deposition rate 中文意思是什麼

deposition rate 解釋
沉澱率
  • deposition : n. 1. 免職，罷免；廢位。2. 淤積[沉積]（物，作用）。3. 耶穌從十字架上放下（的畫、雕刻）。4. 寄存，委託；委託物。5. 【法律】口供，證言；口供書。
  • rate : n 1 比率，率；速度，進度；程度；（鐘的快慢）差率。2 價格；行市，行情；估價，評價；費，費用，運費...
  1. When ph value < 0. 5, faster deposition rate, faster growth rate of crystallizing nucleus, which causes bigger crystalline granularity and bad surface quality of the deposits such as crassitude or darkling

    Ph 0 . 5時，沉積速度過快，晶核成長速度快，晶粒粒度較大，鍍層表面粗糙、發黑，表面質量差。
  2. The spray pyrolysis technique has a great application potential to be a method to prepare the economical tin dioxide film for its unsophisticated equipment, low - cost and high deposition rate. in this paper, antimony - doped snoa ( ato ) thin films were deposited onto soda - lime glass by the spray pyrolysis method, using metal salts snch ? 2h2o and sbcls as precursors

    噴霧熱分解法以其設備簡單、成本低、制備樣品快等優點成為一種很有應用潛力的制備sno _ 2薄膜的方法，另外噴霧熱分解法在鍍膜玻璃的工業化生產中有著廣闊的應用領域。
  3. Using jgp560c magnetron sputtering equipment, cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power, gas flow, vacuum air pressure, magnetoelectricity power and substrate temperature on deposition rate of film, discovered that dc sputtering power is the most key factor influencing the deposition rate

    在jgp560c型超高真空多功能磁控濺射鍍膜機上，採用直流磁控濺射法在cdznte晶體上制備出cu ag合金薄膜，揭示了氣體流量、直流濺射功率、勵磁電源功率、工作氣壓和襯底溫度等工藝參數對沉積速率的影響規律。結果表明濺射功率對沉積速率的影響最大，隨濺射功率的增大沉積速率快速增大。
  4. We make use of double complexing agents and double quickening agents in the composite plating techniques which enable to increase the deposition rate and to obtain a more stable plating bath

    在復合鍍工藝中，採用雙絡合劑、雙加速劑來提高鍍速和穩定鍍液。
  5. But variant rare earth element has different affections on the baths. the subjoining of rare earth enhanced the deposition rate and stability of baths. the cohesion of the matrix and the film and the surface quality are also improved

    但不同稀土元素對鍍覆工藝的影響不盡相同， re添加到鍍液中明顯提高了鍍液的沉積速率、穩定性、鍍層與基體的結合力和表面質量。
  6. When sn2 + concentration in the bath is lower, sn2 + activity is not enough causes slow deposition rate and slow growth rate of crystallizing nucleus, so crystalline granularity deposited is smaller ; when sn2 + concentration in the bath is higher, the dispersive ability of the bath decreases and the surface quality of the deposits sets worse

    鍍液中sn ~ （ 2 + ）濃度較低時，離子活度不夠，沉積速度慢，晶核成長速度慢，使沉積的晶粒粒度較小； sn ~ （ 2 + ）濃度過高，鍍液分散能力降低，使鍍層的表面質量下降。
  7. It shows that the increasing of microwave power can result in increasing of deposition rate, but decreasing of f / c ratios and abundance of cf and cf3 groups in cl - c : f films, and keeping that of cf2 group variation around a constant

    在560w以上的高微波功率下沉積的薄膜是主要由cf _ 2基團和c = c結構組成的- c : f薄膜。
  8. The spray pyrolysis method has large application potency to be a method to prepare the economical thin films for its unsophisticated equipment, low - cost and high deposition rate which are great advantages if the technique is to be scaled up for industrial applications

    噴霧熱解法具有沉積溫度、速率容易控制，對基板選擇性低，所得薄膜形貌均勻緻密等特點。而且設備簡單，成本低廉，在大規模工業生產方面有很大潛力。
  9. Besides, scan rate and cycle period also affect the result ; co - deposition of dualistic oxide is a focus of research, as an element in the same group, ir is selected. deposition rate of composition is decreased by the adding of ir composition, and when the proportion of ir exceeded 50 %, composition procession can be ceased. but cooperation of ir and ru oxide can highly increase the specific capacitance of active material ; annealing treatment under a certain temperature can help to change the hydrate ru composition into mixture state ru oxide, accordingly increase the stabilization of active material

    研究表明:電解液的配製過程中，氯化釕濃度、溶液ph值、陳化時間、溶液溫度對電鍍效果均有影響，其中溶液ph值是最主要的影響因素;在儀器的使用條件探索中，理論結合實驗確定了本電鍍液體系循環伏安電勢窗的理想范圍，並發現循環伏安掃描速度和掃描周期對電鍍結果也有較大影響;混合氧化物的共沉澱是目前研究熱點，在此選用與釕同一族的銥作為共沉澱元素，銥的加入會阻礙氧化物的沉積速度，銥的比例超過50 %會使沉積作用停止，但是二元氧化物的協同作用使沉積的活性物質比容量大大提高;一定溫度下退火后處理作用會使水合釕化物轉變成混合價態的氧化釕，從而提高活性物質的穩定性。
  10. The tube diameter had light relation with deposition rate under same volume flow amount, while the relation of deposition rate with aerosol particles size was relatively complicated

