shadow mask 中文意思是什麼

shadow mask 解釋
1. 投影掩模；障板。
2. （彩色顯像管的）遮蔽屏。

  • shadow : n 1 （陰）影；影像；陰暗；黑暗。2 影子；形影相隨的人。3 跟著客人來的人；不速之客；食客。4 〈美俚...
  • mask : n 1 假面具，偽裝，掩蔽物；面罩；防毒面具（＝ gas mask）；【物理學】掩模；（劈劍，棒球等用）護面；...
  1. A new colour crt without shadow mask are introduced in this paper. its structure, operating principle and properties are discussed here. the developed model tube is also described

    摘要介紹了一種新型無蔭罩彩色crt ，對其結構、工作原理及特性作了討論，並對已研製出的樣管作了說明。
  2. A new method for measuring the vibration of shadow mask without touch by detecting the light density with reflection type optical fiber sensor is presented. the measurement system based on the new method is designed to make the vibration measurement easier working, faster calculating, and get more precise results. it is an important measurement and analysis tool to improve the performance of shadow mask and display quality of cpt

    本文提出了基於單光纖光強度反射法的非接觸式微振動測量系統的原理，並設計製造了該測試系統，探索出了簡單方便可靠的測量方法，能夠準確客觀地反映蔭罩振動的各項參數（各振動模的振動頻率、振幅、衰減時間） ，實現了測試裝置的簡便化和測試過程的自動化，為cpt張緊式蔭罩系統的性能改進與顯示質量的提高提供了有效的測試分析手段。
  3. Part 2 analyses beam landing shifts made by thermal deformations of a shadow mask and vibration of a new type of shadow mask - aperture grille. an automatic measurement system for cpt decolorization and a vibration measurement system for aperture grille are established. part 3 analyses the difference of perception and discrimination to color between the human eyes and ccd system, and develops a new method based on ccd technology to evaluate the screen white - balance

    主要內容分為三部分： （ 1 ）分析著屏電子束分佈與電子槍、偏轉系統及蔭罩之間的關系，研製自動測試裝置，為設計和改進相關結構提供依據； （ 2 ）分析蔭罩熱變形和振動對顯示屏色純度影響，建立了色純漂移自動測試裝置和張緊式蔭罩振動測試系統； （ 3 ）分析了人眼與ccd對彩色刺激的不同響應，建立了基於ccd的顯示器全屏色純均勻性測試方法。
  4. Using 3 - d topography measurement of microelectronics substrate as the background, this paper studied the mechanism and method of accurate measured mechanical quantity through moir fringe, which provided a non - contact, high - speed and high accuracy measuring technique for the microelectronics substrate and for other information products ( like shadow mask )

    摘要以微電子基板的三維形貌測量為背景，研究了莫爾條紋精細測量機械量的機理與方法為微電子基板及其他信息產品（如電視機蔭罩）提供非接觸、快速和高精度的測量技術。
  5. Aberration of electronic lens made by electron gun and aberration of magnetic deflection system made by dy are comprehensively investigated, so is the shadow mask ' s effect on electron beam landing screen error. the conclusion can be get that, because the distribution of electron beam landing screen ( distribution of luminance ) is affected by many kinds of factors, it cannot get the correct function by calculation, and should be get by measurement instead

    全面分析了cpt電子槍發射系統形成的電子透鏡像差與磁偏轉系統形成的偏轉像差；分析了蔭罩的自身厚度與位移對電子束著屏的影響，並由此得出結論，著屏電子束分佈（即亮度分佈）受著許多因素的影響，理論分析是半定量的，著屏電子束分佈需要用精確的測量儀器來測量。
  6. The effect on display characteristic made by thermal deformations of the shadow mask is comprehensively investigated. by using the electron beam distribution automatic measurement system with a micro - deflective coil, a concave spot in luminance distribution can be get. it changes its position when the shadow mask changes its form

    本文系統全面地分析了傳統蔭罩的各類熱變形對顯示屏特性的影響，利用本文研製的電子束亮度分佈自動測試系統，附加一個微偏轉磁場，使相鄰兩電子束打在同一顏色的熒光粉條，並形成一個亮度凹點，當蔭罩變形時，凹點位置作相應的位移，以此原理跟蹤測量凹點位移量，即可得到色純漂移動態變化曲線。
  7. The shadow mask is the critical component of the colour picture tube and the important component for the choice of colour, its function concentrates on the limitation of electronics bound diameter and the screening direction, the electronics bound which is sent by the electronics gun goes scanning, during the scanning process, we should guarantee every bound gathering into the small holes situated on the screen, then these bounds will point to the regularized position through the small holes on the flat mask, and then three basic colours will be produced, at the same time, those useless electronics will be blocked by the mask board

    平板蔭罩是彩色顯像管的關鍵部件之一，是一個重要選色元件，其作用是限制電子束直徑和上屏方向，由電子槍發射的電子束在偏轉磁場的作用下進行掃描，掃描過程中必須使每個電子束只能射中熒光屏上的為該束指定的那些小孔上會聚，並通過蔭罩上諸多的小孔分別打到各自對應的熒光質點上，發出三種基色（紅，綠，藍） ，而無用的電子則被蔭罩板截獲。
  8. In the eme model, the electron energy balance equation is taken into account and the transport coefficients are assumed to be the functions of the electron mean energy. in this paper, a software is programmed to simulate the discharge process of plasma display cell of coplanar - electrode type, the matrix - electrode type and the novel shadow - mask pdp according to the gas discharge mechanism and fluid simulation theory. the simulation results show that both lfa model and eme model can be used to investigate the discharge characteristics of the cell, but the eme model is preferred for its better coincidence with theories and experiments

    在本文中，分別使用本地場近似的lfa （ localfieldapproximation ）流體模型和假設碰撞反應系數、傳輸系數和電子的平均能量相關的eme （ electronmeanenergy ）流體模型對pdp放電過程進行模擬，比較分析模擬結果，得出eme模型和lfa模型對放電的繁流、起輝放電、熄滅等過程的描述的基本趨向是大致相同的，而從模擬工作電壓與實際電壓的接近程度和放電效率角度比較， eme模型的模擬結果跟理論和實驗結果更為相符。
  9. On a layer lower, picture the mask shadow with the next tool ( brush tool ) and blur it out

    在頭頭下面新建一層，是用畫筆工具給頭頭畫個影子，並使用濾鏡-模糊-高斯模糊將影子進行一下模糊處理。
  10. The characteristics of shadow - mask pdp are compared with those of coplanar - electrode pdp by eme model. the result shows that the shadow - mask pdp has many advantages, such as the greater mean value of the particle densities, the higher response speed and discharge efficiency. moreover, how to optimize the cell structure of shadow - mask pdp has been investigated

    模擬結果表明，在相同的模擬工作電壓下，蔭罩式結構中的各種粒子的平均濃度均比表面放電式結構提前達到峰值，且平均濃度的最大值比表面放電式高，放電效率也高於表面放電式結構，這意味著新型蔭罩式結構的亮度高，響應頻率快。
  11. To local minimum areas. with the ability of modulation to mask the unreliable areas such as noise, local shadow, and the ability to deal with under - sampling areas successfully, the new algorithm can be applied to complex phase unwrapping

    新演算法不僅保留了調制度函數本身處理局部陰影噪聲等截斷位相不可靠區域的能力，而且對于采樣不足的區域有著很好的處理效果，適用於復雜的位相場展開。
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