uniform deposition 中文意思是什麼

uniform deposition 解釋
均勻沉積
  • uniform : adj 1 （形狀、性質等）一樣的，同一的；一致的；相同的。2 一貫不變的；始終如一的。3 規格一致的，均...
  • deposition : n. 1. 免職，罷免；廢位。2. 淤積[沉積]（物，作用）。3. 耶穌從十字架上放下（的畫、雕刻）。4. 寄存，委託；委託物。5. 【法律】口供，證言；口供書。
  1. The properties of thin films have been investigated with modern analysis technique, such as afm ( atom force microscopy ), sem ( scanning electron microscope ), xrd ( x - ray diffraction ) and rocking curve ( - scan ). and the properties of ybco thin film and its substrate and deposition temperature have been analysed, comparing with lao substrate ' s crystallization quality, ybco thin film properties, such as morphology and degree of grain alignment, was concluded to correlate with the crystal orientation uniform of lao substrate as revealed by xrd

    本文結合afm 、 sem研究ybco薄膜的表面形貌， xrd 、 fwhm分析薄膜的結晶情況，並結合成膜溫度和基片的質量進行一系列結構與性能的對比研究，發現laalo3 （ lao ）基片的質量對ybco薄膜的結構完整性有很大影響，不僅影響了薄膜的c軸取向性，而且影響了ybco的超導性能。
  2. Uniform and compact plzt and sno _ 2 ceramic targets, which diameter were 212mm and 221mm, respectively, had been successfully fabricated. ( 2 ) a rotating magnetic field rf magnetron sputtering system had been designed and set up, which showed high utilization efficiency of target, high films uniformity, and high deposition rate, etc. ( 3 ) the plzt and sno _ 2 thin films were investigated by afm, xrd, sem, and spectral photometer. the optimized processing parameters of preparing these films had been found

    並以此為基礎分別制備了緻密、均勻、平整、直徑為212mm的plzt和221mm的sno _ 2陶瓷濺射靶材; （ 2 ）為克服現有磁控濺射設備的不足，提出了一種新的磁控濺射方案，採用該方案的設備具有:靶材利用率高、鍍膜均勻、成膜速度快等特點; （ 3 ）運用afm 、 xrd 、 sem以及雙光路分光光度計等分析手段對plzt和sno _ 2薄膜的微結構和性能進行研究，找到了制備plzt電光薄膜和sno2透明電極材料的最佳工藝條件。
  3. To obtain the ultra fine atc ceramic with fine, uniform grain and high mechanical properties and solve the problem of brittle of ceramic, the technique of electroless cobalt plating under low temperature and ultrasonic was used to get a cobalt deposition on nano / micro al2o3, tic ceramic. the nano / micro al2o3 - tic - co composite powder with different cobalt content was prepared by changing the load. the composite powder was then hot - pressed into a ultra fine composite ceramic

    為了得到品粒細小、均勻，力學性能優異的co - al _ 2o _ 3 - tic （ atc ）復合陶瓷，解決陶瓷的脆性問題，本文在化學鍍鈷制備高性能atc復合陶瓷的基礎上，採用超聲波化學鍍方法，以提高鈷在陶瓷粉末以及al _ 2o _ 3與tic陶瓷顆粒之間的分佈均勻性，以期進一步提高atc陶瓷的力學性能。
  4. Electroless plating nickel is a kind of electroless deposition process with extensive applicaton. compallng with electro - depositon process, the process has a lot of advamages, such as easy operation, low process condition, uniform electroless plating film

    化學鍍鎳是一項已獲得廣泛應用的無電沉積方法，同電沉積相比，它有操作簡便、設備條件要求低、鍍層均勻等優點，其發展勢頭迅猛，前程未可限量。
  5. Spray deposition is a new kind of near - net shape metal forming technology which is used to manufacture rapid solidification advanced materials with the characteristics of uniform composition, high density, low oxygen tension and small degree of segregation

    噴射沉積技術是制備快速凝固高性能材料的新型金屬近成形技術，沉積坯件具有成分均勻、組織細化、緻密度高、含氧量低、偏析程度小等特徵。
  6. The first application of this new technology, developed by professor jimmy yu chai - mei of the department of chemistry, involves the deposition of a uniform nanometer titanium dioxide coating on a solid substrate

    這項由香港中文大學化學系余濟美教授研發的技術，可以在固體材料表面形成一層納米晶態二氧化鈦薄膜。
  7. The experimental results show that dlc film could be deposited on silicon substrate rapidly and uniformly in a large area by means of ablated plasma jet generating on the target surface during hipib irradiation, the instantaneous deposition rate is as high as imm / s and the uniform deposition area covered 40 - 50 cm2

    實驗結果表明，利用hipib燒蝕等離子體在si基體上可以實現快速、大面積、均勻地沉積類金剛石薄膜，薄膜的瞬時沉積速率達到1mm s ，均勻薄膜的面積達到40 ? 50cm ~ 2 。
  8. The composite films exhibited linear ( or nearly linear ), uniform, and regular layer - by - layer growth in a wide range of deposition solution concentrations. the films showed a uniform and smooth surface in a large area and good environmental and thermal stabilities

    復合膜在廣泛的沉積濃度范圍內均表現出線性（或近似線性）的層接層均勻規則的生長，膜表面在很大面積內比較均勻平坦。
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