evaporation and sputtering 中文意思是什麼

evaporation and sputtering 解釋
熱蒸鍍及濺鍍
  • evaporation : n. 1. 蒸發（作用），發散，升華沉澱作用。2. 脫水（法）。3. 蒸氣。4. （電子的）發射。5. 蒸發量。6. 消散。
  • and : n. 1. 附加條件。2. 〈常 pl. 〉附加細節。
  • sputtering : 飛濺
  1. Study on the fabricating method the fe / al2o3 / fe mtj and co / al2o3 / feni mtj are prepared by ion - beam sputtering systems. the fexcu ( 1 - x ) granule films were evaporated directly using a high vacuum electron beam evaporation. some samples of granule films are annealed at 340c

    用高真空鍍膜機制備了fe _ xcu _ （ （ 1 - x ） ）系列顆粒膜，並對部分膜做了加熱退火處理，樣品被加熱到340並且保溫2小時。
  2. The main conclusions and original results are summarized as follows. the manganin ultra - high pressure sensors for gas gun were made by two - step thin film techniques, namely, manganin thin films were first deposited by magnetron sputtering on fused silica substrates, and then covered by a layer of sio2 thin films by electron beam evaporation. consequently, the manganin sensing elements were " cleanly " encapsulated in inorganic solid matrix and the high - pressure shunt effect was eliminated radically

    上述技術的主要優點在於可以採用高壓絕緣性能更好的無機物作為絕緣封裝材料，如本研究中所採用的sio2 ，而代替在箔式錳銅計中所使用的ptfe ；並可實現敏感元件「清潔」地無機固態封裝，即將整個敏感元件是包封在無機物中，而不與高壓力下絕緣性能相對較差的有機物，如粘接劑、樹脂等直接接觸，從而在根本上消除了高壓旁路效應。
  3. The application and features of vaccum strip coating processes such a thermal jet evaporation, magnetron sputtering, electron - beam evaporation and plasma enhanced eb evaporation process were reviewed

    摘要介紹了新一代連續帶鋼鍍膜技術真空鍍膜的工藝特點及應用現狀。
  4. Cdte films deposited by close space sublimation have better appearance and larger grain than the films deposited by rf - sputtering and vacuum thermal evaporation

    近距離升華法制備的cdte薄膜與射頻濺射和真空蒸發相比，具有其獨有的特性。
  5. With the development of thin film science and technology, various thin film preparation techniques developed rapidly, as a result, conventional so - called filming has developed from single vacuum evaporation to many new film preparation techniques, such as ion plating, sputtering, laser deposition, cvd, pecvd, mocvd, mbe, liquid growth, microwave and mtwecr, etc., of which vacuum evaporation is the common technology for thin film preparation, because it has the distinct advantage of high quality of film deposition, good control - ability of deposition rate and high versatility

    隨著薄膜科學與技術的發展，各種薄膜制備方法得到了迅速發展，傳統的所謂鍍膜，已從單一的真空蒸發發展到包括蒸鍍、離子鍍、濺射鍍膜、化學氣相沉積（ cvd ） 、 pecvd 、 mocvd 、分子束外延（ mbe ） 、液相生長、微波法及微波電子共旋（ mwecr ）等在內的成膜技術。其中電子束蒸發技術是一種常用的薄膜制備技術，它具有成膜質量高，速率可控性好，通用性強等優點。
  6. Manufacturer of thin film processing tools for sputtering, evaporation and mocvd

    -研發和生產用於ccd cmos成像的濾光片。
  7. 1. the manganin ultra - high pressure sensors for gas gun were made by two - step thin film techniques, namely, manganin thin films were first deposited by magnetron sputtering on a12o3 substrates, and then covered by a layer of a12o3 thin films by electron beam evaporation

    首次採用全薄膜化工藝製作氣炮用錳銅超高壓力傳感器，即首先在絕緣基板上沉積錳銅敏感薄膜，然後再在敏感膜的上面沉積絕緣封裝薄膜。
  8. To satisfy the requirements of the wide applications of ito thin films, a lot of research efforts have been made on the preparation of ito films, and various manufacturing techniques such as evaporation, reactive electron evaporation d. c. and r. f. magnetron sputtering reactive thermal deposition and sol - gel process have been successfully developed

    為了滿足光電產業界對ito薄膜的強大需求， ito粉體的制備生產技術和薄膜的形成取得了很大的成效。目前，工業界主要是先將ito粉製成靶材，再利用直流磁控濺射工藝，在材料的表面形成ito薄膜。
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