橢圓偏振 的英文怎麼說

中文拼音 [tuǒyuánpiānzhèn]
橢圓偏振 英文
elliptic polarization
  • 橢 : Ⅰ形容詞（卵形） oval-shapedⅡ名詞[書面語] （長圓形的容器） elliptic vessel
  • 偏 : Ⅰ形容詞1 （不正; 歪斜） inclined to one side; slanting; leaning 2 （只側重一面） partial; prejudi...
  • 振 : 動詞1. （搖動; 揮動） shake; flap; wield 2. （奮起） brace up; rise with force and spirit
  • 橢圓 : [數學] oval; oval shaped; ellipse; ellipsoid橢圓規 ellipsograph; [圖] elliptic trammel; 橢圓軌道 ...
  1. For detecting elliptically polarized light and partially polarized light, the detection method is analyzed frow the view of the composite retardation plate theory

    摘要為了檢測部分偏振光與橢圓偏振光，從復合波片的理論出發，藉助于數學工具，對檢測方法做了較為詳盡的理論分析。
  2. Linearly polarized light will in consequence become elliptically polarized on total reflection.

    因此，線偏振光徑全反射后將變成橢圓偏振光。
  3. All the other wavelengths will emerge as either elliptically or circularly polarized light.

    所有其它波長的光將以橢圓偏振光或圓偏振光出射。
  4. When the end of the electric field vector travels in an ellipse, the light is elliptically polarized.

    電場矢量的末端沿一橢圓移動的光叫橢圓偏振光。
  5. The results indicate any elliptically polarized light can be compensated to become lineally polarized light throught / 4 wave - plate as long as the fast - axis ( slow - axis ) of / 4 wave - plate and the long - axis ( short - axis ) of elliptically polarized light are in the same orientation, but partially polarized light cann ' t

    結果表明，只要/ 4波片的快（慢）軸與橢圓偏振光的長（短）軸方位一致，則任何橢圓偏振光經過/ 4波片后均可以補償為線偏振光，而部分偏振光經過/ 4波片后仍為部分偏振光。
  6. Ellipsometric study on inhibition of propargyl alcohol f or 1cr18ni9ti stainless steel in hydrochloric acid solution

    橢圓偏振技術研究鹽酸介質中丙炔醇對不銹鋼的緩蝕作用
  7. Polarization characteristics of laser beam, which is one of the important characteristics of high power laser, have a direct effect on output power, damage threshold of optical elements and beam quality etc. the polarization characteristics in the high power coil resonator is analyzed by jones calculus, and draw a conclusion that, in general the eigen - polarization state is elliptical polarization

    激光光束的偏振特性是高功率激光器的一個重要特性之一，直接影響著高功率激光器的輸出功率、腔內光學元件的損傷以及光束質量等。本文首先利用瓊斯矩陣演算法對高功率氧碘激光器腔內的偏振特性進行了分析，並得出結論，諧振腔內的本徵振蕩一般為橢圓偏振。
  8. The deposited cu - mgf2 cermet films were analyzed by xrd, ed, tem, ir, uv, ellipsometry and temperature - varied four - wire technique

    用ir 、 uv及橢圓偏振光譜技術測量分析樣品從紅外-近紫外波段的透射、吸收及反射光譜特性。
  9. This paper analyzes the non - symmetry of elliptic polarization oftwo linear polarized beams, which are perpendicular to each other, caused by their reflecting from a metal mirror. also, it studies the non - linear error created by polarization and how the errors change. the study is very important for improving the measuring accuracy of polarized heterodyne interferometer

    主要分析兩束相互垂直的線偏振光經過金屬反射鏡反射后引起的橢圓偏振化的不對稱性，並研究由此產生的非線性誤差的變化規律，這對提高偏振光外差干涉儀的測量精度是極為重要的。
  10. Abstract : this paper analyzes the non - symmetry of elliptic polarization oftwo linear polarized beams, which are perpendicular to each other, caused by their reflecting from a metal mirror. also, it studies the non - linear error created by polarization and how the errors change. the study is very important for improving the measuring accuracy of polarized heterodyne interferometer

