相序測量儀 的英文怎麼說

中文拼音 [xiāngliáng]
相序測量儀 英文
phase sequence meter
  • : 相Ⅰ名詞1 (相貌; 外貌) looks; appearance 2 (坐、立等的姿態) bearing; posture 3 [物理學] (相位...
  • : 動詞1. (測量) survey; fathom; measure 2. (測度; 推測) conjecture; infer
  • : 量動1. (度量) measure 2. (估量) estimate; size up
  • : 名詞1 (人的外表) appearance; bearing 2 (禮節; 儀式) ceremony; rite 3 (禮物)present; gift 4 ...
  • 測量 : measure; survey; gauge; meter; measurement; measuring; surveying; mensuration; metering; gauging;...
  1. Monitor apparatus can measure valid value of three phase voltage and current, power factor, three phase disequilibrium, instant flecker of short time and harmonic without twenty, degree and harmonic distortion total. the paper are laid on the following. ( 1 ) master plan and function of circuit, ( 2 ) hardware design including circuit and principle of a / d conversion, phase lock, liquid crystal display and keystroke and so on, ( 3 ) design of system software including digital filtering, fft, a / d conversion and monitor interface of pc, ( 4 ) system test

    能夠完成包括三電壓、三電流的有效值、功率因數、三不平衡、電壓短期閃變、以及20次內的諧波、諧波位、諧波失真總等的。論文重點介紹了以下幾部分: ( 1 )電路的總體設計和功能; ( 2 )硬體設計,包括a d轉換、鎖環、液晶顯示和按鍵輸入等原理和電路。 ( 3 )系統軟體設計,包括a d轉換、 fft 、數字濾波等程的原理和演算法以及上位機監控界面的設計; ( 4 )系統試。
  2. The characters, advantages, domestic and foreign status and developing direction of virtual instrument, are inroduced briefly. and the design process of control software of hptimi in the environment of labwindows / cvi is also presented. the primary data exchang mechanism among the contol units of hptimi and the corresponding program flow charts and their programmimg approaches are expatiated

    論文通過簡單分析虛擬器的特點及國內外研究現狀和發展方向,詳細闡述在labwindows / cvi環境下,高解析度時間間隔控制軟體設計過程,說明其主要的數據交互機制,給出應的程流程圖和編程方法。
  3. This paper describes mainly system functions, measuring methods, circuit design, software program and errors analysis of a new type of measuring instrument. this instrument can measure and monitor electric parameters in single - phase circuits, three - phase ( three - wire or four - wire ) circuits. this system can be applied to electric devices and power plants, transformer substations with harmonic pollution. it can measure current, voltage, power, energy, frequence, power factor etc. it also can detect load quality, phase sequence, alarm, display and print results, as well as detect and dispose negative power

    器適用於含有諧波污染情況下的機電設備現場、發電廠、供電局、企業變電所現場,可用來電流、電壓、有功功率、無功功率、視在功率、有功電能、無功電能、視在電能以及頻率和功率因數等電參數,並具有負載性質(感性、容性)判別,正、逆判別指示功能;超限報警功能;列印記錄功能和負功檢及處理功能。
  4. Imposing on the abundant fwd test data, a newly pavement intensity assessment standard is come into being. recurring to the program evercalc5. 0, the common rules of backcalculation modulus are introduced, moreover, the influence of instrument measurement error and input parameters are construed. utilizing the characteristics of deflection basin, so that it can assess the intensity of whole pavement structure

    通過對豐富的fwd檢數據的分析,提出了全新的路面結構強度評定標準;藉助evercalc反算程,介紹了模反算的一般規律,分析了誤差和輸入參數對反算結果的影響,利用彎沉盆的幾何特性對路面的整體強度進行評價,並建立了各結構層動模與靜模間的關關系。
  5. The multi - port measurement system has the widespread use in microwave measurement, the measurement of multi - port device with two - port vector network analyzer ( vna ) is researched. this paper analyzes the commonly used error models and calibration methods of vna, program a trl calibration procedure for two - port vna, and compare the tested data with the data from vna. the comparison show that the programmed trl calibration procedure is in the same accuracy as the vna

    本文討論了兩埠矢網路分析常用的誤差模型和校準方法,編制了兩埠矢網路分析基於trl校準法的校準程,並把校準后的結果和矢網路分析校準后的數據做了比較,比較結果說明編制的trl校準程校準效果和矢網路分析校準的效果同。
  6. The general measure method of aspheric optics is done after fine polishing. when the error between actual surface and theoretic surface is big, we must grinding the optics again, then polishing, measuring. . it ' s too complex ! if we had a measuring instrument which could measure the surface of aspheric optics after fine grinding, the procedure of processing aspheric optics would be simplified and the cost would be reduced

    常規的非球面光學元件檢是在元件拋光后進行的,通過與之對應的補償其面形質,當實際面形與理論面形有較大誤差時,就必須把已經拋光的元件重新精磨,再進行拋光、檢,其加工工當繁復的。
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