載流子遷移率 的英文怎麼說

中文拼音 [zǎiliúziqiān]
載流子遷移率 英文
charge carrier mobility
  • : 載Ⅰ名詞(年) year : 一年半載 six to twelve months; six months to a year; 三年五載 three to five ...
  • : Ⅰ動1 (液體移動; 流動) flow 2 (移動不定) drift; move; wander 3 (流傳; 傳播) spread 4 (向壞...
  • : 子Ⅰ名詞1 (兒子) son 2 (人的通稱) person 3 (古代特指有學問的男人) ancient title of respect f...
  • : Ⅰ動詞1. (遷移) move 2. (轉變) change 3. (古時指調動官職) be appointed to a certain post Ⅱ名詞(姓氏) a surname
  • : Ⅰ動詞1. (移動) move; remove; shift 2. (改變; 變動) change; alter Ⅱ名詞(姓氏) a surname
  • : 率名詞(比值) rate; ratio; proportion
  • 遷移 : move; remove; migrate; shift; transport; migration; transference; removal
  1. The hetrojunction device fabricated with sige material has shown great advantages over bulk sample in many aspects : higher carrier mobility, larger transconductance, stronger drive capability and hence faster circuit speed

    與體si器件相比,採用sige材料的異質結器件已經在許多方面顯示出了強大的優勢:譬如更大的載流子遷移率,更大的跨導,更強的電驅動能力以及更快的電路速度等等。
  2. Strained - soi mosfet, which appears recently, takes both the advantages of soi ( silicon on insulator ) and sige ( silicon germanium ). it has shown advantages over bulk sample in enhanced carriers mobility, as well as higher transconductance, stronger drive capability and reduced parasitic capacitances. these properties make it a promising candidate for improving the performance of microelectronics devices

    Strained - soimosfet是最近幾年才出現的新型器件,它將soi材料和sige材料結合在一起,與傳統體硅器件相比,表現出載流子遷移率高、電驅動能力強、跨導大、寄生效應小等優勢,特別適用於高性能、高速度、低功耗超大規模集成電路。
  3. The filled skutterudite compounds attract aboard attention owing to their high mobilities and relatively large seebeck coefficients in the middle temperature range of 600 - 800k. but their thermal conductivities are very high, so the problem how to decrease their lattice thermal conductivities and improve their zt values becomes a research hotspot

    填充式skutterudite化合物由於在中溫領域( 600 800k )具有很高的載流子遷移率和較大的seebeck系數而引起人們的廣泛關注;但其熱導k較高,因而如何降低晶格熱導kl ,提高其熱電性能指數zt值已成為研究的熱點。
  4. The enhanced photoconductive effect from small amount of tnf facilitates the preparations of new organic photoconductive devices under the drive of low fields. in the fourth chapter, inclpc nanoparticles embedded in poly ( n - vinylcarbzaole ) ( pvk ) were prepared successfully by dissolving inclpc in aprotic organic solvent / lewis acid with great concentration for the formation of electron donor - acceptor complexes, i. e., the method of complexation - mediated solubilization. the fabricated inclpc nanoparticles were characterized by means of uv / vis absorption, x - ray diffraction pattern, and tem

    論文的最後一章中,我們合成了具有較好的電傳輸性能的化合物』一二苯基四竣酸花酚亞胺( ddp ) ;研究了其溶解性、熱穩定性、晶體結構、紅外光譜、紫外吸收光譜和蒸鍍薄膜的屬性,並用量化學計算方法模擬其單分的空間構型;載流子遷移率測試的結果約為ix10 「 、 m 』 v 」 』 ? s 「 』 。
  5. We represent a temperature model of surface carrier mobility of short channel most after thinking about kinds of dispersion effect

    在考慮了各種散射效應對的影響后,提出了短溝道most表面載流子遷移率的溫度模型。
  6. As the only one among nearly 200 polytypes of different crystalline sic, which has a cubic crystalline structure, p - sic is an excellent candidate for fabrication of high power devices because of its high values of saturated electron drift velocity and electron mobility in comparison with the other sic polytypes

    碳化硅是碳化硅近200種不同結晶形態中唯一的純立方結構晶體,載流子遷移率高,電飽和漂速度大,更適合於製造電器件特別是電力電器件之用。
  7. Measured results showed that the dl - a device with its structure as following ito / npb / alq / mg : ag was far more superior to sl device with the structure of ito / alq / mg : ag because the dl - a device better balanced energy band between each each layer and the mobility of carriers ( electrons and holes ), which led to the combination of carriers taking place in the bulk of emitter and avoided the excitons being eliminated by the electrodes which easily occurs in sl devices. as to the doped devices, measurements demonstrated an excellent device with its maximum brightness was 25000cd / m2

