衍射掩模 的英文怎麼說

中文拼音 [yǎnshèyǎnmó]
衍射掩模 英文
diffracting mask
  • 衍 : [書面語]Ⅰ動詞（開展; 發揮） spread out; develop; amplifyⅡ形容詞（多餘） redundant; superfluousⅢ名...
  • 射 : Ⅰ動詞1 （用推力或彈力送出） shoot; fire 2 （液體受到壓力迅速擠出） discharge in a jet 3 （放出） ...
  • 掩 : 動詞1 （遮蓋; 掩蔽） cover; hide 2 （關; 合） shut; close 3 [方言] （被卡住） get squeezed [pinch...
  • 模 : 模名詞1. （模子） mould; pattern; matrix 2. （姓氏） a surname
  1. Fabrication of continuous relief mask for diffractive plane focus lens

    連續型平面衍射聚光透鏡掩模的製作
  2. The main parts are as follows : 1 ) at the base of the fabrication methods, the photosensitivity of optical fiber and the uv laser sources are introduced simply, the diffraction characteristics of phase mask are analyzed to get the distribution of refractive index in fiber grating, referent the paper [ 4 ] ( delivered )

    全文概括如下： 1 ）從常用的製作方法出發，簡單介紹了光纖光敏性和成柵光源，重點分析掩模板的衍射場，從而獲得理想情況下光纖光柵的折射率分佈函數，參考已投論文[ 4 ] 。
  3. Based on light interference, diffraction and optical holography theory, the paper comprehensively describes the basic principle, main types, development trend as well as the objective and significance for carrying out the research of laser maskless interferometric lithography and holographic lithography

    本論文基於光的干涉和衍射及光學全息照相理論，綜合評述了光學光刻的基本原理、主要類型、發展趨勢及開展激光無掩模干涉光刻和全息光刻研究的目的和意義。
  4. The basic idea behind opc is to intentionally and systematically distort the mask in such a way as to compensate for optical diffraction limit and process non - idealities

    其基本思想是有目的、有系統地通過對掩模形狀做預失真來補償由光學系統的衍射和工藝的非線性引起的失真。
  5. The diffraction efficiency of phase mask is discussed by using rigorous coupled - wave theory. the results are useful for fabrication of phase mask. and the diffraction efficiency of linearly chirped phase mask is discussed, it presents require of ion - beam etching

    利用嚴格耦合波理論對光纖光柵相位掩模的衍射效率問題進行了深入研究，以達到指導光纖光柵相位掩模實際製作的目的，並且研究了啁啾掩模的衍射效率問題，為線性啁啾光刻膠掩模的離子束刻蝕提出了要求。
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