v cvd 中文意思是什麼
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V - class thermistor film is successfully produced on silicon substrate and sio2 substrate applying cvd process for the first time in this paper, whose minimum thickness is only 600nm or so
本論文創沃性地採用十導體cvd工藝在硅中晶1底以及引；襯底1二if長出最小厚度為600urn的v系熱敏電阻薄臟。
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