曝光器 的英文怎麼說

中文拼音 [guāng]
曝光器 英文
exposer
  • : 動詞[書面語] (曬) expose to the sun
  • : Ⅰ名詞1 (照耀在物體上、使人能看見物體的一種物質) light; ray 2 (景物) scenery 3 (光彩; 榮譽) ...
  • : 名詞1. (器具) implement; utensil; ware 2. (器官) organ 3. (度量; 才能) capacity; talent 4. (姓氏) a surname
  • 曝光 : exposure
  1. Standard practice for operating open flame carbon arc light apparatus for exposure of nonmetallic materials

    非金屬材料用明焰碳弧操作的標準規程
  2. Standard practice for operating enclosed carbon arc light apparatus for exposure of nonmetallic materials

    非金屬材料用封閉式碳弧操作的標準規程
  3. Specification for direct reading pocket type electroscope exposure meters

    直讀袖珍式驗電表規范
  4. Set the shutter by pressing and holding the exposure - compensation button, which also bears a small time value ( tv ) label, and turn the up / down dial until the desired speed, in numeric half steps, appears in the viewfinder or lcd

    按住補償鍵+ / - ,它也肩負著tv功能,調節主控撥盤直到需要的速度,速度以1 / 2級調節並在取景或lcd屏中出現。
  5. The shutter speed flashes in the viewfinder display when the subject is underexposed or overexposed

    當被攝體呈欠或過時,快門速度將在取景中起閃爍。
  6. Likewise, a subject may be overexposed even when the fastest shutter speed ( i. e., 1 2000th second ) is set “ 2000 ” flashes in the viewfinder display

    同樣,一個拍攝對象也可能在快門速度最快時( 1 2000秒)過量,取景顯示會出現閃動的「 2000 」字元。
  7. As the right combination of exposure time and aperture varies for different celestial objects shooted and equipment used, bracket exposure two stops either way is recommended in order to find out the best exposure time

    使用不同的儀拍攝不同的天體,均要求不同的時間與圈。拍攝時多試上下兩級的即1 4 1 2 2及4倍,可以更準確找出正確的時間。
  8. It is promising to use this technology in the fabrication of oeics to solve the incompatibility problem. in laser assisted microprocessing, time is an important parameter, which has effect on component ’ s performance, so temperature distributing for small laser - processed region must be well measured

    在激誘導擴散等半導體激微細加工過程中,溫度是一個很重要的參數,它對件的性能有很大影響,因此微小區域的溫度分佈是關鍵的工藝參數,必須得到精確的測量。
  9. Any shutter speed aperture selectable in 12 ev or 13 ev increments ; correct, over - under - exposure indicated in viewfinder ; bulb also selectable

    可選擇任何圈值及快門速度,每次以12ev或13ev增減;觀景內及導向顯示屏上會顯示影像是否正確、過度不足;可選擇bulb
  10. Exposure compensation can be set within the range of 4 ev in 0. 5 ev increments

    如當前設定超過測定范圍,取景顯示中的快門速度將會閃爍。
  11. The shutter speed in the viewfinder display flashes when the current exposure setting is beyond the exposure metering range

    如當前設定超過測定范圍,取景顯示中的快門速度將會閃爍。
  12. Note that the viewfinder display may vary slightly according to the current shutter speed and settings ( i. e., ae lock, exposure metering, flash, bulb, and exposure compensation settings )

    請注意,這時取景的顯示相應于當前的快門速度和設置(自動鎖定、測定、補償等)會稍有變化。
  13. Verification scheme of measuring instruments for light exposure

    量計量具檢定系統
  14. The metering will be affected by the film divider, so that the metering result can ' t show the needed exposure

    由於分幅會影響測系統,測結果不能真實地反映所需的量。
  15. Monitor temperature control of exposure room. safely operae

    室監控溫度、維護機操作安全。
  16. Test instruments for movie - and still - picture cameras with automatic exposure controls

    自動控制的電影攝影機和照相機用測試儀
  17. Currently they are fabricated by lithographic process, which is very expensive and time consuming since it is a several step process. the laser direct writing system is the kind of tool that exposes the precision patterns by the micro - spot on the photosensitive material

    所謂激直寫,就是利用聚焦的激束,由計算機控制聲調制的通斷以及平臺的移動,在刻膠上進行,經過顯影后得到所需要的圖形。
  18. X - ray full wafer aligner x

    線整片晶圓對準曝光器
  19. Scanning projection aligner

    掃描型投影對準曝光器
  20. Lens projection aligner

    透鏡投影對準曝光器
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