patterning exposure 中文意思是什麼
patterning exposure
解釋
圖像形成曝光- patterning : 測試散彈彈著
- exposure : n. 1. 曝露；曝曬；揭發。2. 【攝影】曝光；膠卷[軟片]張數；曝光時間。3. （房屋的）朝向，方位。4. 商品的陳列。5. 【歷史】（嬰兒的）曝棄。
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Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing
建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型，有助於開發由成品率驅動的版圖設計工具，自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。 -
It is such exposure that gives one an opportunity to bring one ' s vibration up to the next notch, and then release the patterning and karma triggered in such a vibrational bandwidth
也就是這樣的日光沐浴，賦予一個人將振動帶到下一個入口的機會，接著釋放被此類振動頻寬所觸發的模式和業力。
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