phase excursion 中文意思是什麼
phase excursion
解釋
相位偏移-
There are better performances in the films prepared by ba2ca2cu3ox target than by ba2cacu2ox target. the single - phase tl2ba2cacu2o8 hts thin film was obtained with a tc0 of 107k at the optimal tl2o partial pressure and thallination temperature 750. on excursion from the optimal conditions, there exist some impurities in the resultant films resulting in a reduction in tc0 and surface quality with change in the microstructure morphology
研究結果表明，採用成分為ba2ca2cu3ox的靶材制備的薄膜性能要優于成分為ba2cacu2ox的靶材；使用組成式為tl1 . 9ba2ca2cu3oy的鉈片做鉈源時，形成的tl2o分壓達到最佳值；在最佳tl2o分壓和最佳鉈化溫度750的條件下，制備出了純相完全c軸取向的tl2ba2cacu2o8高溫超導薄膜，其tc0高達107k ，膜面均勻平整光滑，呈圓片狀組織；偏離最佳制備工藝參數的條件下，制得的薄膜中都含有一定量的雜相，雜相的生成使得tc0值下降，薄膜表面質量下降，薄膜組織形貌發生變化。 -
The technical noduses of the harmony loading system, such as multi - channel signal synchroniza - tion, signal phase modulating and frequency excursion control are discussed. the key steps and actualization details are also provided
同時，論文探討了協調加載控制系統的主要技術問題，如多餘力、多通道相位協調和頻率漂移的控制等，並給出了系統實現的細節。 -
The binarization, dilation and thinning of interference pattern are stressed. computing the excursion of interference pattern based on fourier transform is based on the fact that interference pattern has different phase at different position, the signal extraction of interference pattern and phase unwrapping algorithm are mainly discussed. computing the excursion of the interference pattern based on the interference pattern intensity distribution is to position the fringe according to the intensity distribution characteristic
基於圖像處理計算干涉條紋漂移量，目的是抽取干涉條紋的骨架，通過條紋骨架的定位實現對條紋的定位，重點討論了條紋圖像的二值化、膨脹和細化；基於傅里葉變換計算干涉條紋的漂移量，是基於條紋不同位置處的相位不同這一事實，重點討論了干涉條紋信號的提取和干涉條紋相位去包裹演算法；基於條紋亮度分佈計算條紋漂移量，是根據條紋自身亮度分佈的特點對條紋進行定位。 -
This approach the problem of conquers phase excursion and frequency drift that anciently adopts fixed frequency filter and its frame is simple
這種方法克服了以往採用固定頻率濾波器帶來的相移和頻率漂移問題，而且結構簡單。
分享友人