爐料的分散性 的英文怎麼說

中文拼音 [lúliàodefēnsǎnxìng]
爐料的分散性 英文
fractional void volumn
  • 料 : 名詞1 （材料; 原料） material; stuff 2 （喂牲口用的穀物） feed; fodder 3 （料器） glassware 4 （...
  • 的 : 4次方是 The fourth power of 2 is direction
  • 分 : 分Ⅰ名詞1. （成分） component 2. （職責和權利的限度） what is within one's duty or rights Ⅱ同 「份」Ⅲ動詞[書面語] （料想） judge
  • 散 : 散動詞1. （由聚集而分離） break up; disperse 2. （散布） distribute; disseminate; give out 3. （排除） dispel; let out
  • 性 : Ⅰ名詞1 （性格） nature; character; disposition 2 （性能; 性質） property; quality 3 （性別） sex ...
  1. And he must have a fire in the middle of summer ; and joseph s bacca pipe is poison ; and he must always have sweets and dainties, and always milk, milk for ever - heeding naught how the rest of us are pinched in winter ; and there he ll sit, wrapped in his furred cloak in his chair by the fire, some toast and water or other slop on the hob to sip at ; and if hareton, for pity, comes to amuse him - hareton is not bad - natured, though he s rough - they re sure to part, one swearing and the other crying

    他在仲夏時分也一定要生個火約瑟夫的煙斗也是毒藥而且他一定總要有糖果細點，總要有牛奶，永遠是牛奶也從來不管別人在冬天多受苦而他就坐在那兒，裹著他的皮大氅坐在火爐邊他的椅子上。爐臺上擺著些麵包水，或別的能一點點吸著吃的飲料如果哈里頓出於憐憫來陪他玩哈里頓天性並不壞，雖然他是粗野的結果準是這一個罵罵咧咧的，那一個嚎啕大哭而散夥。
  2. An apparent activation energy of 182. 35kj / mol was obtained for the range of 1250 c to 1350 c, and that of 82. 32kj / mol for the range of 1350 c to 1400 c. at the same time, the relation between reaction velocity and reaction time is linear in the range of 1250 c to 1350 c, but it is a parabola curve in the range of 1350 c to 1400 c. so it can be concluded that the process undergone in the range of 1250 c to 1350 c is controlled by chemical reaction while that in the range of 1350 c to 1400 c by diffusion

    本實驗採用的試樣是以鈦白粉和活性碳按1 ： 30的比例混合料為原料，在6mp下成型為37 . 2 26mm的柱形樣塊，分別在1250 、 1350和1400于氮化爐中測定反應速率與時間的關系。當反應在1250 1350時，表觀活化能為182 . 35kj mol 160kj mol ，反應速率與時間的關系是線性的，說明此階段反應由化學反應控制。當反應在1350 1400時，表觀活化能為82 . 32kj mol 160kj mol ，反應速率與時間的關系符合拋物線方程，說明此階段反應由擴散控制。
  3. Diffusion / oxidation furnace is a kind of very important equipment which is used in semiconductor process production line. it is applied in the manufacture process of the discrete semiconductor devices and integrated circuit which have diffusion, oxidation, annealing and alloying processing. it is also used in special temperature treatment of other material and is an auto - equipment which has the command of long time working, high precision and high stability

    擴散/氧化爐是半導體工藝生產線上非常重要的一種工藝設備，用於分立半導體器件、集成電路製造過程中各種擴散、氧化、退火及合金工藝，也適用於對其他材料的特殊溫度處理，是一種要求能長時間連續工作、高精度、高穩定性的自動控制設備。
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