dot etching 中文意思是什麼
dot etching
解釋
網點腐蝕-
By studying and using conventional 1c process in combination with electron beam lithography ( ebl ), reactive ion etching ( rie ) and lift - off process, several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires, si quantum dots, double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes
研究利用常規的硅集成電路工藝技術結合電子束光刻,反應離子刻蝕和剝離等技術制備半導體和金屬納米結構,很好地解決了普通光刻與電子束光刻的匹配問題,提高了加工效率,經過多次的工藝實驗,摸索出一套制備納米結構的工藝方法,首次用電子束光刻,反應離子刻蝕和剝離等技術制備出了多種納米結構(硅量子線、量子點,雙量子點和三叉指狀的金屬柵結構) 。 -
In dot etching, the photographic construction of individual dots to provide a proper density gradient suitable for dot size reduction
中義在網點修整中,個別的網點結構依網點大小提供適當的濃度變化。 -
After calibration, the distribution of the dot array can be calculated according the etching parameters and distance of diffraction
系統標定好后,衍射點陣在平面上的分佈情況可根據光刻參數和衍射距離計算得到。
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