    研究結果表明, dl - a型雙層結構器件ito / npb / alq / mg : ag的各項性能指標明顯優于單層器件ito / alq / mg : ag ,因為前者有更好的載流子遷移率匹配以及能帶匹配,因此平衡了復合的數目,並且能將復合區有效控制在發光層內部,有效避免了表面的大量缺陷以及電極猝滅效應,提高了的復合效,從而提高了器件的發光性能。
  8. In this paper, the subband structure in the inversion layer is constructed by solving the self - consistent schr ? dinger equation, thus the carrier effective mass and scattering rate can be obtained. furthermore, taking account for the carrier density in each subband, we establish carrier mobility model in strained - si mosfet

    本文通過求解自洽薛定諤方程,確定了應變硅mosfet反型層的能帶結構,在此基礎上經進一步計算得到能帶內的有效質量和散射幾,綜合考慮各能帶上的的濃度分佈,建立了應變硅mosfet載流子遷移率的解析模型。
  9. We measured the samples " electrical properties ( square resistance, square carrier concentration, carrier mobility and hall coefficient ) at room temperature by hall measurement. the experimental results revealed that all the samples are p - type, with increasing the annealing temperature, the carrier mobility increased and the square carrier concentration decreased. these changes in electrical properties are explained by a decrease in the number of mn acceptors because of the forming of mnas phase and the resuming of lattice defects during annealing

    所有樣品均為p型導電類型;發現在650到850溫度范圍內,隨著退火溫度的升高,樣品的方塊濃度呈下降趨勢,而載流子遷移率呈上升趨勢;這是由於在退火過程中,隨著退火溫度的升高,有更多的mn參與mnas相的形成,使得以替位受主形式存在的mn減少,並且晶格缺陷得到恢復所致。
  10. However, the refractive index will increase with the increase of the flow ratio of sifu / nhs, slightly increase with the increase of substrate temperate, and decrease with the increase of rf power. by measuring the passivation results of hydrogen plasma and sinx thin film, we found an evident improvement of minor carrier lifetime in polycrystalline silicon after hydrogen plasma treatment, although it has little to do with the annealing temperature and time. the hydrogen contained in sinx thin film can enhance the carrier mobility of monocrystalline silicon, but after annealing at high temperature the mobility turns down

    通過測試氫等離體鈍化和氮化硅薄膜鈍化的效果,實驗還發現氫等離體處理對多晶硅材料的少壽命提高作用比較明顯,但是這種提高作用與處理溫度以浙江大學碩士學位論文王曉泉2003年5月及時間的關系不大;氨化硅薄膜中的氫對單晶硅的載流子遷移率提高有一定作用,但經過高溫處理后這種作用消失;氮化硅薄膜能提高單晶硅和多晶硅的少壽命,具有表面鈍化和體鈍化的雙重作用;氫等離體和氮化硅薄膜都能有效地提高單晶和多晶電池的短路電密度,進而使電池效有不同程度(絕對轉換效0
  11. Carrier will be capture by trap, the number of electric carrier will decrease. the trap hold back carrier to move from crystal to other crystal. it influences the electrical properties of tft

    陷阱在浮獲之前是電中性的,但是在俘獲之後就帶電了,在其周圍形成一個多勢區,阻擋從一個晶粒向另一個晶粒運動,導致載流子遷移率下降,導致tft的電學性能下降。
  12. Pure cdte films have high electrical resistivity and are slightly p - type, due to the formation of cd vacancies in the cdte lattice acting as acceptor centers. the sheet resistivity of films are about 1010 ? / ?. the sheet hole concentration is 105 - 6 / cm2 and the hall mobility is about hundreds cm2 / v. s. the structural and electrical properties of cdte films doped te are markedly different from pure cdte films

    ,面濃度約105 - 6 / cm2 ,載流子遷移率為幾百cm2 / v . s ;摻雜te元素后,薄膜衍射峰強增大,薄膜結構上出現了第二種相成分?六方結構的te ,由衍射峰強判斷該相比例較小,同時cdte薄膜的衍射峰向低角度偏,晶格< wp = 5 >常數增大。
  13. Secondly, we measured the electrical properties of the ion - implanted samples by hall method ( square carrier concentration, square resistance and carrier mobility ). after comparing and analyzing, we can know that the electrical properties were affected by the difference of mn dose, the implantation of c and the annealing temperature