    文摘:主要分析兩束相互垂直的線偏振光經過金屬反射鏡反射后引起的橢圓偏振化的不對稱性，並研究由此產生的非線性誤差的變化規律，這對提高偏振光外差干涉儀的測量精度是極為重要的。
  11. The chemical composition, micro - structure and optical properties and its application of tio2 thin films deposited on k9 glass by using reactive electron - beam evaporation ( reb ) are studied through sem, tem, xps, xrd, spectroscopic ellipsometry ( se ) and uv - vis spectrophotometer in the dissertation, and the progresses of nucleation and growth of thin film are discussed from the point of view of dynamics and thermodynamics so that a structure model of tio _ ( 2 ) thin film is brought forward

    本文採用sem 、 tem 、 xps 、 xrd 、橢圓偏振儀（ se ） 、 uv - vis分光光度計等分析手段系統地研究了電子束反應蒸發方法在k9玻璃上制備tio _ 2薄膜的成分、結構和光學性能以及tio _ 2薄膜在光學多層膜中應用，並開發了膜系設計軟體。文中還從動力學和熱力學角度分析了tio _ 2超薄膜的形核生長過程，得出了tio _ 2薄膜的組織結構模型。
  12. The thickness, extinction and reflection coefficients of the plct ( x ) thin films with variant layers were measured by ellipsometer

    運用橢圓偏振儀測定了不同層數的薄膜厚度、消光系數、折射率。
  13. Analysis th to mechanism ellipse polarized light that in the specimen faced happen at the same time reflection refraction and multiplicity light beam interference, proves the principle that laser instrument of measure thickness of specimen with jones vector

    摘要對橢圓偏振光在樣品表面產生的反射、折射和多光束干涉的機制進行了分析，並用瓊斯矢量論證了激光測厚儀的原理。
  14. Reflection and refraction of an elliptical polarized electromagnetic wave

    橢圓偏振電磁波的反射和折射
  15. Mathcad applied to testing of the optical constants for thin films with ellipsometer

    Mathcad在橢圓偏振儀測定薄膜光學常數中的應用
  16. The method of data processing for directly demonstrating elliptically polarized light experimentally

    橢圓偏振光直接實驗驗證的數據處理方法
  17. In order to obtain an elliptically polarized light, whose ellipticity angle to be invariable and the elliptical azimuth may continuously change, or the ellipticity angle may continuously change and the elliptical azimuth invariable, the polarization is analyzed based on the matrix optics method when the linearly polarized light transits the / 4 and / 2 wave - plates, which are placed according to the certain azimuth, the reliable data are obtained

    摘要為了獲得橢圓率角不變、橢圓方位角可連續變化和橢圓率角可連續變化、橢圓方位角不變的橢圓偏振光，採用矩陣光學方法對按一定方位角擺放的/ 4波片和/ 2波片，在線偏振光通過后的偏振態變化，進行了理論分析和實驗驗證，取得了可靠的數據。
  18. Orientation of the elliplically polarized light ' s main axis

    橢圓偏振光主軸方向的確定
  19. We compare the theoretical results with the experimental results and discuss the applicability of the three effective medium theories to nanoparticles cermet films

    我們將理論計算結果同用橢圓偏振光譜儀得到的實驗值進行了比較，討論了三種有效介質理論對不同微結構薄膜體系的適用性。
  20. The best process for high quality tio _ ( 2 ) thin film deposited on k9 glass by reb is studied by using orthogonal test method, the se results indicate that the best process for tio _ ( 2 ) thin film deposition is the substrate temperature of 300, the total gas press in the chamber of 2 x 10 ~ 2pa and the deposition rate of 0. 2 nm - s - 1, of which the substrate temperature has influence on the optical properties of the deposited films notably

    文中首先以tio _ 2薄膜的折射率和消光系數為研究對象，採用l9正交試驗法研究了在k9玻璃上制備高光學質量tio _ 2薄膜的最佳工藝條件。橢圓偏振儀的測試結果表明，制備tio _ 2薄膜的最佳工藝條件為：基片溫度300 ，工作真空2 10 ~ （ - 2 ） pa ，沉積速率0 . 2nm ? s ~ （ - 1 ） ，其中基片溫度對薄膜光學常數的影響最大，該結果具有較好的可重現性。
分享友人
分享到 Line

分享到臉書