碳氮鍵 的英文怎麼說
中文拼音 [tàndànjiàn]
碳氮鍵
英文
carbon nitrogen bond-
Isolate all grew well in the culture medium with initial ph 4 - 10, the optimal growth temperature range was from 28 to 30. 5 degree c. it grew well on the medium for fungi growth, such as pda medium and czpek medium etc, and also grew well on the cause ' s i medium and the non - nitrogen medium, but little growth on the luria bertani medium ( lb ) and beef extract peptone medium. it did not need special nutrition factors for growth, but source of the carbon was the key factor to growth, all of its nutrition needs were different from that of common bacteria
該菌在初始ph4 - 10的培養基中都能夠生長，生長最適溫度范圍為28 - 30 . 5 ，在pda 、查氏等真菌培養基中生長旺盛，在高氏1號和無氮源培養基中同樣生長良好，而在lb與牛肉膏蛋白腖等細菌培養基中生長很差，碳源是其生長的關鍵因子，這有別於一般細菌的營養需求。The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate
採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。30 " is the project to produce 18ton / year synthetic ammonia and 30ton / year urea. the key equipment in the project are the copressor for the mixed gases of nitrogen and hydrogen and the compressor for carbon dioxide. reciprocating compressor as well as centrifugal compressor can be selected for this project. the different opinions for the selection of the compressor existed in 8medium scale fertilizer plants in which coal is used as the raw material. from the points of technology and cost, the analysis and comparison of using these two kinds of compressor were carried out. it is concluded that reciprocating pump is more appropriate
工程就是建成年生產能力達到18萬噸合成氨、 30萬噸尿素的項目，項目中的關鍵設備為氮氫氣壓縮機及二氧化碳壓縮機，壓縮機選型正介於往復式壓縮機和離心式壓縮機之間，國內各設計院在八家立項的以煤為原料的中化肥廠『 18 . 30 』工程初步設計中選何種類型的壓縮機爭論不休，本文從技術及經濟的角度對此作了分析比較，並推薦採用往復式壓縮機，以供參考。
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