掩模光刻機 的英文怎麼說
中文拼音 [yǎnmóguāngkèjī]
掩模光刻機
英文
mask aligner-
The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated. an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out
對全息光刻的原理、理論、實現方法及傳統光掩模?全息掩模?抗蝕劑圖形傳遞機理進行了深入的研究，設計和建立了採用直角棱鏡和折射率匹配液的全內反射波前共軛全息光刻實驗系統，進行了實驗研究。In this thesis, to increase the aspect ratio of liga process, several important influence factors were discussed, which includes the structure and performance of liga mask, x - ray intensity and x - ray spectrum of beam lines, the characteristic of pmma resin and the micro electroforming parameters. the au - pi mask and the au - si mask were designed by xop and origin software, after the difference between the spectrum of 3w1 and 3b1 beam line had been contrastively analyzed
本文著眼于liga技術高深寬比方面的研究，以提高本實驗室用liga技術製作微細結構的深寬比為目的，從分析各因素影響深寬比的機理出發，再加以理論設計和實驗工藝的優化和改善，分別研究討論了影響深寬比的幾大重要因素：掩模結構和性能、光源光譜和光強、 pmma光刻膠性能、電鑄工藝參數等。A novel patterning technology of fine - pitched carbon nano tubes pixels on photo resists layer has been developed by lift - off process. another new sealing technology named flat panel sealed method in vacuum chamber for fed or other electro - vacuum devices has also been developed. the screen printed carbon nano tube field emission display device fabrication process has been set up and a 2
建立了一種採用光刻膠作掩模的直接剝離方法，並可獲得高密度線條分佈的碳納米管冷陰極；建立了一種電真空器件的真空原位平面封裝方法；建立了一整套較為完善的碳納米管場發射冷陰極印刷制備及場發射顯示器件制備的工藝流程，並成功獲得2 . 2英寸碳納米管動態顯示原理型樣機。
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