x-ray beam x 中文意思是什麼

x-ray beam x 解釋
射線束
  • x : X2＝ （羅馬數字）10 XX ＝ 20 IX ＝ 9 XV ＝ 15 XL ＝ 40 LX ＝ 60 XC ＝ 90 DXL ＝ 540 MX ＝ 1010 ＝...
  • ray : n 雷〈姓氏，男子名， Raymond 的昵稱〉。n 1 光線，射線，熱線；〈詩〉光輝，閃爍，曙光，一線光明。2 ...
  • beam : n 1 梁，棟梁，桁條；（船的）橫梁。2 船幅；（動物、人的）體幅。3 （秤）桿，杠桿，（織機的）卷軸，...
  1. The phenomenon of interference is presented when the x - ray beam hits the thin layer sample at glancing angle, the angles corresponding maximal and minimal intensity of x - ray fluorescence are described when the phenomenon of double - beam interference or multiple - beam interference is occurred

    介紹了掠射x射線與薄膜樣品作用時產生的干涉現象，給出了x射線雙光束干涉和多光束干涉產生極值的條件。
  2. A high beam energy is also used to stimulate x-ray emission of higher-energy peaks.

    高能量電子束也能用來激發高能量X射線峰的發射。
  3. A high beam energy is also used to stimulate x - ray emission of higher - energy peaks

    高能量電子束也能用來激發高能量x射線峰的發射。
  4. It was found that the schorl or dravite in schorl - dravite group that is produced from pegmatite and has good crystal degree had a strong intensity of spontaneous polarity by electron - beam bombardment and x - ray diffraction of varying the temperature

    利用電子束轟擊結合變溫xrd分析發現在schorl - dravite系列電氣石中，產于偉晶巖的，結晶度比較高的mg電氣石或fe電氣石具有較高的自發極化強度。
  5. X - ray source with micro - beam produced with slow highly charged ions

    聚焦慢速高荷態重離子束微束斑x射線源
  6. X - ray beam collimator x

    射線束準直器
  7. In order to eliminate the beam - hardening artifacts, most current correction algorithms have to assume that the x - ray beam spectra are known and the mass attenuation coefficients of the detected object related to different energy are given

    目前的多數射束硬化校正演算法需假設已知ct系統的x射線能譜，並已知構成被測物體的物質關于不同能量的光子的質量衰減系數。
  8. X - ray collimator subsystem is the important part of x - ray machine, and its main function is confine the scope of x - ray beam, to reduce the radiation harm to patients ; another function is realizing the multi - scope exposure on one film working with the film motion and shielding system

    X光機限束器子系統作為x光機的重要組成部分，其主要用於對x光束的照射范圍進行限定，以減少對患者的輻射，以及配合點片系統實現對x光膠片的多分片功能。
  9. Centering at soft x - ray multilayer uniformity technology, we introduce general situation of multilayer, design of multilayer structure, simulation calculation, ion - beam sputtering deposition and evaluation of samples. above all, we carry out study of improving uniformity of period thickness spatial distribution, and develop correction mask for controlling period thickness. as a result, we improve uniformity from 4. 5 % to 2. 0 %, the error of period thickness on ( 130nm field is controlled within 0. 18nm, and the reflectivity reach 35 % at center wavelength 17. 1nm

    特別地，我們設計並應用膜厚擋板補償技術控制多層膜的膜厚分佈，將膜厚分佈非均勻性從4 . 5減小到2 ，周期厚度絕對差值控制在0 . 18nm以內，並且制備得實際多層膜樣品在中心波長17 . 1nm處實測反射率達到35 ，達到實用水平。
  10. In this thesis, to increase the aspect ratio of liga process, several important influence factors were discussed, which includes the structure and performance of liga mask, x - ray intensity and x - ray spectrum of beam lines, the characteristic of pmma resin and the micro electroforming parameters. the au - pi mask and the au - si mask were designed by xop and origin software, after the difference between the spectrum of 3w1 and 3b1 beam line had been contrastively analyzed

    本文著眼于liga技術高深寬比方面的研究，以提高本實驗室用liga技術製作微細結構的深寬比為目的，從分析各因素影響深寬比的機理出發，再加以理論設計和實驗工藝的優化和改善，分別研究討論了影響深寬比的幾大重要因素：掩模結構和性能、光源光譜和光強、 pmma光刻膠性能、電鑄工藝參數等。
  11. Chapter 2 : the beam propagation of x - ray in an inhomogeneous plasma with a continuous varied refractive index is studied. we emphasize, theoretically and numerically, on the analysis of the effect of refractive index gradient on the beam parameters

    第二章：研究了x射線激光光束在折射率連續變化的非均勻等離子體介質中的傳播，從理論和數值模擬上著重討論了折射率梯度效應對光束參數的影響。
  12. Fabrication of the beam splitters with large area for soft x - ray laser applications

    射線激光用大面積多層膜分束鏡研製
  13. X - ray beam limiting devices

    X射線束約束裝置
  14. X - ray beam stop, x

    射線光束截捕器
  15. To ensure the beam does not loiter on the parchment and damage it, the researchers have had to design the procedure so that the x - ray beam cannot be on when the manuscript is stationary

    為了確保射線不會散射在羊皮卷上造成損壞，研究者們必須設計出一種方法在手稿處于穩定狀態[ 3 ]時關閉x射線。
  16. Molecular beam epitaxy ( mbe ) has been used to grow insb heteroepilayer on gaas ( 001 ) substrate with optimized low temperature buffer layer. the surface morphology and crystal quality of insb epilayers have been investigated by means of atomic force microscope ( afm ), scanning electron microscopy ( sem ) and double crystals x - ray diffraction ( dcxrd )

    本文採用分子束外延（ mbe ）方法在gaas （ 001 ）襯底上優化低溫緩沖層生長條件制備了異質外延insb薄膜，採用原子力顯微鏡（ afm ） 、掃描電鏡（ sem ）與x射線雙晶衍射（ dcxrd ）等方法研究了insb / gaas薄膜的表面形貌與結晶質量。
  17. At present, euv / x - ray optical component are in great demand on the construction of the rapidly developed synchrotron radiant lamp - house and beam of light engineering in developed countries

    目前世界各發達國家迅速發展的同步輻射光源與光束線工程的建設需要大量的euv x - ray光學元件。
  18. The attention of the conference is paid to the trends and developments in micro - beam techniques, total reflection x - ray fluorescence analysis, new x - ray detector developments, film and coat analysis, sample preparation techniques and semi - conductor material analysis, etc

    會議期間，關于微束裝置及其分析技術、全反射技術與應用、探測器研製、薄層分析、樣品制備、半導體材料分析等，受到廣泛關注。
分享友人
分享到 Line

分享到臉書