真空蒸發法 的英文怎麼說

中文拼音 [zhēnkōngzhēng]
真空蒸發法 英文
vacuum vapor deposition method
  • : Ⅰ形容詞(真實) true; genuine; real Ⅱ副詞1 (的確; 實在) really; truly; indeed 2 (清楚確實) cl...
  • : 空Ⅰ形容詞(不包含什麼; 裏面沒有東西或沒有內容; 不切實際的) empty; hollow; void Ⅱ名詞1 (天空) s...
  • : Ⅰ動詞1. (蒸發) evaporate2. (利用水蒸氣的熱力使食物熟或熱) steam Ⅱ名詞[中醫] (將藥物隔水蒸熟) steaming
  • : 名詞(頭發) hair
  • : Ⅰ名詞1 (由國家制定或認可的行為規則的總稱) law 2 (方法; 方式) way; method; mode; means 3 (標...
  • 真空 : [物理學] vacuum; empty space; vacuo
  • 蒸發 : [物理學] [化學] evaporation; evaporate蒸發計 evaporometer; evaporimeter; atmidometer; atmometer; ...
  1. The corrosion behavior of nanocrystalline ( nc ) copper bulks with various grain sizes prepared from igc ( inert gas condemsation ) and vacuum annealing in comparison with conventional microcrystalline ( mc ) copper ( as - rolled and electrolytic ) in acid copper sulphate solution and neutral solution containing chlorides under free corrosion conditions and anodic polarizations has been studied using potentiodynamic polarization, potentiometric analysis, cyclic voltammetry and electrochemical impedance spectroscopy. x - ray diffraction was used to estimate the grain size of the annealed nc copper. field emission gun scanning electron microscopy and x - ray energy - dispersive spectroscopy was used to characterize the surface morphology and analyze the surface composition after the polarization and potentiometric test of both nc and mc copper

    本文研究了用igc (惰性氣體凝聚原位溫壓)制備並退火到不同晶粒尺寸的納米晶銅和微米晶銅(冷軋紫銅、電解銅)在酸性硫酸銅溶液和中性含氯溶液中,在自腐蝕狀態和陽極極化狀態下的腐蝕性能。使用了動電勢極化、電位測定、循環伏安( cv )和電化學阻抗譜( eis )等方。 x -射線衍射( xrd )的方用來估算納米晶銅晶粒尺寸。
  2. The tensile and compression experiment on bulk nanocrystalline ag prepared by igc method was carried on mt810 with different grain sizes and zwick 10tn2s machine at different strain rates under normal temperature respectively. the stain rate sensitivity m was found to be 0. 025, which was extremely lower than the ordinary values. also the work hardening exponent is very low

    本文從用惰性氣體冷凝和原位壓結( igc )制備得到的直徑80mm ,厚度7 . 6mm的大尺寸納米晶金屬ag樣品上切割得到符合力學實驗要求的拉伸和壓縮試樣,在mts810和zwick精密力學測試機上分別精確測定了拉伸和壓縮應力?應變曲線與晶粒尺寸和應變速率的關系。
  3. Silicon / silicon oxide nanofilms and multilayer films were prepared by vacuum evaporation process followed by natural oxidation

    摘要用技術和自然氧化在玻璃襯底上制備納米級的硅氧化硅薄膜和多層膜。
  4. To achieve this temperature, the atoms must be isolated in a vacuum cell, suspended in free space by magnetic fields, and chilled by laser cooling and another technique called evaporative cooling [ see box on page 51 ]

    要達此溫度,原子必須隔離在腔里,利用磁場而漂浮在中,並以雷射冷卻或另一種稱為冷卻的技術來降溫(參見87頁降溫大) 。
  5. Lppp thin films were prepared by spin coating from a solution of lppp in toluene and alq was formed by vapor deposition. different configuration devices with lppp single - layer, lppp micocavity and lppp / alq heterojunction were fabricated

