diffraction wavefront 中文意思是什麼

diffraction wavefront 解釋
繞射波前
  1. Point diffraction interferometer - a physical idea, is invented by smartt and strong in 1972, advanced by smartt and steel, and used to test astronomical telescope, it has simple structure and has not special demand to source. recently. with the development of fiber ' s manufacture and coupling technology. the simple modern fiber ' s center is smaller than before, this make it possible to progress fiber point diffraction interferometer ( pdi ), in addition to test convergent wavefront, it can test the reflective concave. the excellence of pdi is that it does not need standard mirror. in intereference testing, the standard mirror is the main reason which limit the improvement of precision, pdi can avoid difficulty to provide the wide future for high precision testing. pdi, which produce the standard sphere wavefront, is an instrument which realize the phase shifting with piezoelectric transducer ( pzt ), and collect the interferogram with ccd, in this paper, a adjusting methord is described, then data processing is obtained

    點衍射干涉儀這一物理思想,早在1972年smartt和strong就已發明,由smartt和steel做了進一步發展,並成功的用於檢測天文望遠鏡,它結構簡單,對光源沒有特殊要求,近年來,由於光纖製造工藝以及耦合技術的發展,單模光纖纖芯不斷縮小,為光纖點衍射干涉儀得以發展提供了前提條件,該干涉儀由激光照明,除了檢測會聚波前外,還可以用來檢測反射凹球面,進而應用到單個面形的檢測;另外,光纖點衍射干涉儀最大的優點是不需要標準鏡,在干涉檢測中,標準鏡是檢測精度受限的很大原因,光纖點衍射干涉儀能繞開這一難度,為進行高精度的光學檢測提供了廣闊的前景。
  2. The resolution of optical system can not reach its diffraction limit because of the phase aberrations caused by atmospheric turbulence and other wavefront errors. adaptive optics technology uses deformable mirrors to perform dynamic phase modulation and endow optical system the ability to decrease the influence of dynamic wavefront errors

    大氣湍流等動態干擾使光波面相位發生畸變,使光學系統的解析度無法達到其衍射極限,而自適應光學系統使用變形鏡對光波面進行動態相位調制,賦予了光學系統能動可變的能力而有效地解決了動態干擾的問題。
  3. In order to study the thermal performance and residual stress of microelectronic subassembly, in this paper, a newly optical interferometry method for 3 - d displacement measurement is developed based on wavefront interference theory. in which the moire interferometry provide the in - plane displacement, but the system is different from the conventional interferometry, the system applies the double diffraction of the specimen grating, the in - plane displacement sensitivity is a factor of 2 higher than that of the conventional moire interferometer. twyman / green interferometry method for out - of - plane displacement measurement is adapted, the advantages of the optical set - up are structure novelty, and the fringe patterns of the displacement fields shown high contrast and spatial resolution

    為了詳細研究試件的熱變形特徵以及殘余應力的影響作用,本文在波前干涉理論的基礎上,設計了一新型三維光學測試系統,該系統的平面位移測試基於雲紋干涉方法,但採用與普通雲紋干涉不同的光路系統,利用試件光柵和平面反射鏡組形成的兩次衍射,使平面位移干涉條紋倍增,測量靈敏度是普通雲紋干涉的2倍,系統的離面位移場測試採用泰曼格林干涉光路。
  4. In fact, hartmann - shack wavefront sensor is affected by the noise of ccd and the constructed error too. in our compare, a bridge is setup, which is the original wavefront composed by zernike polynomial, we transform the original wavefront into far field. then we can compare the accuracy of hartmann - shack wavefront sensor with the accuracy of the system of far field diagnosis in detecting the farfield, using diffraction limit and encircle energy

    我們在進行兩者相互比較的過程中,搭建了一個比較的橋梁,即由zernike多項式組成的各種原始像差波前,將它也變換到遠場作為原始理想遠場光斑,然後,以它的衍射極限和環圍能量曲線作為評價標準,比較hartmann - shack波前傳感器和遠場測量系統在光束質量診斷中的探測精度。
  5. At the same time, the possibility of using nonlinear optics in widening the detecting wave band of hartmann - shack wavefront sensor is exploringly discussed. adaptive optics guarantees the beam quality of laser projecting system. beam cleanup, atmospheric turbulence compensation and correction of any disturbance and fabrication error in the light way are required to promise a near diffraction beam, but normal adaptive optics system can only correction one of them

    自適應光學進行光束大氣傳輸波前畸變校正時,要求系統必須能進行光束凈化和校正大氣湍流造成的波前畸變,並且能夠同時有效地克服發射系統製造誤差、重力變形以及光路內部氣體擾動的影響,得到接近衍射極限的輸出激光光束。
  6. Based on the theory of partial coherent diffraction and frt, an approach for fractional fourier domain filtering is presented as a new wavefront engineering method to improve the image quality in photolithography

    基於部分相干成像理論和分數傅立葉變換濾波等理論,我們提出了利用分數傅立葉域濾波改善光刻成像質量的波前工程新思想和新方法。
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