蝕刻機 的英文怎麼說

中文拼音 [shíkèjī]
蝕刻機 英文
erosion machine
  • 蝕 : Ⅰ動詞1. （損失; 虧耗） lose 2. （腐蝕） erode; corrode Ⅱ名詞（天體現象） eclipse
  • 機 : machineengine
  • 蝕刻 : [電學] [冶金學] etch; etching
  1. The silicon plates are formed reverse four wimble array in koh solution by wet - etching technology. then the electrochemical etching experiments are done in three poles electrobath. and some technology questions such as heat oxygenation, light etching, wet etching and electrochemical etching have been analyzed. at the same time sample appearances are analyzed by scanning electron microscope. according to current burst model theory, the electrochemical deep holes etching mechanism are analyzed

    在三極電解槽中，進行了電化學深刻蝕的探索性實驗。對氧化、光刻、濕法刻蝕和電化學刻蝕中的工藝問題進行了初步的理論和實驗研究，同時，採用sem對實驗樣品進行了形貌分析，並採用電流突破模型對電化學深孔刻蝕機理進行了理論分析。
  2. Several of commonly used methods are photoprinting, photoengraving, mechanical engraving, and stencil.

    通常所採用的幾種儲存方法是：影印法、照相蝕刻、機械雕刻和模板。
  3. Hardware and software design for the inductively coupled plasma etching machine " s system are also presented

    介紹了plc控制等離子體刻蝕機的硬體系統和軟體系統的設計。
  4. Directly etching method of chemically forming veined and granular aluminum alloys surface " which is the latest invention patent application number : 00117311. 1. the innovative and simple process is absolutely

    現在所提供的"鋁合金表面化學紋理直接蝕刻的方法"發明專利申請: 00117311 . 1是最新發明專利技術，創新而簡易的蝕刻工序在"鋁件表面處理"量產時對比于傳統的機械噴沙絕對是
  5. Many studies had attempted to characterize chemical weathering process by focusing on geochemisty of river particulate and sediment. the sediment geochemistry may reflect and compare with the carbonates and silicates weathering degree by introducing the chemical index of alteration ( cia ) and new sediment index of variation ( siv ) and elemental molar abundance ratio of the sediment. the one main objective of this study would provide and compare the relative weathering intensities of silicates and carbonates with the different basins

    2沉積物地球化學與化學風化進程和機械剝蝕率化學風化指數與化學風化率屬于表徵化學風化作用意義不同的函數，前者為相對概念反映流域巖石在原巖基礎上己發生淋溶作用的深度，主要受到了氣候因子的深刻影響（中國流域沉積物化學風化指數由北到南呈有規則的遞增序列，氣候因子對風化進程的影響掩蓋了巖性的巨大差異） ，而化學風化率含義是指單位流域面積巖石風化淋溶產生的離子絕對總量。
  6. The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated. an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out

    對全息光刻的原理、理論、實現方法及傳統光掩模?全息掩模?抗蝕劑圖形傳遞機理進行了深入的研究，設計和建立了採用直角棱鏡和折射率匹配液的全內反射波前共軛全息光刻實驗系統，進行了實驗研究。
  7. Generic specification of ion beam etching system

    離子束蝕刻機通用技術條件
  8. The company has cad design centre, precision etching and developing production line, chemical cleaning production line, scrubbing production line, high - power exposing machine, cnc drilling machine, suctioning silk screen machine, speedy press, vacuum multilayer press, chemistry sink copper and metal surface treating production line, punches, etc. import or domestic advanced equipment

    公司擁有cad設計中心，精密蝕刻、顯影生產線，化學清洗生產線，磨板生產線，大功率曝光機，數控鉆床，吸氣絲印機，快壓機，真空層壓機，化學沉銅及金屬表面處理生產線，沖床等進口或國產先進設備。
  9. In the third section, i. e. chapter five, the normal raman spectra of nil2, cul2, pdl2 powder are studied under the excitation of laser with the wavelength of 632. 8nm and aqueous silver colloid is prepared by pulsed laser ablation, from which the surface enhanced raman spectra of the three compounds are obtained. after preliminary assignment, the identical and different features of vibration of the compounds due to the different central metal atoms are analyzed

    第三部分，即論文的第五章，我們以632 . 8nln為激發波長研究了nilz 、 culz和pdl :三種新型金屬有機化合物粉末的正常拉曼光譜，並且以脈沖激光刻蝕法制備了水銀膠，以其為襯底研究了三種化合物溶液在其上的表面增強拉曼光譜，通過對其拉曼光譜進行了初步指認，了解由於中心原子的不同，三種金屬有機化合物分子振動的相同和區別。
  10. Shake the mirror type laser and hit the marking machine, walk posture laser type person who mark, gush out yards of machine, electricity corrode metal type person who mark, corrode metal play person who mark, laser carve the cutting machine, laser power deeply

