ion source 中文意思是什麼

ion source 解釋
離子源
  • ion : n. 【物理學】離子。 positive [negative] ion正[負]離子。
  • source : n 1 源頭，水源，源泉。2 根源，本源；來源。3 原因；出處；原始資料。4 提供消息的人。5 血統。vt 〈美...
  1. Investigation on coloration of metal - doped sapphire by mevva ion source

    離子源金屬摻雜藍寶石著色的研究
  2. Characteristics of rf ion source electromagnetic field

    型放電離子源的場特性
  3. During ion source operating, alternating axial magnetic field and azimuthal electric field in discharge tube ionize hydrogen gas purified by hot palladium pipe, and form plasma, hi fifties year, research reports studied on rf ion source are numerous however most of them are concerned about application, and research reports relevant to discharge theory or experiment model are unfrequent

    離子源工作時，放電空間交變的軸向磁場和渦漩電場激發放電管中經鈀管純化后通入的氫氣電離，形成等離子體。 50多年來，關于高頻離子源的研究報告很多，但是，這些研究主要都集中在應用研究方面，有關高頻無極環形放電離子源的理論與實驗模型研究不是很多。
  4. Duoplasmatron ion source

    雙等離子體離子源
  5. Three typical ion source, radio - frequency ion source, duoplasmatron ion source and penning ion source, are usually used in neutron generator

    在通過d - t反應產生中子的低能倍壓加速器中，一般採用三種類型的離子源：高頻離子源（ rf ） 、潘寧離子源（ pig ）和雙等離子體離子源（ dp ） 。
  6. A vacuum interface used for atmospheric pressure ionization ion source was designed to couple with an orthogonal - injection electrospray ionization time - of - flight mass spectrometer ( tofms )

    摘要研製了一種大氣壓離子源真空介面，並已將其用於自製高解析度垂直引入式電噴霧電離飛行時間質譜儀。
  7. Construction of electrostatic accelerator rf ion source

    用於靜電加速器的高頻離子源的設計和調試
  8. ( 4 ) chapter vi. the theory of ion curren extraction of rf ion source is investigated, the reason of emission surface formation and its effect on ion curren extraction are reasearched emphatically

    （ 4 ）對高頻離子源的束流引出原理作了理論推導和分析，著重研究了發射面的形成及其對引出束流特性的影響。
  9. The feasibility that kaufman ion source is applied in reactive ion beam etching is discussed. etching characteristics of materials, including pr, cr, quartz, are investigated. the etch rate and mechanisms of such materials are measured and analyzed as a function of ion energy, ion beam density and ion incidence angle in pure ar and chf3, respectively. the etch rate has shown a square root dependence on variation versus

    深入研究了光刻膠、鉻薄膜、石英等光學材料離子束刻蝕特性，分別以ar氣和chf3為工作氣體，研究光刻膠、鉻薄膜、石英等的刻蝕速率隨離子能量，束流密度和離子入射角度的變化關系，得到刻蝕速率與影響因素的擬合方程，為掩模的製作工藝路線提供了實驗依據和理論指導。
  10. Distribution of electromagnet field in the space of h - type rf ion source is worked out derivation from maxwell equations, and three - dimensional vector graphs of e and b in the space of rf ion source are calculated and plotted by mafia software

    並採用mafia軟體進行了三維實體建模，計算了高頻離子源放電擊穿前和穩定工作后的電磁場分佈，得到了高頻離子源放電空間電磁場分佈的直觀圖像。
  11. On - line measurement of microwave power in ecr ion source

    離子源中的微波功率在線測量
  12. Studies of microcluster ion source using in tandem accelerator

    用於串列加速器的微團簇離子源研究
  13. Extraction property of rf ion source

    離子源引出特性的研究
  14. Electron impact ion source ; ei source

    電子轟擊離子源
  15. ( 3 ) chapter v. plasma characteristics of rf ion source is investigated. a zero - dimensional numerical dynamic colisional radiative atomic and molecular ( cram ) model is suggested to simulate the microphysical process. all species " population number densities in plasma are calculated in non - thermodynamics equilibrium condition, and proton content in extracted ion current are measured with 60 ? magnetic analyzer

    （ 3 ）提出了高頻離子源等離子體的零維cram模型（ collisionalradiativeatomicandmolecularmodel ） ，計算了非平衡態（ nte ）下等離子體中分子、電子、離子、基態原子、激發態原子等粒子濃度，並在zf - 200kev中子發生器上，用60磁分析器實驗測定了引出束流的質子比。
  16. The new requirements for applications in material surface engineering urge a new type of hipib apparatus, for instance, the generation of medium - power - density ion beam, high - stability ion beams and long - lifetime ion source etc. therefore, characterization of high power ion diode - magnetically insulated ion diode ( mid ), the key issue for the technique development, is considered in this dissertation. the investigations of hipib generation and its mechanisms have been carried out in a temp - 6 hipib apparatus, in order to optimize the configuration of ion diode and its ion beam parameters for materials surface treatments

    針對強流脈沖離子束（ hipib ）技術研發的關鍵環節?高功率離子二極體（磁絕緣離子二極體）的工作特性，在temp - 6型hipib裝置上開展了hipib產生及其形成機理的實驗研究，確定了優化的離子二極體結構和輻照工藝參數；通過hipib輻照金屬材料燒蝕行為的系統研究，揭示了燒蝕表面形貌的形成規律，為徹底弄清hipib與材料相互作用機理提供了實驗依據。
  17. Ion source magnet

    離子源磁鐵
  18. The theory of ion etching and the parameter of ion source designing are discussed in detail

    並且詳細介紹了離子刻蝕和離子源的原理。
  19. We suggest that optimization of the tip geometry considerably improve the performance of the liquid metal ion source

    從而為液態金屬離子源的設計提供了一個有效的輔助工具。
  20. Electric field of the emission system of a liquid metal ion source was simulated, based on the conventional dynamic protrusion model and the widely used charge simulation method

    摘要發射系統是液態金屬離子源的關鍵部件之一，它的性能的優劣直接影響到整個離子源的工作穩定性和可靠性。
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