氣流氣體流量 的英文怎麼說

中文拼音 [qìliúqìtǐliúliáng]
氣流氣體流量 英文
gas-flow
  • 氣 : Ⅰ名詞1 （氣體） gas 2 （空氣） air 3 （氣息） breath 4 （自然界冷熱陰晴等現象） weather 5 （氣味...
  • 流 : Ⅰ動1 （液體移動; 流動） flow 2 （移動不定） drift; move; wander 3 （流傳; 傳播） spread 4 （向壞...
  • 體 : 體構詞成分。
  • 量 : 量動1. （度量） measure 2. （估量） estimate; size up
  • 氣流 : 1 [氣象學] air current; airflow; wind current; airstream2 [語言學] breath氣流紡紗 open end spinni...
  • 氣體 : gas; gaseous fluid
  • 流量 : rate of flow; flow; runoff; discharge; throughput; （flow） rate; quantity （of flow）; flux
  1. Using jgp560c magnetron sputtering equipment, cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power, gas flow, vacuum air pressure, magnetoelectricity power and substrate temperature on deposition rate of film, discovered that dc sputtering power is the most key factor influencing the deposition rate

    在jgp560c型超高真空多功能磁控濺射鍍膜機上，採用直流磁控濺射法在cdznte晶體上制備出cu ag合金薄膜，揭示了氣體流量、直流濺射功率、勵磁電源功率、工作氣壓和襯底溫度等工藝參數對沉積速率的影響規律。結果表明濺射功率對沉積速率的影響最大，隨濺射功率的增大沉積速率快速增大。
  2. A design of automatic calibration system for bell prover gas calibration facility

    鐘罩式氣體流量標準裝置自動檢定系統的設計與實現
  3. Proving methods and procedures for gas flowmeters

    氣體流量計的驗證方法和程序
  4. Measurement of gas flow in conduits. tracer methods. part 1 general

    密封管道中氣體流量的測定.示蹤法.第1部分：概述
  5. Measurement of gas flow in conduits. tracer methods. part 4 : transit time method using radioactive tracers

    密封管道中氣體流量的測定.示蹤法.第4部分：放射性示蹤物的過渡時間法
  6. Verification scheme of gas flow measuring instruments

    氣體流量計量器具檢定系統
  7. Effect of humidity on calibration of bell gas flow standard installation

    濕度對鐘罩式氣體流量標準裝置標定的影響
  8. When nals was used as the collector in the process, the optimal conditions were the ph of feed solution 5. 0 - 6. 0, air flow rate 100ml / min, the liquid column depths 20cm, the surfactant concentration determined by its cmc and feed concentration. under this condition, the 3 can be above 20. also, the optimal ph ( 5. 0 ) was calculated theoretically for the recovery of the cu ( ii )

    對以十二烷基硫酸鈉為捕集劑的泡沫吸附分離過程的工藝參數進行了研究，並得出本分離系統所確定的最佳工藝參數為： ph5 . 0 6 . 0 ，氣體流量100ml min ，液位高度20cm ，最佳表面活性劑濃度由其臨界膠束濃度和原料液濃度確定，此時（濃縮比）可達20以上；同時還從理論上推算出泡沫吸附分離銅的最佳ph值范圍為5 . 0左右。
  9. Nozzle in the furnace the gas - quenching pressure can be 15 bar, airflow is big and uniform, cooling rate is very high

    配置內置高效熱交換器，以及經優化設計的氣淬系統，冷卻氣體流量均勻且流速大，冷卻速度高
  10. Measurement of gas flow by turbine meters

    用汽輪計測量氣體流量
  11. The effect of gas rates, liquid flow - rates, downcomer width, weir height and the addition of surface active agent on the liquid mean residence time, t, effective diffusion coefficient, de, and froth height, hf were studied. results obtained showed that for two systems, the t in the downcomer of ctst plate is 20 - 50 % smaller than that of fl valve plate, and the de is 40 - 70 % smaller than that of fl valve plate

