low pressure plasma 中文意思是什麼
low pressure plasma
解釋
低壓等離子體-
Constituting 60 % of total plasma protein, and with low molecular weight, albumin contributes about 80 % of the colloid osmotic pressure
因其占血清總蛋白質的60 %和低分子量的特性，白蛋白司職約80 %的膠體滲透壓。 -
In this paper, we focus on the following three topics : ( i ) density distribution of dusty plasma in the low - pressure collisionless positive column the radial density distributions of electron, ion and dust particle in the low - pressure collisionless positive column are investigated with a fluid theory and a self - consistent dust - charging model
本文著重以下三個方面的研究： （ ）低氣壓無碰撞輝光放電正柱區塵埃等離子體密度徑向分佈本文採用流體模型和自洽的塵埃充電模型，研究了低氣壓無碰撞輝光放電正柱區的電子密度、離子密度和塵埃粒子密度的徑向分佈。 -
In this dissertation, we mainly report on a laser - produced plasma ( lpp ) source with liquid aerosol spray target. for sufficiently high backing pressure and low temperature, the valve reservoir gas of the light source can undergo a gas - to - liquid transition
液體微滴噴射靶激光等離子體（ lpp ）光源是一種具有較高的軟x射線轉換效率且能夠長期連續運行的低碎屑光源。 -
The result shows that argon gas can not only promote the excitation of plasma at low pressure, but also improve discharge state, increase the density and activation of reaction radical and improve the quality of diamond films. on the other side, argon can cool the plasma and maintain low temperature of substrate due to its big ionization section and high collision probability with gas molecules
結果表明，氣體系統中引入氬氣一方面不僅有利於維持低壓放電，而且改善放電狀態，提高反應活性基濃度和活性，提高低溫沉積金剛石膜的質量；另一方面，由於其大的電離截面使其和電子碰撞的幾率大大提高，對等離子體進行冷卻，有利於基片溫度的降低。 -
No matter how different the discharge scheme is, low pressure discharge plasmas take a common characteristic of bright glow and is generally entitled as low temperature glow discharge. glow discharge plasma has been selected as a most suitable system for plasma diagnostics in laboratory and for application technology development because of its good stability and reproducibility
利用n _ 2輝光放電中n _ 2 ~ +的發射光譜研究了放電空間的溫度分佈的變化規律，發現了直流放電的一些重要特性，如阻礙輝光與正常輝光的光譜差別。 -
Plasma nitriding is an application way to metal surface and heating treatment based on the formed plasma by glow discharge. nitriding is a way of heating treatment, namely, metal accessory is put into activate nitrogen and the gas of low light pressure is ionized into energy electrons, high energy ions and high energy neutral atoms by the action of the electric field under a definite temperature and the time of the heat preservation
等離子滲氮是利用輝光放電形成等離子體在金屬表面，熱處理方面的應用，滲氮是強化金屬表面的一種熱處理方法，是將金屬零件置於活性氮的介質中，在一定溫度和保溫時間下，低光壓氣體在電場作用下使之電離產生能電子、高能離子和高能中性原子。 -
In this paper, plasma - enhanced chemical vapor deposition ( pecvd ) technique was used to deposit the dielectric p - sio2 films and p - sion films on the silicon wafer under the conditions of low temperature and low pressure with teos organic sourse. this research was focused on the evaluation of film growth, hardness, stress, resistance and refractive index, by changing the experimental parameters including rf power, substrate temperature, chamber pressure, and the flow rates of teos, o2, n2. the results showed that the p - sio2 film was smooth, dense, and structurally amorphous
實驗結果顯示，用pecvd法淀積的p - sio _ 2膜是一表面平坦且緻密的非晶質結構的薄膜，與矽片襯底之間有良好的附著性；在中心條件時生長速率可控制在2600a / min左右；在基板溫度410時有最大的硬度可達16gpa ；其應力為壓縮應力，可達- 75mpa ；薄膜的臨界荷重為46 . 5un 。 -
So we applied low temperature techniques to manufacture the sense film of qcm sensors. at low temperature and low pressure, with n - butylamine as the carbon source material, and with dry hydrogen as the carrying gas, we applied r. f. glow discharge plasma to preparation the working film for the qcm sensors
在「實驗與分析」一章中較為詳細地闡述了採用等離子體化學氣相淀積的方法，以正丁胺作為碳源物質，通過射頻輝光放電在低溫低壓條件下制得了正丁胺等離子體淀積膜。 -
Emission spectroscopy methodology for low temperature discharge plasma of low pressure gas low pressure gas discharge has been frequently utilized to generate plasma in laboratory and application. this kind of discharge is capable of providing various kinds of plasma for any requirements and realizing control of plasma parameters
本文概述了雙原子分子光譜理論，指出了雙原子分子光譜對等離子體光譜診斷學的重要性，總結了應用雙原子分子發射光譜和原子發射光譜進行等離子體診斷的原理和實現方法，給出了幾個常用的雙原子分子的光譜數據。 -
Microwave plasma chemical vapor deposition ( mpcvd ), a kind of chemical vapor deposition method with low temperature ， low intensity of pressure and clearance ， is commonly used for the growth of diamond thin films
微波等離子體增強化學氣相沉積法（ mpcvd法）是眾多低氣壓下激活cvd工藝方法的一種，也是目前在國內外比較流行的制備金剛石薄膜的工藝方法之一。 -
Thermal spraying - low pressure plasma spraying ni - co - cr - al - y - ta alloy coating
熱噴塗低壓等離子噴塗鎳-鈷-鉻-鋁-釔-鉭合金塗層 -
P. k. bachmann, chapter 3, “ microwave plasma cvd and related techniques for low pressure diamond synthesis, ” in thin film diamond, chapman & hall press, p. 31 - 53
彭國光， 「微波電漿化學氣相沉積法之鉆石薄膜的成長與特性研究， 」國立清華大學材料科學工程系博士論文（ 2002 ）
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