photoresist process 中文意思是什麼

photoresist process 解釋
光電導管
  • photoresist : n. 【物理學】光致抗蝕劑。
  • process : n 1 進行,經過;過程,歷程;作用。 2 處置,方法,步驟;加工處理,工藝程序,工序;製作法。3 【攝影...
  1. The paper mainly found on the application of photoresist in the process of ic fabrication to summarize the facets of reaction mechanism, performance index parameters and finally to indicate some new development directions in terms with process evolution target

    主要圍繞光刻膠在積體電路製造中的應用,對其反應機理及應用性能指標進行闡述,重點從工藝的角度去提出新的研究方向。
  2. Intensity distribution in photoresist is analyzed during ldw exposure process in terms of the improved theoretical model and the method of selecting the optimal exposure is described. results of ray - tracing using zemax that is optical design software agree well with the calculated results of theoretical model and l dw experimental results verify the accuracy of the model. therefore this improved model is important significant for directing ldw research

    本文完善了激光直寫光刻理論,分析了直寫曝光中膠層內光場的分佈,探討了最佳曝光量的選擇方案,利用zemax軟體進行光線追跡的結果和理論模擬十分相近,實驗結果驗證了理論模型的正確性,該理論模型對激光直寫光刻技術研究具有重要指導意義。
  3. The process of su - 8 photoresist lithography is researched, and the influence of steps like coating and soft - bake on the lithography is studied

    初步研究了su - 8膠的光刻工藝流程,討論了塗膠、前烘等各個步驟對光刻結果的影響。
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