polishing plate 中文意思是什麼
polishing plate
解釋
拋光板-
We jinli plastic co., ltd is located in huangyan, zhejiang, housewares kingdom in china, our company are specialized to produce melamine wares yearly, we have below these terms, such as melamine service tray, handle tray, oval plate, wavy dish, meat plate, side dish, square deep dish, wavy bowl, bowl with lid, tureen, cutting board, ashtray, salt bottle, pepper bottle, pet bowl, melamine coaster, pot mat etc. our product is in premium - quality, novertive style, good - polishing, and most import, we can keep u very good lowest price
密胺餐具無毒無味耐高溫120耐低溫30 ;質地光滑,類似瓷器;耐沖擊性高,不易破碎破裂率為瓷器的15導熱度低,易手捧及唇觸抗味性高,不易殘存食物之味道耐久性高,可長久性重復使用。是國際流行的不銹鋼陶瓷及一次性餐具的首選替代品。 -
The cmp experiment was carried out systematically on litao3 wafer. the polished surface foughness and material removal rate in different polishing conditions were measured and the effects of polishing pad material and its condition, pressure, rotating speed of the polishing plate, the type and size of abrasive, and the properties of the polishing slurry on the surface routhness and material removal rate were analysed in details
通過對鉭酸鋰晶片的化學機械拋光過程的實驗研究,通過測量鉭酸鋰晶片在不同拋光條件下的表面粗糙度和材料去除率,詳細分析了拋光墊材料和狀態、拋光壓力、拋光盤轉速、磨料種類及粒度、拋光液組成等幾個因素對拋光表面質量和材料去除率的影響規律。 -
In this paper, the developments in ultra - precision polishing technology have been discussed and introduced. based on the existing machining capability of precision lapping and polishing machinery, the force - controlled system for ultra - precision polishing of optical plate substrate with smooth surface has been developed
簡要介紹超精密拋光技術的發展動態,圍繞精密研拋機的現有加工技術水平,開發可實現超精密拋光的控制力系統 -
Deep drawn parts offer the ability to pre - plate the internal working faces with gold, while also work - polishing and hardening the wall to optimize product lifetime
深沖部件提供了對內部工作面鍍金的能力,還可以在工作時拋光和硬化殼壁以延長產品壽命。 -
The analysed results show that the reasonable rotating speed np and distance e between workpiece plate center and polishing plate center are 60rpm and 100mm on ultra - precision surface polishing machine with correction rings, respectively
適合鉭酸鋰晶片化學機械拋光的拋光盤轉速為n _ p = 60rpm ,工件盤中心到拋光盤中心的距離為e = 100mm 。
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