等離子區放電 的英文怎麼說

中文拼音 [děnglíziqūfàngdiàn]
等離子區放電 英文
plasma discharge
  • 等 : Ⅰ量詞1 （等級） class; grade; rank 2 （種; 類） kind; sort; type Ⅱ形容詞（程度或數量上相同） equa...
  • 離 : Ⅰ動詞1 （離開） leave; part from; be away from; separate 2 （背離） go against 3 （缺少） dispens...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 區 : 區名詞（姓氏） a surname
  • 放 : releaseset freelet go
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 離子 : [物理學] ion
  • 放電 : [物理學] （electric） discharge; electro-discharge; discharging
  1. In this paper, we focus on the following three topics : ( i ) density distribution of dusty plasma in the low - pressure collisionless positive column the radial density distributions of electron, ion and dust particle in the low - pressure collisionless positive column are investigated with a fluid theory and a self - consistent dust - charging model

    本文著重以下三個方面的研究： （ ）低氣壓無碰撞輝光放電正柱區塵埃等離子體密度徑向分佈本文採用流體模型和自洽的塵埃充電模型，研究了低氣壓無碰撞輝光放電正柱區的電子密度、離子密度和塵埃粒子密度的徑向分佈。
  2. The physical characteristic of forming plasma within resonant cavity was revealed, i. e. the forming mechanism is a switching process from the ionization caused by strong electric field at the initial stage of mpt ' s start to another ionization caused by joule ' s heat at the stage of mpt ' s steady work. the main influencing factors of mpt ' s steady work were studied. anther pointed out the matching between pressure in resonant cavity and microwave power is the determinant factor to the plasma whether stabilization or extinguishing

    分析了mpt諧振腔內微波能量的轉換過程，揭示了其內等離子體的形成是由mpt啟動初期的強電場電離形成放電區過渡到穩定工作期的熱電離形成穩態等離子體區這一物理本質；研究了影響mpt穩定工作的主要因素，指出微波有效功率與諧振腔內氣體壓強的匹配是維持等離子體穩定、避免等離子體消失、放電區熄滅的關鍵因素。
  3. The results of simulations are : i ) energies of the incident ions to the target are determined mainly by the voltage across the cathode sheath, with a majority of ions " energy vary around the sheath voltage ; ions nearly normally bombard the target ; ions mainly locate above the sputtering holes because of the influence of the magnetic field, and the incident ions mainly come from the region ; the ions undergo several collisions during transportation, but that do n ' t matter much

    主要模擬結果有： ? ）入射離子到達靶面時的能量主要受到了射頻輝光放電中陰極殼層西北工業大學碩士學位論文李陽平電壓的影響，大部分離子的入射能量在陰極殼層電壓值附近，離子濺射時接近於垂直入射;射頻輝光放電受到陰極磁場的影響，等離子體中的離子主要集中在靶面濺射坑的上方，且入射離子主要來自這個區域;入射離子在輸運過程中和背景氣體分子有少量的碰撞，但影響不太大。
  4. Huangyal4 was complete nucleotide sequence of 1 854 bp with a nucleotide orf ( 1575 bp ), which encoded a protein consisting of 524 aa with molecular weight of 62. 2 kda and pi of 8. 96. strongly basic ( + ) amino acids, strongly acidic ( - ) amino acids, hydrophobic amino acids and polar amino acids of the protein were 13. 74 %, 11. 64 %, 36. 45 % and 22. 70 % respectively, and predicted secondary structure of the protein revealed many conserved domains such as n - glycosylation site, protein kinase c phosphorylation site, casein kinase ii phosphorylation site, n - myristoylation site, camp - and cgmp - dependent protein kinase phosphorylation site, tyrosine kinase phosphorylation site and a cytochrome p450 cysteine heme - iron ligand signature which was typical of cytochrome p450. a - helix and b - sheet of the protein is 47. 7 %, 45. 0 % respectively

    Huangya14 ）為材料分離克隆到一個細胞色素p450基因，命名為bccyp86mf5 ， cdna全長1854bp ，含1575bp的完整開放閱讀框，編碼524個氨基酸，其編碼蛋白質的分子量為61 . 2kda 、等電點為8 . 96 ；堿性氨基酸、酸性氨基酸、疏水氨基酸和極性氨基酸分別占總氨基酸的13 . 74 、 11 . 64 、 36 . 45和22 . 70 ；二級結構預測包括n -糖基化位點、依賴于camp和cgmp的蛋白激酶磷酸化位點、蛋白激酶c磷酸化位點、酪蛋白激酶磷酸化位點、酪氨基酸激酶磷酸化位點、 n -豆蔻酰化位點和細胞色素p450的典型區域，半胱氨酸亞鐵血紅素配體信號區等， -螺旋和-折疊分別佔47 . 7 、 45 . 0 ；與bccyp86mf1基因的氨基酸序列同源性達到95 . 2 ，與擬南芥cyp86c4的達到85 . 9 。
  5. The gas sources that we used are trimethylgallium ( tmg ) and 99. 9999 % purity nitrogen, which were fed into reaction chamber and resonance cavity respectively. the highly dense ecr plasma up to 1011cm - 3 was created in the resonance cavity and introduced to the next reaction chamber by the force of divergent magnetic field. consequently, gan thin film was grew on the substrate sapphire ( 0001 ) placed in the downstream

    實驗採用有機金屬三甲基鎵氣源（ tmg ）和99 . 9999純度的氮氣，在ecr - pecvd150裝置共振腔內電子迴旋共振吸收微波能量產生的高密度ecr等離子體在磁場梯度和等離子體密度梯度的作用下向下級反應室擴散，在放置於下游區樣品臺上的- al _ 2o _ 3襯底表面附近發生物理化學反應沉積成gan薄膜。
  6. Pulse electric current sintering is an advanced technology for materials synthesis and one of effective methods for preparation nano - structure ceramic. but the sintering mechanism is different with traditional sintering method. the sintering phenomena of oxide nano - powders have been investigated in this paper

    放電等離子體燒結技術（ sps ）是材料制備新技術之一，也是制備納米相陶瓷的有效方法之一，但燒結金屬氧化物納米粉末過程中的緻密化機理與傳統理論有一定的區別，本文對脈沖電流燒結金屬氧化物納米粉末進行了系統研究。
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