    其次,利用霍爾測試方法測量了每種離注入樣品的電性質(方塊濃度、方塊電阻及載流子遷移率) ,通過比較分析了解到mn元素注入劑量、 c元素的注入以及退火溫度的不同,都會對樣品的電性質產生影響。
  14. Experimental results revealed that the carrier mobility increased with increasing of the annealing temperature, in the range of the annealing temperature from 650 ? to 850 ?, which implied that the crystal lattice structure was damaged by ion implantation and restored after annealing. furthermore, the square carrier concentration decreased, and the square resistance of the samples implanted by mn + and c increased with the raising of annealing temperature. these results indicated that the second phase such as mnga, mnas ferromagnets was formed by more mn + ions with increasing of the ( gaas ) annealing temperature, so the mn + ions which can provide carriers decreased

    由實驗結果可以知道在退火溫度為650 850范圍內,樣品的載流子遷移率隨著退火溫度的提高呈上升趨勢,說明雜質元素的注入對樣品造成晶格損傷,但退火對這些損傷具有修復作用;此外,隨著退火溫度的上升,樣品的方塊濃度不斷下降,加c樣品的方塊電阻不斷上升,這都是因為隨著退火溫度的提高,摻入的mn ~ +離不再提供,而是形成了mnga 、 mnas等磁性第二相。
  15. The conclusion is that under the neutron and 7 - ray synthetical irradiation environment of a reactor, ionization effects of neutron on the vlsi made with cmos technology are weak, and that the displacement effects of neutron induces the decreases of mobility ratio and density of charge carrier, which causes the decrease of the total static current, so it compensates the increase of the static current caused by the synthetical ionization effects of neutron and - ray

    對試驗結果綜合分析得出:在反應堆的綜合輻照環境下,中電離效應較弱,並且由於中效應引起載流子遷移率降低和濃度降低,使得總的靜態電下降,從而抵消中和射線綜合電離導致的靜態電增長。
  16. Both the theoretical simulation and experiment results show that the relationship between eff and eeff in strained - si is similar to the one in bulk si. the mobility reaches its maximum when eeff equals to 2 105v / cm

    理論分析和實驗結果表明,應變硅載流子遷移率與橫向電場eeff的函數關系與體硅材料類似,峰值所對應的eeff為2 105v / cm 。
  17. Many organic composition with conjugate structure can be used as oel materials. 8 - hydroxylquinoline aluminium ( alq3 ) is one of the best oel materials with good film - formation and thermal, excellent electron - transporting ability

    8 -羥基喹啉鋁( alq3 )是目前最有效的有機電致發光材料之一,具有良好的成膜性、較高的載流子遷移率以及較好的熱穩定性。
  18. When these organic materials meet each other they may form exciplex which introduce new spectral lines and reduce original ones. we compared the spectra of samples ito / tvk : tpb / alg3 / al and ito / pvk : tpb / mgf / alg3 / al. we found that the spectrum from exciplex is much reduced

    有機材料的載流子遷移率低,不可能實現碰撞離化,它的發光只能是和陰極射線管中的發光一樣,來源於從sioz加速出來的電對有機材料的直接碰撞。
  19. The recent development of organic electron transport materials are reviewed as well. several technologies for charge carrier mobility measurement are summarized and compared, and a series of basic principles for designing high - performance organic electron transport materials are suggested as well

    本章還重點綜述了有機電傳輸材料研究的最新進展,總結和比較了有機材料載流子遷移率的測試方法,並提出了設計高性能有機電傳輸材料的若干原則。
  20. Poly - crystallization silicon thin film transistor ( p - si tft ) addressing liquid crystal display has been currently the research and development focus in the field of flat panel displays, as it is most feasible approach to high resolution, high integration and low power consumption as a result of its high aperture ration. there are less number interface of the crystal grain, lower metal impurity and higher mobility in the electric current director, the milc p - si tft has been the research focus in the fields of amlcd, projection display, oled etc. there are vast dangling bonds and bug

    多晶硅薄膜晶體管( p - sitft )液晶顯示器可以實現高解析度、高集成度、同時有效降低顯示器的功耗,因而成為目前平板顯示領域主要研究方向;而以橫向晶化多晶硅為有源層的tft由於在導電方向有更少的晶界、更低的金屬雜質污染、更高的載流子遷移率而成為目前有源矩陣液晶顯示領域、投影顯示、 oled顯示等領域研究的熱點。
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