    生產與銷售的產品系列有：電腐蝕打標機、激光打標機、噴碼機、氣動打標機，激光雕刻切割機、激光刻章機、電動刻字筆、激光電源等。
  11. The theory of ion - beam etching and ion sources are reviewed. the classification of ion - beam etching are introduced. according to the mechanism that ion sputtering leads to faceting, trenching, reflection and redeposition, some relative solutions are put forward

    綜合敘述了離子束刻蝕技術和離子源的工作原理，簡單介紹了離子束刻蝕的分類，闡述了離子束刻蝕的物理濺射效應導致的刻面，開槽，再沉積等現象的產生機理及解決辦法，分析了kaufman離子源進行ribe的可行性及出現的問題。
  12. Although the rigidity is 45hrc, toolox44 is easy to process, especially suitable for manufacturing plastic moulds with the help of its good polishing and etching performance. the other applications include rubber mould, forming mould, machine parts, and wearable parts

    盡管硬度? 45hrc toolox44很容易加工，特別適合製造塑料模具，因?它的拋光和蝕刻效果很好。其他應用領域包括：橡膠模具成型工具機器部件耐磨部件。
  13. The mechanism of the surface change has beenstudied by the xps, sem, contract anglemeasurements. we discuss the roles of the tree main fators playing in the fiber - resin adhesion, and their relation to plasma parameters. the three main factors ars the key mechanical effects, the chemical bonding effcts and nonpolar dispersion force

    表面粘接性能改善的原因是：由表面引入的多種含氧基團引起的化學鍵力和界面非極性分子色散力，由表面刻蝕坑引起的界面機械鉸鏈力。它們對界面的粘接強度的貢獻隨參數而改變。
  14. According to need of the high efficient character of laser resistor trimming machine, the theory of high efficiency is studied, and the implementation steps are given

    根據激光調阻機生產高效性的特點，研究了高速刻蝕電阻的原理及實現步驟。
  15. Excellent polishing performance ; good mechanical processing performance ; pre - hardened plastic mould steel ; suitable for chrome plating and etching ; good toughness

    非常好的拋光性好的機械加工性能預硬的塑料模具鋼適合鍍鉻和蝕刻好的韌性
  16. Guangzhou hongrui chem - etch company ltd., located guangzhou, near guangzhou baiyun international airport, is an up - and - coming facility in china providing precision photo - etched metal components to a vast array of market

    廣州洪瑞五金製品有限公司是一家以特種精密光化學蝕刻加工為主營業務的高科技公司。公司毗鄰美麗的廣州新白雲機場，座落於新機場高速太成出口和106國道附近，交通與物流運輸快捷、便利，滿足現代製造業對市場快速響應的需求。
  17. Guangzhou yitaiqi chem - etch company ltd., located guangzhou, near guangzhou baiyun international airport, is an up - and - coming facility in china providing precision photo - etched metal components to a vast array of market

    廣州伊泰奇精密五金有限公司是一家以特種精密光化學蝕刻加工為主營業務的高科技公司。公司毗鄰美麗的廣州新白雲機場，座落於新機場高速太成出口和106國道附近，交通與物流運輸快捷、便利，滿足現代製造業對市場快速響應的需求。
  18. Rf plasma system 9200 is a barrel - type batch stripping system with optional high temperature capabilities for photoresist removal, nitride etch, and other cleaning applications in semiconductor and mems fabs

    射頻等離子體9200是桶式爐脫模體，擁有可控制的高溫系統可去除光阻材料、氮化物蝕刻和半導體與微型機電系統等方面的清洗功能
  19. We give some useful analyses and the computer simulations for the ion etching process. compared with the atomic force microscope ( afm ) scanning photograph of the etching surface, the theoretical results prove that these simulation analyses assure the precision required by this problem, so these mathematical models are reasonable and correct. the analysis method in this paper is useful to analyze etching process, and it can also afford some valuable reference to etching technology

    在本論文我們主要利用這個數學模型，對使用離子束刻蝕製作單臺階光柵的臺階與溝槽部分的表面面形隨時間的演變過程分別進行了計算機模擬分析，並通過把理論結果與在實驗中得到的刻蝕表面在原子力顯微鏡（ afm ）下拍攝的照片進行比較，結果說明這種模擬分析能夠保證對該問題分析所要求的精度，從而也證明了理論模型的合理性和正確性。
  20. As an important step of microelectronic process, etching technology has gained much attention. it will play an important role in microfabrication such as new - made microeletronics mechanism ( mems ) and photoelectrics integration system

    刻蝕工藝不僅作為微電子工藝中的關鍵技術一直受到人們的關注，而且在新興的微機電系統，光電集成系統等微細加工中也將得到重要應用。
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