ellipsometer 中文意思是什麼

ellipsometer 解釋
偏振光橢圓計
  1. The refractive index ( at 632. 8nm ) of cbn thin film with 92. 8 % cubic phase content is measured to be2. 19 by ellipsometer

    用橢偏儀測得，對于波長為632 . 8nm的光，立方相含量為92 . 8的氮化硼薄膜的折射率為2 . 19 。
  2. Their structures and optical properties were compared and analyzed. 2 the silver films were prepared at the room temperature and 77k on glass substrates. the microstructures and optical properties of the ag films were studied with the xrd, sem and ellipsometer, respectively

    常溫和77k溫度玻璃襯底上金屬（ ag 、 cu ）薄膜的制備，以及常溫和77k玻璃襯底上ag薄膜的表面結構及光學性質的比較研究。
  3. Sem was used to observe the surface and the cross section of the films. index of refractive was derived from the ellipsometer. raman spectroscopy and xps were used to analyze the structure and composition of the films

    用sem分析了薄膜的斷面形態，在橢偏儀上測得其折射率，並對薄膜進行了raman光譜、 xps分析，在沒有極化的條件下進行了二階非線性maker條紋檢測。
  4. At last, the designed hr phase retardance films are produced by use of the e - beam evaporation equipment, then the phase retardance and the reflection of it are measured by lambda 900 spectrophotometer and the type of m - 2000ui ellipsometer. and the error of hr phase retardance film is analyzed

    在此膜系的基礎上，通過對最外面幾層薄膜厚度的優化設計，最終設計出了45入射、對632 . 8nm和1315nm雙波長高反，並在1315nm處有180和90位相延遲的高反射膜系。
  5. The thickness, extinction and reflection coefficients of the plct ( x ) thin films with variant layers were measured by ellipsometer

    運用橢圓偏振儀測定了不同層數的薄膜厚度、消光系數、折射率。
  6. In this thesis we have expatiated on the methods of the c60 thin films preparation, and the process with vacuum evaporation. the effect, which was caused by different gas pressures and other element doped, on surface morphology, structure and optical properties of c60 films have been studied by using scanning electron microscopy ( sem ), ultraviolet visible optical absorption spectroscopy ( uv / vis ) ( type : uv - 240 ), ellipsometer and x - ray diffraction

    本論文闡述了用真空蒸鍍法制備c60薄膜的方法和過程，研究了在不同氣氛下生長和摻雜對c60薄膜的表面形貌、結構和光吸收特性的影響；用xl30fge型掃描電鏡對c60薄膜表面形貌進行觀察；用uv - 240型紫外可見光雙光束分光光度計進行紫外、可見光吸收測量；用橢偏儀對薄膜進行厚度和折射率測量；用x射線衍射對薄膜結構進行分析。
  7. Mathcad applied to testing of the optical constants for thin films with ellipsometer

    Mathcad在橢圓偏振儀測定薄膜光學常數中的應用
  8. The microstructures of the c60 films were studied with scanning electric microscope ( sem ) ; and the optical constants ( including absorption spectrunu refractive index and dielectric function ) of c60 films were measured with the ellipsometer

    常溫和77k溫度8襯底上c60膜的制備，以及這兩種薄膜的表面結構及光學性質的比較研究。光學參數主要由橢偏儀測量。
  9. 3. the low dielectric silicate films were prepared by using poss sol - gel from hydrolyzation and condensation of y - methyl acryloyloxy propyl - triethoxysilane as template, and characterized by afm, bet and ellipsometer. a film with dielectric constant as low as 2. 7 was obtained

    3 、利用- （甲基丙稀酰氧）丙基三甲氧基硅烷水解縮和得到的poss溶膠作為模板劑制備得到了低介電薄膜材料，討論了旋膜轉速對薄膜厚度的影響。
  10. In this work, the author gave full - scale introduction for nano - materials about its structure and specialty, the application in practice and the progress in our country at present etc ; introduced and discussed the preparation, the structure and character of several nano - films ; explained in details the theory of the ellipsometer which measures the optical constants of the materials

    本文對納米材料的定義、結構特徵及應用和我國納米材料發展的現狀作了較全面的介紹；對薄膜的制備、結構、特徵進行了介紹和討論；還詳細介紹了測量材料光學性質的儀器? ?橢圓光譜偏振儀的結構原理及數據的處理方法。
  11. The measure of ellipsometer shows : the refractive index value of c60 cluster films in gas atmosphere is smaller than that of vacuum c60 films ( our measurement result is 1. 94 ) and refractive index value of c60 cluster films in ar is larger than that in n2. both refractive index values are nearly the same in lower pressure ( about 1. 46 ), but decrease with increasing gas pressure

    橢偏儀測量表明：氣氛條件下制備的c60薄膜的折射率n比在真空條件下制備的c60薄膜的折射率（ 1 . 94 ）小；在低壓強條件下，不同氣氛中制備的樣品的折射率也幾乎相等；在一定的壓強范圍內，折射率隨著壓強的增大而減小。
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