extreme ultraviolet 中文意思是什麼

extreme ultraviolet 解釋
極遠紫外
  • extreme : adj 1 極端的；過激的 （opp moderate）。2 極限的，非常的。3 盡頭的，末端的。4 〈古語〉最後的，臨終...
  • ultraviolet : adj. 【物理學】紫外的；紫外線的；產生[應用]紫外線的。n. 紫外線輻射。
  1. Euv extreme ultraviolet lithography

    極端紫外平版印刷
  2. Space extreme ultraviolet telescope ( eut ) will consist of four single - channel telescopes, which will be bound together and observe the same part of the solar at the same time in 13. 0nm 17. 1nm, 30. 4nm and 19. 5nm respectively

    空間極紫外望遠鏡（ eut ）是由四個單通道望遠鏡捆綁在一起而構成，可以在四個極紫外波段13 . 0nm 、 17 . 1nm 、 30 . 4nm 、和19 . 5nm同時對日成像。
  3. Extreme ultraviolet radiation and x - ray created by magnetic field around the sunspots also cause the earth s atmosphere to heat up and expand. this will create additional drag to satellites or space shuttles orbiting at low altitudes and eventually pull them out of orbits earlier than expected

    太陽黑子附近的磁場所產生的遠紫外輻射和x射線，使地球大氣溫度上升並且膨脹，這對在較低軌道運行的人造衛星或太空梭帶來阻力，令它們比預期提早偏離軌道。
  4. Extreme ultraviolet laser

    極紫外激光器
  5. Euve, extreme ultraviolet explorer euve

    極紫外探測器
  6. The technology on the processing and detection of the extreme - ultraviolet radiation and x - ray ( euv / x - ray ) optical component is one of the main categories in modern short - wave band optical research

    極紫外與x射線（ euv x - ray ）光學元件的加工與檢測技術的研究是近代短波段光學研究的主要范疇之一。
  7. Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o. lum - pattern. in recent years, several key technologies have been developed rapidly such as laser producing plasma source, extreme ultraviolet multilayer, optical fabrication and metrology, projection - camara alignment, low - defect mask and control technology of stage

    極紫外投影光刻（ extremeultravioletlithography簡稱euvl ）最有可能成為下一世紀生產線寬小於0 . 1 m集成電路的技術，近年來在激光等離子體光源、極紫外多層膜、光學加工和檢測、光學精密裝調、低缺陷掩模、光刻膠技術以及高穩定工作臺系統控制等關鍵技術方面得到了飛速發展。
  8. The space observation in soft x - ray and extreme ultraviolet ( euv ) region is an important portion of the space astronomy and an effective solar observation method developed increasingly. in this thesis we designed a euv multi spectrum space solar telescope ( eut ) based on the requirement of high angular resolution and wide field of view for solar observations ; investigated the transmission performance of eut ; invented a method of eut pointing calibration on the space orbit and solved the high precision pointing calibration problems ; constructed a prototype of 17. 1nm telescope, tested the possibility of eut design, and developed some cutting - edge techniques

    本文根據空間平臺上高解析度對日觀測的需要，設計出一種可以在四個極紫外波段對日同時成像多光譜太陽望遠鏡（ eut ） ；研究了極紫外（ euv ）波段太陽望遠鏡光學傳輸特性；提出了真空紫外波段在軌指向的標定方法，解決了高精度指向標定問題；研製出一臺17 . 1nm望遠鏡的地面樣機，驗證eut設計的可行性，攻克了部分關鍵的技術難關；為進一步的研究工作奠定了基礎。
  9. Generally, the gravity introduced deformation of an optical lens with smaller aperture ( < ( 100mm ) within visible band is about ( / 20 even less than this value. for general optical lens, this error level can be entirely neglected. but for the high - accuracy optical system within extreme ultraviolet band, the error caused by gravity deformation will lead to imaging quality degradation

    本文較為系統地介紹了光學鏡頭的裝配與調校方法，一般地講，在可見波段內，光學鏡片口徑較小（ < 100mm ）時，重力引起的變形一般/ 20左右甚至更小，對於一般的光學鏡頭這樣量級的誤差完全可以忽略，但在極紫外短波長的高精度光學系統中重力變形帶來的誤差會使光學系統成像質量下降。
  10. The first chapter is introduction, which mainly introduce the detector used in extreme ultraviolet ( euv ) and soft x - ray band

    論文第一章是緒論，主要介紹了在極紫外和軟x射線波段使用的一些光電探測器。
  11. Extreme ultraviolet lithography ( euvl ) represents one of the promising technologies for supporting integrated circuit ( 1c ) industry ' s lithography needs during the first decade of the 21st century. this technology builds on conventional optical lithography experience and infrastructure, uses 11 - to 14 - nm photon illumination, and is expected to support multiple technology generation from 65 nm to 35 nm

    極紫外投影光刻（ euvl ， extremeultravioletlithography ）技術作為下一代光刻技術中最佳候選技術，建立於可見/紫外光學光刻的諸多關鍵單元技術基礎之上，工作波長為11 14nm ，適用於製造特徵尺寸為65 35nm的數代超大規模集成電路，預計在2006年將成為主流光刻技術。
  12. The primary and secondary mirrors of the schwarzschild optics were fabricated in our institute and measured using zygo mark iv interferometer. figure errors were observed in both primary and secondary mirror of 5nm ( rms ). these magnitudes are very small at visible wavelength but sufficient to cause significant degradation in the wave - front quality of the schwarzschild optics in extreme ultraviolet ( euv ) wavelength

    利用zygomark干涉儀檢測的schwarzschild微縮投影物鏡主、次鏡面形精度表明，對可見光工作波段已具有足夠高的面形精度，均為5nm （ rms ） ，但在euv （ extremeultraviolet ）波段，將給schwarzschild微縮投影物鏡帶來嚴重的波面誤差。
  13. Euv extreme ultraviolet radiation

    超紫外輻射
  14. Ieh, international extreme ultraviolet ieh

    國際極紫外飛行器
分享友人
分享到 Line

分享到臉書