sputter 中文意思是什麼

音標 ['spʌtə]
sputter 解釋
vi. 不及物動詞 ,vt. 及物動詞 1. 飛濺唾沫；（食渣等）飛濺。
2. 唾沫飛濺地說；激動地爭吵。
3. （濕柴）劈劈啪啪地爆裂。
4. 爆響著停熄掉，停息 （out）。
n. 名詞 1. 急語；吵鬧，爭論。
2. 噴濺聲。
3. 劈啪聲。
n. 名詞 -er 1. 語無倫次[說話氣急敗壞]的人。
2. 發劈啪聲的東西。

  1. For vlsi, a plane surface may be approximated by depositing the interlevel dielectric by bias-sputter deposition (see section 9. 2. 4) or by using planarization.

    對于超大規模集成電路的平面狀表面，可以用偏置濺射淀積法的層間介質淀積（見924節）或用平面化工藝來近似獲得。
  2. Compared with sputter crater depth results measured with surface profilometer, the converted depth results obtained by gd - oes were accurate and credible

    輝光光譜定量轉化所得深度結果與表面形貌儀剛定相應濺射坑的深度結果對比發現，本方法定量轉化深度結果準確可靠。
  3. After 40 hour irradiation time, about 7 ci of radioactive isotope 64cu was produced via 63cu ( n, y ) 64cu reaction. after simple disposal, the irradiated copper sample was installed in the high - intesity ion sputter source on the hi - 13 tandem accelerator. then 64cu ions extracted from the high - intesity ion sputter source and injected into the tandem accelerator, 64cu ions can be accelerated to an energy of 80 mev and formed the off - line rnb since natural

    S ）的熱中於通量下，經過34個半衰期輻照，通過『 u … ， y ）生成放射性l司位素『 cll ，然後將放射性銅靶錐注入串列加速器強流濺射離于源中，引出mcll負離于，經刁串列加速器加速而得到能量為80mcv的離線放射性核束「 cll叭。
  4. Our factory specializes in manufacturing cabinet vacuum coaters, magnetic control sputter coaters and vacuum exhaust equipments, industrial boiler, all kinds of valves, coaters and press packer specially used in the industry of quartz crystal

    我廠是國內專業生產箱式真空鍍膜機、磁控濺射鍍膜機、真空排氣設備、石英晶體行業專用被銀機和壓封機、工業爐及各種真空閥門設計製造的專業廠家。
  5. Be aware that the infant will cough, sputter, and choke during feedings.

    注意小兒在吃奶時會咳嗽，噴濺或嗆噎。
  6. Standard guide for performing sputter crater depth measurements

    濺射焰口深度測量標準導則
  7. Fachun lai, limei lin, zhigao huang, rongquan gai, yan qu ， effect of thickness on the structure, morphology and optical properties of sputter deposited nb2o5 films, applied surface science 253 ( 4 ), 1801 - 1805 ( 2006 )

    李雪蓉，賴發春，林麗梅，瞿燕，測量條件對摻錫氧化銦薄膜電學測量結果的影響，物理實驗已接受待發表（ 2007 ）
  8. Vacuum technology - sputter - ion pumps - measurement of performance characteristics

    真空技術.噴射離子泵.功能特性的測定
  9. In this paper, several thin films samples of vanadium oxide were got by high - frequency magnetron sputter with pure metal vanadium as sputter source

    本文以高純金屬釩作為靶材，採用磁控濺射工藝制備氧化釩薄膜。
  10. Scanning electron microscopy : after fixed in 2. 5 % glutaraldehyde made up in 0. 1 m phosphate buffer ( ph 7. 2 ), the tissue of testis was post - fixed in 1. 0 % oso4, dehydrated in a progressive ethanol solution, dried and sputter - coated with gold, then observed with kyky - 1000b microscopy and photographed

    掃描電鏡樣品以2 . 5戊二醛（ ph7 . 2 ， 0 . 1m lpbs緩沖液配製）和1鋨酸雙固定，酒精系列脫水，乾燥，真空離子濺射儀噴金， kyky - 1000b型掃描電鏡觀察並拍照。
  11. In order to optimize parameters of sputter - depositeing used to manufacture silicon - based tm films in the next step, the dissertation analyses and explains the difference between the two surfaces of sputtered tini film from sputtering factors

    為優化濺射工藝參數以用於后續的硅基tini薄膜制備，本文從工藝因素入手，對玻璃基濺射薄膜兩個表面的質量差異進行了分析，並給出合理解釋。
  12. A control system for the thickness of ion beam sputter ( ibs ) coating is introduced in this paper. the basic principle of ibs coating machine is discussed. this paper also gives the scheme of hardware and sofeware

    本文介紹了離子束濺射鍍膜機膜厚控制的一種實用的系統，文中論述了離子束濺射鍍膜機的工作原理及鍍膜厚度控制系統的硬、軟體的實現方案。
  13. Sims measuring widths of interfaces in sputter depth profiling using sims

    用次級離子質譜法
  14. For vlsi, a plane surface may be approximated by depositing the interlevel dielectric by bias - sputter deposition ( see section 9. 2. 4 ) or by using planarization

    對于超大規模集成電路的平面狀表面，可以用偏置濺射淀積法的層間介質淀積（見9 2 4節）或用平面化工藝來近似獲得。
  15. Closed field unbalanced magnetron sputter iron plating technique and it ' s application to cutting tools

    閉合場非平衡磁控濺射離子鍍技術在切削刀具上的應用
  16. Reactive sputter etching system

    反應性濺鍍蝕刻系統
  17. Standard practice for approximate determination of current density of large - diameter ion beams for sputter depth profiling of solid surfaces

    固體表面濺射深度仿形加工用大直徑離子束的電流密度近似測定的標準規程
  18. Surface chemical analysis - sputter depth profiling - optimization using layered systems as reference materials

    表面化學分析.濺鍍深度造型.利用分層系統作為標準物質的優選法
  19. Si - rich si02 films have been prepared by a rf magnetron sputter method and their photoluminescence, as well as infrared spectroscopy, has been measured for the as - deposited and annealed films

    4ev小於sev ，不能激發民帶吸收。其次是pl強度隨t 。升高而增強，與出注入a 。
  20. Shielding the magnetic field from the target and placing a magnet below the substrate, a new magnetron sputtering method is achieved. by such these arrangements, we found that it becomes easier even to sputter magnetic target

    國債是政府憑借其信用，為籌集資金而公開發行的到期需還本付息的一種有價證券；是政府用來緩解財政壓力、實施宏觀經濟調控和現代金融管理的重要手段。
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