    利用lppp甲苯溶液旋塗制備lppp薄膜,制備alq膜和電極,分別製作了lppp單層無腔、 lppp單層微腔、增強型lppp / alq異質結結構的有機電致光器。
  6. Vacuum vapor deposition method

    真空蒸發法
  7. This paper describes the theory of oxide vacuum coating and the form mechanism of film. it is discussed the technique that nonmetal is conated on polymer. the barrier performance of this new material that is produce by using different deposited method and raw materials is compared

    論述了非金屬鍍膜的理論和鍍層的形成機理,討論了非金屬鍍膜的技術方與工藝,比較了不同鍍原料與方對材料阻隔性能的影響與效果。
  8. Cdte films deposited by close space sublimation have better appearance and larger grain than the films deposited by rf - sputtering and vacuum thermal evaporation

    近距離升華制備的cdte薄膜與射頻濺射和相比,具有其獨有的特性。
  9. With the development of thin film science and technology, various thin film preparation techniques developed rapidly, as a result, conventional so - called filming has developed from single vacuum evaporation to many new film preparation techniques, such as ion plating, sputtering, laser deposition, cvd, pecvd, mocvd, mbe, liquid growth, microwave and mtwecr, etc., of which vacuum evaporation is the common technology for thin film preparation, because it has the distinct advantage of high quality of film deposition, good control - ability of deposition rate and high versatility

    隨著薄膜科學與技術的展,各種薄膜制備方得到了迅速展,傳統的所謂鍍膜,已從單一的展到包括鍍、離子鍍、濺射鍍膜、化學氣相沉積( cvd ) 、 pecvd 、 mocvd 、分子束外延( mbe ) 、液相生長、微波及微波電子共旋( mwecr )等在內的成膜技術。其中電子束技術是一種常用的薄膜制備技術,它具有成膜質量高,速率可控性好,通用性強等優點。
  10. In this paper, an experimental investigation of the removal of volatile organic compounds ( voc ) from dilute aqueous solutions was presented by vacuum membrane distillation ( vmd ). experiments were carried out using aqueous mixtures of ethanol with hollow fiber module. the influences of operating variables such as feed concentration, flow rate, temperature and downstream pressure on the flux and separation factor were investigated

    本文對膜餾脫除水溶液中的揮性有機化合物( voc )進行了試驗研究;文中以乙醇水溶液為研究對象,採用,膜材料為中纖維膜,研究膜通量及分離因子與原料液的溫度、濃度、流速,冷側壓力的關系,並對餾的傳熱傳質機理進行了初步探討。
  11. Coating metal such as cu, ni, ti, mo, w or compound coating on diamond grain ( dg ) surface by coating ( chemical, electronic plating ) and vacuum plating method ( evaporating, sputtering, ionization ) was studied

    摘要採用濕鍍(化學鍍、電鍍)或鍍(鍍、濺射鍍、離子鍍)方,在金剛石表面鍍覆一層銅、鎳、鈦、鉬、鎢等金屬,或者它們的復合鍍層。
  12. Test method for heat flux through evacuated insulations using a guarded flat plate boiloff calorimeter

    用有防護的平板量熱計測定通過絕熱材料熱通量的試驗方
  13. The synthesis of a single - crystal, ultra - long, uniform lead oxide nanowires were observed in a high vacuum chamber with the electron beam bombard in the tb doped pt thin films derived from sol - gel process

    在高環境中用高能量電子束對pt t薄膜進行這種全新的方,制備出直徑在6 60nxn之間、長徑比高達100的筆直pbo單晶納米線。
  14. Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, sol - gel, laser - pulsed deposition

    多種工藝可以用來制備透明導電薄膜,如磁控濺射反應、化學氣相沉積、溶膠-凝膠以及脈沖激光沉積等。
  15. Silicon films with high crystal quality and good electrical properties have been successfully grown on porous silicon substrate by ultra - vacuum electron beam evaporator

    首次採用超高電子束的方在多孔硅上成功地外延出晶體質量和電學性能良好的單晶硅。
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