    在相同體積流量下，沈積率與管徑關系不大；而沈積率與氣溶膠粒子大小之間的關系比較復雜。
  11. The deposition rate of aerosol particles in capillary tube was measured with submicrometer monodisperse polystyrene spheres solid aerosol particles and pulse sample inserting technique ; and studies were made on the relationship between the flow velocity, the tube diameter, the tube length and aerosol particles size

    摘要採用亞微米單分散聚苯乙烯球形硬氣溶膠粒子和脈沖進樣技術，測定了氣溶膠粒子在管道中的沈積率，研究了沈積率與流體速度、管道長度、管道直徑和氣溶膠粒子大小之間的關系。
  12. The relationship between the concentration of stabilizers, the rate of agitation, the concentration and series of the complex agents and the deposition rate was also studied in this paper

    並具有一定的雷達吸波性能。另外，對溶液中穩定劑的濃度、攪拌速度、絡合劑種類和含量與沉積速度的關系進行了初步探討。
  13. The distributing patterns of the eulerian residual currents of the four major tide constituents ( i. e. m2, s2, ol and kl ) imply that fine - grained sediment transport over the central mud of the northern yellow sea is weak. the eulerian residual currents of kl and s2 respectively form an anti - clockwise eddy near the coastal mud - deposit area of northern shandong peninsula, which may increase the deposition rate of mud

    各分潮歐拉余流總的分佈趨勢表明北黃海中部泥區細顆粒沉積物輸運的量值很小， k1和s2分潮歐拉余流各自在山東半島北側近岸泥質區形成的順時針渦漩可能促進了該處的泥質沉積。
  14. Abstract : based on the concept of space migration length of photo - activation species, the analytical expression of the total number n of photo - activation species that can reach a segment on the substrate in the cubic deposition reaction space is derived. the simulation of the relationship of deposition rate and position of substrate is also completed. the simulation result agrees with the experiment data well

    文摘:基於光激活物質空間遷移長度的概念，推導出方形反應空間中到達基片上單位面積的光激活物質總數的解析表達式，對光化學汽相沉積中淀積速率和基片位置的關系進行了模擬和分析.模擬結果同實驗結果符合良好
  15. Various factors affecting the refractive index and the deposition rate of the deposited films are studied to optimize growth conditions of the films. the microstructures and optical properties of the films are characterized by a prism coupler, a fourier transform infrared spectroscopy ( ftir ) and an atom force microscopy ( afm )

    研究了薄膜折射率和淀積速率與工藝參數之間的關系，通過棱鏡耦合儀、傅立葉變換紅外光譜、原子力顯微鏡、掃描電子顯微鏡等測試手段，分析了薄膜的結構和光學特性。
  16. Uniform and compact plzt and sno _ 2 ceramic targets, which diameter were 212mm and 221mm, respectively, had been successfully fabricated. ( 2 ) a rotating magnetic field rf magnetron sputtering system had been designed and set up, which showed high utilization efficiency of target, high films uniformity, and high deposition rate, etc. ( 3 ) the plzt and sno _ 2 thin films were investigated by afm, xrd, sem, and spectral photometer. the optimized processing parameters of preparing these films had been found

    並以此為基礎分別制備了緻密、均勻、平整、直徑為212mm的plzt和221mm的sno _ 2陶瓷濺射靶材; （ 2 ）為克服現有磁控濺射設備的不足，提出了一種新的磁控濺射方案，採用該方案的設備具有:靶材利用率高、鍍膜均勻、成膜速度快等特點; （ 3 ）運用afm 、 xrd 、 sem以及雙光路分光光度計等分析手段對plzt和sno _ 2薄膜的微結構和性能進行研究，找到了制備plzt電光薄膜和sno2透明電極材料的最佳工藝條件。
  17. By means of pld, it is easy to achieve ingredient homology between film and target. moreover, the deposition experiment condition is easy to control with a high deposition rate, a short deposition cycle and a wide application

    Pld是制備薄膜的最好方法之一， pld制備薄膜具有膜成分容易做到與靶成分一致，沉積條件容易控制、沉積速率高、實驗周期短、應用范圍大的特點。
  18. In the work, mid - frequency pulse magnetron sputtering is used to prepare znoral thin films used as the back reflector of the thin silicon films solar cells. the best techological condition was obtained by optimizing the preparing conditions, ( var is decided by the deposition rate, target voltage : 265v, gas pressure : 0. 6pa, the high base vacuum is expected

    本文採用中頻脈沖磁控濺射法，通過優化zno ： al薄膜的制備工藝，如靶電壓、本底真空度、工作氣壓、襯底溫度、 o _ 2 ar ，得到可用於硅薄膜太陽能電池背電極的zno ： al薄膜。
  19. These investigations revealed that the chemical composition, deposition rate and the orientation direction of films were affected by the oxygen partial pressure

    實驗結果表明，氧分壓影響氧化釩薄膜的沉積速率、成分以及晶體結構。
  20. Effects of the thickness and deposition rate of ta seed layer on the anisotropic magnetoresis

    35雙層膜各向異性磁電阻和矯頑力的影響
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