mixed high technique 中文意思是什麼

mixed high technique 解釋
混合高頻發射技術
  • mixed : adj 1 混成的，混合的。2 混雜的，各式各樣的。3 男女混合（成）的；各階層混合成的。4 〈英國〉男女同...
  • high : adj 1 高的〈指物，形容人的身高用 tall〉；高處的；高地的。2 高級的，高等的，高位的，重要的。3 高尚...
  • technique : n. 1. （專門）技術；（藝術上的）技巧，技能。2. 手法〈如畫法，演奏法等〉。3. 方法。
  1. Among these methods, magnetron sputtering is the most widely used technique for preparing thin films owing to its high deposition rate and good uniformity etc. in my experiment, zao films were prepared by dc magnetron sputtering in pure argon gas atmosphere using zno target mixed with al2o3 ( lwt %, 2wt %, 3wt %, 4wt % respectively ) and the films were figured by xrd, sem, xps, afm and ftir, uv photometer

    本研究課題以氧化鋅鋁靶為靶材，採用直流磁控濺射工藝在純氬氣氣氛中沉積zao薄膜。靶材中al _ 2o _ 3的摻雜比例分別為1 、 2 、 3 、 4 。用xrd 、 sem 、 xps 、 afm和紅外、紫外分光光度計等測試手段對沉積的薄膜進行了表徵。
  2. At the support of the national natural science fund ( high technique, new concept, new design research ) ( 59685003 ) " study of the integrated performance modeling and optimal design method of the mechanical structure system ", the support plan of the ministry of education for the young excellent teacher ( 1766 ) " study of the mixed soft computation of the mechanical structure based satisficing criterion ", sichuan century excellent young subject leader fund " study of the theory and method of the intelligent optimization of mechanical structure ", and the open project fund of the mechanical transmission state key lab " fuzzy reliability analysis and satisfactory optimization study of mechanical transmission ", the author has the opportunity to touch this new subject and is attracted by it, then make an attempt at it

    在國家自然科學基金（高技術新概念新構思探索） （ 59685003 ） 「機械結構系統綜合性能映射建模及優化設計方法研究」 、教育部優秀青年教師資助計劃（ 1766 ） 「基於令人滿意準則的機械結構系統混合軟計算研究」 、四川省跨世紀傑出青年學科帶頭人培養基金「機械結構系統智能優化原理方法研究」和機械傳動國家重點實驗室開放課題基金「機械傳動模糊可靠性分析與滿意優化設計研究」的資助下，作者有幸接觸這個新的研究方向，被它的風采所吸引，也嘗試做了一些微薄的努力。
  3. Among these methods, magnetron sputtering is the most widely used technique for preparing thin films, owing to its high deposition rate and good uniformity etc. ito films were prepared by rf and dc magnetron sputtering in pure argon gas atmosphere, using in2o3 and in target mixed with sno2 ( 10wt % ) and sn ( 7wt % ) respectively

    其中磁控濺射工藝具有沉積速率高均勻性好等優點而成為一種廣泛應用的成膜方法。本研究課題分別以氧化銦錫靶和銦錫合金靶為靶材，採用射頻磁控濺射和直流反應磁控濺射工藝在氬氣氣氛中沉積ito薄膜。靶材中sno _ 2和sn的摻雜重量比例分別為10和7 。
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