optical thin plasma 中文意思是什麼
optical thin plasma
解釋
光學薄等離子體-
Al - doped zno ( azo ) thin films are emerging as an alternative potential candidate for ito ( sn - doped in2o3 ) films recently not only because of their comparable optical and electrical properties ( high optical transparency in the visible range, infrared reflectance and low d. c. resistivity ) to ito films, but also because of their higher thermal and chemical stability under the exposure to hydrogen plasma than ito
Al摻雜的zno薄膜，由於具有與ito （ in _ 2o _ 3中適量摻雜sn ）薄膜相比擬的對可見光的高透過率和高電導，又因其在氫等離子體中的高穩定性等優點，已成為替代ito透明導電薄膜的研究熱點。 -
In recent years, al - doped zno ( azo ) thin films has become a hot issue of transparent conductive thin films field and preferred materials instead of ito films not only because of their comparable optical and electrical properties ( high optical transparency in the visible range, low electrical resistivity ) to ito films, but also because of their lower price and higher thermal and chemical stability under the exposure to hydrogen plasma than ito
近年來，由於al摻雜的zno薄膜（ azo ）具有與ito薄膜相比擬的光電性能（可見光區高透射率和低電阻率） ，又因其價格較低以及在氫等離子體中的高穩定性等優點，已經成為替代昂貴的ito薄膜的首選材料和當前透明導電薄膜領域的研究熱點之一。 -
The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate
採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。 -
Abstract : a laser damage facilities, which has mm size spot and operates in tem00 mode ， were achieved. in order to know the reasons of laser damage, the laser energy density was controlled near the damage threshold of the oxide thin films. according to the examined near - threshold damage morphology, the damage mechanisms of the optical coatings can be divided into two types. one was caused by melting of the coating materials, another by exploding, induced with the inner stress of the film. the plasma generated was an important reason to expand the damage area
文摘:採用毫米量級大光斑的近單模的激光器，控制入射薄膜表面的激光能量，獲得了幾種常見單層膜和增透膜的損傷形貌，實驗結果表明，薄膜的損傷可區分為熔化型和應力型兩種，薄膜表面等離子體對損傷斑點的擴大有重要作用。
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