optical alignment 中文意思是什麼
optical alignment
解釋
光學調整-
In the wafer - cycle fitting algorithm, comparing with circumgyration radius approach, track fitting approach, and least square circle fitting approach. in the wafer pre - alignment system, the wafer square fitting algorithm - least square circle fitting approach, based on optical linear ccd sensor, as well as the theoretical error analyze of this algorithm
在晶圓檢測演算法方面，比較回轉半徑法、軌跡擬合法以及最小二乘圓法，選擇光學線陣ccd的晶圓圓心最小二乘圓法作為系統晶圓圓心的檢測方法。 -
In this thesis, the work on automatic alignment system is as follows : firstly, after the methods and optical systems for alignment whose are used commonly now are discussed, a new die leveling method based on auto - focus is presented for the flip chip bonder. auto - focus is completed by estimating from images ; die leveling is completed by focusing for several feature locations
本文針對倒裝貼片機的自動對準系統開展了以下幾方面的工作:首先在討論了現有的對準方法和自動貼片機的對準光路系統基礎上，針對貼片機實際應用環境，提出基於多點自動對焦的晶元調平方法。 -
Micromanipulation is an important emergency technology developed mainly over the past decade. the micro / nano manipulation systems have been widely applied to mems manufacturing, optical parts alignment, optical fiber connection, laser navigation, biomedical engineering and ic manufacturing
在過去的十年中，微操作技術得到了飛速的發展，微操作系統在mems製造、光學調整、光纖作業、激光制導、生物醫療、 ic製造等領域得到了廣泛的應用。 -
Integrated optomechanical analysis devides rigid - body and aberration, then computes the pv and rms. it provides guidance for design, tolerances allocation and alignment of optomechanical system. finally, abberations are converted to a sort of data form that can be imported by corresponding optical design software to observe their impact upon the optomechanical system imaging performance
光機集成有限元分析方法就是通過分離三種形式的剛體位移和光學表面畸變的pv值和rms值，指導光機系統的設計、誤差分配和裝調，並將數據轉換成光學分析軟體codev可接收的數據形式，對光機系統做整體成像性能評價。 -
In this thesis, by simulating the director alignment, using the characteristics of optical transmission, taking jones matrix we calculate the transmittance of the lcd. by theoretically studying to compensating - film from different aspects, single film and double films, we get that the double - film - compensation has nice compensating effect, especially put the two films in the two sides of lc layer
本文通過模擬液晶盒中指向矢的排列，利用偏振光在其中傳播的特性，採用瓊斯矢量方法計算出光學透過率；通過對不同情況下補償膜（單層、雙層）理論上的研究，得出雙膜補償具有良好的補償效果，尤其是將兩層膜分別放在液晶層兩側。 -
Axis - misalignment error compensation method based on optical alignment for a multi - sensor assembly
基於光對準的多傳感器軸裝配誤差補償技術 -
Each lens features a wide zoom range, and works with the rp607z s optical image rotation system, ensuring quick and simple vertical horizontal alignment and adjustment
Rp607z的光學影像旋轉系統，配合每款鏡頭備有的廣闊變焦范圍，能簡單及迅速地進行垂直或水平方向的排列及調整。 -
Using computer - aided alignment method, the schwarzschild optics was assembled with wave - front error of 18nm in rms value which is a good match to the simulation wave - front error by introducing figure errors of primary and secondary mirrors using zemax optical software. positive resist of zep520 ( nippon zeon co. ltd ) was employed in exposure experiments
在集成后的euvl原理裝置上，採用zep520 （ nipponzeonco . ltd ）正性抗蝕劑及掩模調焦方案，初步進行了透射掩模的曝光復制實驗，國內首次獲得了0 . 75 m線寬的euvl復制圖形，完成了euvl的原理性貫通。 -
Being one of the key technologies of euvl, the alignment of optical lithography system affects directly the final imaging quality of the system
作為euvl關鍵技術之一，微縮投影光學系統的精密裝調直接影響著系統的最終成像質量。 -
Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o. lum - pattern. in recent years, several key technologies have been developed rapidly such as laser producing plasma source, extreme ultraviolet multilayer, optical fabrication and metrology, projection - camara alignment, low - defect mask and control technology of stage
極紫外投影光刻（ extremeultravioletlithography簡稱euvl ）最有可能成為下一世紀生產線寬小於0 . 1 m集成電路的技術，近年來在激光等離子體光源、極紫外多層膜、光學加工和檢測、光學精密裝調、低缺陷掩模、光刻膠技術以及高穩定工作臺系統控制等關鍵技術方面得到了飛速發展。 -
So a computer - aided alignment method for a series of reference lens is studied in detail in this paper. based on analyzing the optical quality affecting factors and optical design, the folio wings are described in detail in this paper : ( 1 ) how to choose merit function of optical quality in terms of the specific reference lens, and sensitive structure parameters to optical quality would be determined according to their tolerance data ; ( 2 ) discussing the relationship between the aberrations and the misalignment of reference lens ; ( 3 ) building the mathematical model for the misalignment optical system, and then calculating the misalignment value by the alignment software compiled on zemax and matlab platforms ; ( 4 ) experiments are made to examine the computer - aided alignment method. the theoretical and experimental data and plots are given in the paper
本文在分析標準球面透鏡的設計及其光學質量的影響因素基礎上，開展了以下四個方面的研究： （ 1 ）根據系列標準球面透鏡的具體結構特點，選擇透鏡的質量評價指標，研究標準球面透鏡的公差分佈，確定敏感結構參數； （ 2 ）研究光學質量評價指標與失調量之間的函數關系； （ 3 ）建立數學物理模型，根據球面波的實測結果，求解待調系統的失調方位和量值，研究原理上實現計算機輔助裝調的可能性，在zemax和matlab平臺上編寫輔助裝調軟體； （ 4 ）建立實驗裝置，實際研究標準球面透鏡的計算機輔助裝調方法，文中給出相應的理論分析及實驗數據和曲線。 -
As a result, just a set of imaging optical components, which used to merely complete alignment, now can be used for the three procedures ? die leveling, auto - focus, alignment. secondly, two vision - based optical systems for alignment are put forward. not only can high - resolution and high - quality images be gotten, but also straightforward hardware setup and good secular stability in the shop can be obtained
對本文所提出的光路結構方案中的成像鏡組在光學自動設計軟體zemax中進行了模擬和優化，成像鏡組與所採用的高解析度ccd相機和不同頻率范圍的led光源獲得了很好的匹配，並在不同頻帶和視場獲得了很好的像差平衡。 -
We have measured the optical properties of a serial of ganas quantum well samples with the same n composition but different well width. using the calculation based on the effective mass theory, we prove that the gan00, 5as0985 / gaas quantum well should have the type - i alignment
我們通過對一系列具有相同n的組分而不同阱寬的樣品的光學特性的測試，以及用有效質量理論計算的分析，發現ganas gaas量子阱應該是第一類量子阱。
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