amorphous condition 中文意思是什麼

amorphous condition 解釋
非晶態
  • amorphous : 玻璃態的
  • condition : n 1 狀態，狀況，情形；品質。2 〈pl 〉外界狀況，周圍情形。3 地位，身分。4 條件；【語法】條件子句。...
  1. Hydrogenated amorphous silicon nitride ( a - sinx : h ) films have been deposited by helicon wave plasma enhanced chemical vapor deposition ( hwp - cvd ), the effect of sih4 / n2 rate on the properties of the samples is systematically studied, and the critical experiment condition is obtained under which a - sinx : h films with different compositions are deposited

    本工作採用螺旋波等離子體化學氣相沉積（ hwp - cvd ）方法制備了氫化非晶氮化硅（ a - sin _ x ： h ）薄膜，系統地研究了不同反應氣體配比對薄膜特性的影響，得到了沉積不同組分a - sin _ x ： h的典型實驗條件。
  2. The method of amino ? roup doping into hydrogenated amorphous carbon ( ct - c : h ) film and the influence of technological condition on it had been exhaustedly discussed in the article

    本文詳細研究了對氫化碳膜進行胺基團摻雜的方法，工藝條件。
  3. Aluminum coagulation pretreatment enhances the uf removal of ha and greatly ameliorates the effect of ha on the membrane flux decline. at ph = 7. 0 the mechanism is adsorption of ha on the amorphous solid - phase al ( oh ) _ 3 ( s ), while at ph = 5. 0 the mechanism is charge - neutralization. in terms of the removal of ha ( toc, uv _ ( 254 ) ) and the membrane flux decline, the effect of coagulation under ph = 7. 0 condition turns out to be much better than that under the condition of ph = 5. 0

    Ph = 7 . 0條件下的混凝預處理機理主要是鋁鹽高分子水解產物對腐植酸的吸附網捕作用， ph = 5 . 0時的機理主要是帶正電荷低分子鋁鹽水解產物吸附電中和作用，從toc和uv254的去除率以及膜滲透通量的變化情況來看， ph = 7 . 0條件下的混凝預處理優于ph = 5 . 0 。
  4. Magnet performance comparison between ferrite and amorphous under pulse condition

    鐵氧體與金屬玻璃脈沖磁性能比較
  5. High si / al amorphous silica - alumina with satisfactory pore structure could be prepared via optimization the preparation condition

    通過優化加料順序、加料方式和制備條件，可以制備出理想孔結構的高硅鋁比無定形硅鋁干膠產品。
  6. The influence of depositing condition on the depositing rate and the structure of the films were studied by the aid of tem and xrd. when the temperature ( ts < 450, ta < 800 ) is low, the structure of the samples is still amorphous. the majority content of the sample is sio 90 by the aid of xps

    利用雙離子束濺射沉積技術，通過共濺射方法制備了si - sio _ 2薄膜，研究了沉積時間、工作氣壓p _ （ ar ） 、基片溫度等對沉積速率的影響，用tem和xrd分析了樣品的結構。
  7. 3. xrd results of ni - w - b and ni - w - b - ptfe alloy deposits obtained from the stated plating solution and condition showed that their structure were in nanocrystalline or amorphous, and the addition of boron compound and ptfe in deposits expedited them in amorphous structure. the microhardness of ni - w - b and ni - w - b - ptfe alloy were higher than that of ni - w alloy deposits

    在所述鍍液組成和沉積條件下， xjid實驗結果顯示所獲得的nlwb合金電沉積層及其復合鍍層表現為納米晶或非晶態結構，鍍層中含b物質和pite的加入加劇了鍍層結構的非晶化。
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