輝光等離子體 的英文怎麼說

中文拼音 [huīguāngděnglízitǐ]
輝光等離子體 英文
glow plasma
  • 輝 : Ⅰ名詞（閃耀的光彩） brightness; splendour; brilliance Ⅱ動詞（照耀） shine
  • 光 : Ⅰ名詞1 （照耀在物體上、使人能看見物體的一種物質） light; ray 2 （景物） scenery 3 （光彩; 榮譽） ...
  • 等 : Ⅰ量詞1 （等級） class; grade; rank 2 （種; 類） kind; sort; type Ⅱ形容詞（程度或數量上相同） equa...
  • 離 : Ⅰ動詞1 （離開） leave; part from; be away from; separate 2 （背離） go against 3 （缺少） dispens...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 體 : 體構詞成分。
  • 離子 : [物理學] ion
  1. Factors influencing disinfection efficacy of atmospheric pressure glow discharge plasma

    大氣壓輝光放電等離子體消毒效果影響因素
  2. Degradation of p - chloronitrobenzene in aqueous solution by contact glow discharge electrolysis

    接觸輝光放電等離子體降解水體中的對氯硝基苯
  3. In this thesis, a kind of reversible immobilization method based on the plasma - polymerized film ( ppf ) used for effective immobilization of active bio - molecules and easy reproduction of sensors is developed. the surface of quartz crystal microbalance ( qcm ) is firstly prepared with plasma - polymerized film of butyl amine by glow - charge technique and then covered with a negative - charged polyelectrolyte by self - assembling. through strong electrostatic attraction, antibodies ( antigens ) positive - charged are immobilized for the determination of antigens ( antibodies )

    本論文基於等離子體聚合膜，設計了一種既能固定生物活性物質又易於傳感器再生的可逆固定化方法，即採用輝光放電的等離子體沉積技術，先在石英晶體上沉積一層正丁胺等離子體聚合膜，再在膜上自組裝一層帶負電的聚電解質，用以靜電吸附固定抗體（抗原）測定抗原（抗體） 。
  4. In this paper, we focus on the following three topics : ( i ) density distribution of dusty plasma in the low - pressure collisionless positive column the radial density distributions of electron, ion and dust particle in the low - pressure collisionless positive column are investigated with a fluid theory and a self - consistent dust - charging model

    本文著重以下三個方面的研究： （ ）低氣壓無碰撞輝光放電正柱區塵埃等離子體密度徑向分佈本文採用流體模型和自洽的塵埃充電模型，研究了低氣壓無碰撞輝光放電正柱區的電子密度、離子密度和塵埃粒子密度的徑向分佈。
  5. In the thesis, most advanced, relative, foreign high - tech has been pursued. feasibility analysis has n ' t been carried out by synthesizing much relative knowledge such as electromagnetism theory, plasma technology, aerodynamics, electronic technology etc until the scheme is confirmed, that is, a uniform, one atmosphere, controllable, glow - charge surface plasma can be generated and flow can be accelerated by changing electric field

    本文追蹤目前國外最先進的技術，綜合電磁理論、等離子體技術、空氣動力學、電子技術等相關知識進行可行性分析，確定了研究方案，即利用電流體力學（ ehd ）方法在一個大氣壓下產生高效、均勻、可控的射頻輝光等離子體，同時，通過改變電場促使流動加速。
  6. The results of simulations are : i ) energies of the incident ions to the target are determined mainly by the voltage across the cathode sheath, with a majority of ions " energy vary around the sheath voltage ; ions nearly normally bombard the target ; ions mainly locate above the sputtering holes because of the influence of the magnetic field, and the incident ions mainly come from the region ; the ions undergo several collisions during transportation, but that do n ' t matter much

    主要模擬結果有： ? ）入射離子到達靶面時的能量主要受到了射頻輝光放電中陰極殼層西北工業大學碩士學位論文李陽平電壓的影響，大部分離子的入射能量在陰極殼層電壓值附近，離子濺射時接近於垂直入射;射頻輝光放電受到陰極磁場的影響，等離子體中的離子主要集中在靶面濺射坑的上方，且入射離子主要來自這個區域;入射離子在輸運過程中和背景氣體分子有少量的碰撞，但影響不太大。
  7. In this thesis, active flow control with plasma has been investigated. a uniform, controllable, glow - charge surface plasma under one atmosphere has been generated successfully. and flow velocity has been induced in still air. consequently a new method about active flow control is discovered

    本文主要進行了在一個大氣壓下應用等離子體實現主動流動控制的研究，成功地在一個大氣壓下產生了均勻可控的射頻輝光等離子體，採用電流體（ ehd ）技術在靜止的空氣中誘導了流場，開創了主動流動控制的一條新思路。
  8. In this thesis, the generator well be introduced in detail