    通過對氣速、液體流量、降液管寬度、堰高和表面活性劑加入的影響進行分析得出下面結論：在相同的操作條件下，對于兩種物系， ctst塔板降液管的液體停留時間比f1浮閥塔板的約小20 50 ，有效擴散系數比f1浮閥塔板的小40 70 ，泡沫高度低110 150mm 。
  12. Measurement of gas flow in closed conduits - turbine meters

    封閉管道中氣體流量的測量渦輪流量計
  13. In this thesis, we have mainly studied the characteristics of chf3, c6h6 and cf4 electron cyclotron resonance ( ecr ) plasma using langmuir probe and optical emission spectroscopy ( oes ). the relative concentration of different radicals in chf3 plasma and the effect of chf3 / c6h6 ratio on bond configuration of a - c : f films were discussed. it was showed that h, f, c2 were the main radicals among radicals of h, f, c2, ch and f2 in chf3 ecr plasma

    重點研究了chf _ 3 、 cf _ 4和chf _ 3 c _ 6h _ 6放電等離子體中基團的分佈；分析了不同基團的相對密度隨宏觀放電條件（微波輸入功率、放電氣壓、源氣體流量比）的變化規律；探討了等離子體中各種基團的生成途徑；在不同源氣體流量比的條件下沉積了a - c ： f薄膜並通過傅立葉變化紅外吸收光譜（ ftir ）的測量得到了薄膜中鍵結構的信息；分析了a - c ： f薄膜的沉積速率及其鍵結構與等離子體空間基團分佈狀態之間的關聯。
  14. The results showed that the melting ratio of silica flux decreases and the complete melting time prolongs with the size of silica flux and matte grade increasing, and the effect of the blowing air and oxygen enrichment is not remarkable in the high grade copper matte converting process

    對于高品位冰銅轉爐吹煉，鼓入氣體流量和氧濃度對石英熔劑熔化率影響不顯著；熔劑粒度和冰銅品位對熔化率影響顯著，並隨著熔劑粒度和冰銅品位的增加，熔劑熔化率降低，完全熔化時間延長。
  15. Several factors affecting the melting of silica flux, such as the size of silica flux, matte grade, blowing air and oxygen enrichment were discussed

    主要考察了熔劑粒度、冰銅品位、鼓入氣體流量和氧濃度對石英溶劑熔化的影響。
  16. By carrying on experimental study to the ignition performance of the natural gas high speed burners under different conditions, the influence factors are probed such as the type of the gas source, the combustion air pressure, the gas pressure, the proportion of air and gas, gas flow and electrode to the ignition performance of natural gas high speed burner

    摘要在不同的條件下對天然氣高速燒嘴的點火性能進行了實驗研究，探討了氣源種類、助燃空氣壓力、燃氣壓力、空氣與燃氣的比例、氣體流量、點火電極等因素對天然氣高速燒嘴的點火性能的影響。
  17. Verification regulation of soap film standard facility on gases flow

    皂膜氣體流量標準裝置試行檢定規程
  18. Effects of methane concentration, deposition pressure, gas flow rate and substrate temperature on diamond coating on quartz glass by mpcvd were studied systemically. the best parameters were established by experiments

    系統地討論了在石英玻璃上mpcvd沉積金剛石薄膜的實驗過程中，甲烷濃度、沉積氣壓、氣體流量、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響。
  19. The paper systemically studied effects of methane concentration, deposition pressure, gas flow rate and substrate temperature on diamond coating on wc - co tools by mpcvd. the best parameters were established by experiments. influence of diamond film and coating adhesion was compared with two different pretreatments

    本文系統地研究了在硬質合金上mpcvd沉積金剛石薄膜的實驗過程中，甲烷濃度、沉積氣壓、氣體流量、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響。
  20. The influence of thickness, kinds of rf sputtering gas, flux of gas, and gas pressure to the produced licoo _ 2 film was studied, which affected the preferable orientation of the crystal

    研究了厚度、濺射氣氛、氣體流量、氣壓值等對制備licoo _ 2薄膜中晶體生長擇優取向的影響。
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