正掩模圖 的英文怎麼說
中文拼音 [zhēngyǎnmótú]
正掩模圖
英文
positive mask pattern-
Based on the one and a half year " s lucubration, the author gets one new error concealment way with better combination between efficiency and running time in processing the errors in video communication. according to the experiment results and relative data analysis, we can get a certain conclusion, which is that the algorithms are correct and useful
課題在開放的h . 263測試模型tmn8中實現了該演算法，實現過程包括誤碼的檢測，定位和誤碼部分數據的恢復等工作，並與標準h . 263的結果進行了比較，模擬結果表明，經檢錯和掩蓋之後，解碼圖像質量有了顯著的改善，證明了演算法的正確性和實用性。However, in current design flow, designers do not consider whether designs are friendly to opc before they are sent to foundries. in fact, a lot of features in such designs can not be corrected enough because of many factors such as the constraints of environments. so even though such designs are corrected, many lithographic errors still exist
然而，由於在當前的集成電路設計流中，在設計出的版圖送到製造廠商前，電路的設計者並沒有考慮版圖對光學鄰近校正和交替移相掩模的友好性問題，這使得版圖中的一些圖形由於周圍條件的限制，如無法充分進行光學鄰近校正，無法進行交替移相掩模的處理等，從而使得版圖設計即使進行了校正處理，還存在大量光刻故障的可能性。Using computer - aided alignment method, the schwarzschild optics was assembled with wave - front error of 18nm in rms value which is a good match to the simulation wave - front error by introducing figure errors of primary and secondary mirrors using zemax optical software. positive resist of zep520 ( nippon zeon co. ltd ) was employed in exposure experiments
在集成后的euvl原理裝置上，採用zep520 （ nipponzeonco . ltd ）正性抗蝕劑及掩模調焦方案，初步進行了透射掩模的曝光復制實驗，國內首次獲得了0 . 75 m線寬的euvl復制圖形，完成了euvl的原理性貫通。For the coordination of the contradictory, the wavefront technique has been regarded as an effective method to improve the image quality in photolithography by optimizing the image of the mask. it includes : pupil filtering, phase shift mask, off - axis illumination, optical proximity correction, and so on
為了協調這種矛盾，利用波前工程來改善光刻圖形的質量以提高光刻解析度，已廣泛地應用於光學光刻中，如：瞳孔濾波、相移掩模、離軸照明、光學鄰近效應校正等。For the positive real function image encoded by double random - phase, the first random - phase mask placed in the blank can not serve as the key when the decrypted image is detected by intensity detector in the decrypting process
摘要正的實函數圖像通過雙隨機相位編碼加密以後，在解密過程中，用光強探測器接收解密圖像時，位於空域的第1塊相位掩模不起密匙作用。Abstract : in view of the manufacturing method of continuous micro - optical elements with grayscale mask, the critical steps such as converting from element structure to gray - scale patterms, correction of gray - scale patterns, digitalization of gray - scale patterns and patlerns coding are presented
文摘:針對利用灰度掩模製作連續微光學元件的方法，介紹了從元件結構到灰度圖形的轉換，灰度圖形的修正，灰度圖形的數字化以及圖形編碼等關鍵步驟。分享友人