    本文將詳細介紹成功研製的輝光等離子體發生器。
  9. The organic electroluminsecence devices : ito / tpd / alq3 / al were fabracated by reactive evaporating deposition and dc glow discharge plasma enhanced reactive evaporating ways. the effects of the organic film thickness on the electronic and optical property have been investigated

    使用真空蒸發沉積技術和直流輝光等離子體輔助反應蒸發沉積技術制備了四層結構的有機電致發光器件： ito / tpd / alq _ 3 / al ，對制得的器件進行了電學和光學性能的測試。
  10. And flow velocity can be induced in still air. consequently a new method about active flow control is discovered. flow visualization has shown that plasma between symmetric streamwise electrode strips ca n ' t induce flow velocity at the same phrase driving but can at multi - phrase driving, and asymmetric streamwise eledtrode strips can induce flow velocity both at the same phrase and at multi - phrase driving in still air

    本文的主要工作表現在以下幾個方面：一、成功研製了高效、經濟、可控的輝光等離子體發生器，利用自行研製的等離子體發生器一個大氣壓下產生了均勻可控的輝光等離子體，並進行了流動顯示實驗，採用ehd技術在靜止的空氣中誘導了流場，開創了主動流動控制一條新思路。
  11. In situ diagnosis of plasma environment for synthesizing diamond film was conducted by langmuir single probe and optical emission spectroscopy. the mechanism of diamond growth was investigated and the n - type diamond was deposited by glow plasma assisted chemical vapor deposition ( cvd )

    本文通過langmuir單探針和光發射譜對合成金剛石薄膜的等離子體環境進行了原位診斷；初步探討了金剛石薄膜生長的動力學過程；並採用輝光等離子體輔助化學氣相沉積（ cvd ）技術制備得到了n型金剛石薄膜。
  12. Such variations are found that due to applied magnetic field from the substrate. the aspect and brightness of the glow and the self - bias voltage for the target changes significantly

    實驗中觀察到，在外加磁場的作用下，等離子體放電的輝光的明亮程度及外貌和靶面自偏壓發生了明顯變化。
  13. The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate

    採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。
  14. By means of resistance and capacitance coupled negative feedback method to control the plasma discharge development process and prevent the transition from glow discharge to spark discharge in a pin - to - plate static air plasma generator, a stable alternative current atmospheric glow discharge is produced successfully

    在靜態大氣壓空氣針板等離子體發生器中，採用阻容耦合負反饋方法控制等離子體放電發展過程，成功地抑制了輝光放電向火花放電的過渡，產生了穩定的交流輝光放電。
  15. Plasma nitriding is an application way to metal surface and heating treatment based on the formed plasma by glow discharge. nitriding is a way of heating treatment, namely, metal accessory is put into activate nitrogen and the gas of low light pressure is ionized into energy electrons, high energy ions and high energy neutral atoms by the action of the electric field under a definite temperature and the time of the heat preservation

    等離子滲氮是利用輝光放電形成等離子體在金屬表面，熱處理方面的應用，滲氮是強化金屬表面的一種熱處理方法，是將金屬零件置於活性氮的介質中，在一定溫度和保溫時間下，低光壓氣體在電場作用下使之電離產生能電子、高能離子和高能中性原子。
  16. So we applied low temperature techniques to manufacture the sense film of qcm sensors. at low temperature and low pressure, with n - butylamine as the carbon source material, and with dry hydrogen as the carrying gas, we applied r. f. glow discharge plasma to preparation the working film for the qcm sensors

    在「實驗與分析」一章中較為詳細地闡述了採用等離子體化學氣相淀積的方法，以正丁胺作為碳源物質，通過射頻輝光放電在低溫低壓條件下制得了正丁胺等離子體淀積膜。
  17. The degradation of nitrobenzene, p - chloronitrobenzene and chloroanilines in aqueous solution were investigated by means of contact glow discharge electrolysis

    利用接觸輝光放電等離子體對水體中有機污染物氯代苯胺、硝基苯、對氯硝基苯等進行了降解。
  18. The plasma technique is well used to treat with the surface of macromolecule material, less to treat with the surface of organic coating

    為了對塗膜表面進行有目的的改性，低溫低壓的條件下採用射頻輝光放電的氫氣等離子體處理三乙醇胺塗膜表面。
  19. Furthermore, the plasma optical emission spectra ( oes ) of the ionization of the working gases were analyzed in situ using a pr - 650 spectroscope

    此外，本文使用pr ? 650光譜光度計，對p室的等離子體輝光光譜（ oes ）進行了在線監測。
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