底上優化低溫緩沖層生長條件制備了異質外延insb薄膜，採用原子力顯微鏡（ afm ） 、掃描電鏡（ sem ）與x射線雙晶衍射（ dcxrd ）等方法研究了insb / gaas薄膜的表面形貌與結晶質量。
  15. Atomic force microscope ( afm ) has been applied in the field of nano - machining since its invention even its main function falls in the inspection of surface topography and other features

    自原子力顯微鏡（ afm ）問世以來，其應用領域已由原來的微觀表面形貌檢測或表面特徵的表徵擴展到納米加工。
  16. For robotic nanomanipulation based on an atomic force microscope ( afm ), the working principle of interactive nano forces among the probe, substrate and particle is preliminarily analyzed

    摘要針對基於原子力顯微鏡（ afm ）的機器人化納米操作，對探針作用下探針基片微粒之間納觀力的作用規律進行了初步分析。
  17. After a slight chemical etching, carbon cluster tracks, were observed for the first time by atomic force microscope ( afm ) and the clear images were obtained. the track structures for c1 - c4 were analyzed and compared by the offline - analyzing program, of afm. the interaction of the cluster - and solid was discussed

    然後，用其轟擊固體徑跡探測器cr - 39 ，對cr - 39經過腐蝕之後，用先進的原子力顯微鏡（ afm ）對碳微團簇徑跡進行了觀測，得到了清晰的圖像。
  18. Chapter 4 preparation of tio2 nano - films and its surface structural morphology tio2 nano - films were successfully fabricated by a sol - gel process on glass substrate. the morphology and microstructure of films were investigated via atomic force microscope ( afm ), x - ray diffractometer ( xrd ) and transmission electron microscopy ( tem )

    凝膠法制備了tio _ 2納米溶膠，在不同的處理方式下以刮片法制幾種無機納米材料的制備、表徵與應用備了兩種ti仇多孔納米薄膜，並利用afm ， tem ， xrd等測試方法對膜表面結構及物理化學特性進行了表徵。
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