輝光放射 的英文怎麼說

中文拼音 [huīguāngfàngshè]
輝光放射 英文
airglow emission
  • 輝 : Ⅰ名詞（閃耀的光彩） brightness; splendour; brilliance Ⅱ動詞（照耀） shine
  • 光 : Ⅰ名詞1 （照耀在物體上、使人能看見物體的一種物質） light; ray 2 （景物） scenery 3 （光彩; 榮譽） ...
  • 放 : releaseset freelet go
  • 射 : Ⅰ動詞1 （用推力或彈力送出） shoot; fire 2 （液體受到壓力迅速擠出） discharge in a jet 3 （放出） ...
  • 放射 : radiate; emit; blas; radiation; emission; shooting; shedding; abjection; emanation; effluence
  1. If the effulgence of a thousand suns simultaneously were to blaze forth in the firmament ; then that might be comparable with the effulgence of the ultimate personalities universal form

    假如天空中有一千個太陽同時放射光芒，或許才可以和至尊人格神宇宙形象的輝煌燦爛相媲美。
  2. Yesterday, thank you for your care and cherishing and the friendship bridge between us has been set up. today we sincerely hope get your more support and help. pengfei will emit effulgent rays of light and carry forward the spirit of new epoch continrorsly

    昨天承您的關心和愛護，在我們之間架起了友誼的金橋，今天，我們更熱忱地將得到您的支持與幫助，鵬飛將放射出光輝燦爛的光芒，發揚新時代的精神。
  3. Surface chemical analysis - glow discharge optical emission spectrometry gd - ose - introduction to use

    表面化學分析-輝光放電發射光譜方法通則
  4. Surface chemical analysis - glow discharge optical emission spectrometry gd - oes - introduction to use

    表面化學分析.輝光放電發射光譜.使用介紹
  5. Gd - oes. surface chemical analysis - glow discharge optical emission spectrometry gd - oes - introduction to use

    表面化學分析.輝光放電發射光譜測定法
  6. This type of long persistent phosphor has the advantages of innocuity, no radioactivity, high luminescence, long duration and no need of electricity, so it can be regarded as high efficiency solid display material

    它無毒、無放射性、亮度高、余輝時間長、不消耗電能，是一種高效節能的固體發光顯示材料。
  7. Deposition of zno films on thick diamond films

    射頻輝光放電自偏壓對類金剛石碳膜結構和性能的影響
  8. Analysis of cast iron by glow - discharge atomic emission spectrometry

    輝光放電原子發射光譜法快速分析生鑄鐵
  9. The results of simulations are : i ) energies of the incident ions to the target are determined mainly by the voltage across the cathode sheath, with a majority of ions " energy vary around the sheath voltage ; ions nearly normally bombard the target ; ions mainly locate above the sputtering holes because of the influence of the magnetic field, and the incident ions mainly come from the region ; the ions undergo several collisions during transportation, but that do n ' t matter much

    主要模擬結果有： ? ）入射離子到達靶面時的能量主要受到了射頻輝光放電中陰極殼層西北工業大學碩士學位論文李陽平電壓的影響，大部分離子的入射能量在陰極殼層電壓值附近，離子濺射時接近於垂直入射;射頻輝光放電受到陰極磁場的影響，等離子體中的離子主要集中在靶面濺射坑的上方，且入射離子主要來自這個區域;入射離子在輸運過程中和背景氣體分子有少量的碰撞，但影響不太大。
  10. This sort of membrane has excellent physics and chemical properties. farther studies indicates that this film is a kind of hydrogenated carbon films containing amino groups, it posses the network configuration of diamond - like carbon, the amino - group is in the networks

    通過紅外光譜分析，結合其物理性能和化學傳感特性，對射頻輝光放電制備的正丁胺淀積薄膜的化學組成與微觀結構做了初步分析和研究。
  11. ( iii ) dust charging and levitation in cathode sheath of glow discharges with energetic electron beam. the dust charging and levitation in a collisionless cathode sheath of dc glow discharges with energetic electron beams released from a plane cathode are investigated with a self - consistent theoretic model

    （ ）塵埃粒子在極板有高能電子束發射輝光放電鞘層中的充電與懸浮採用自洽的鞘層模型和塵埃粒子充電模型，我們研究了在極板有高能電子束發射輝光放電鞘層中塵埃粒子的充電與懸浮。
  12. Based on the theory of glow discharge, the angle distribution of electron and the recombination process are simulated by adopting monte carlo method. the doping process of n - type diamond film is investigated by this method for the first time. the results indicate : 1 ) the scattering angle of electrons near the substrate is mainly lange - angle, which is helpful to grow diamond film over a large area when glow discharge is kept ; 2 ) after considering the recombination process, the number of particles distribution is provided

    主要結果如下： （ 1 ）研究了電子在雪崩碰撞和分解電離后的角分佈情況，結果表明基片附近電子的散射以大角散射為主，在維持輝光放電的條件下，較高的偏壓和工作氣壓對金剛石的橫向連續成膜是有益的； （ 2 ）考慮了低溫合成金剛石薄膜過程中電子與各種碎片粒子的復合過程，給出了不同的復合系數情況下的粒子數分佈，結果顯示各種碎片粒子的分佈隨復合系數的變化會出現粒子數分佈的漲落現象。
  13. No matter how different the discharge scheme is, low pressure discharge plasmas take a common characteristic of bright glow and is generally entitled as low temperature glow discharge. glow discharge plasma has been selected as a most suitable system for plasma diagnostics in laboratory and for application technology development because of its good stability and reproducibility

    利用n _ 2輝光放電中n _ 2 ~ +的發射光譜研究了放電空間的溫度分佈的變化規律，發現了直流放電的一些重要特性，如阻礙輝光與正常輝光的光譜差別。
  14. The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate

    採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。
  15. Therefore, the diagnostics of electrical and optical characteristic of plasma form the basic respects of plasma diagnostics. the author reports in detail in the dissertation the experimental investigation on the phenomena of some common discharge systems at typical operation status such as dc glow ; rf ( radio frequency ) glow and microwave ecr ( electron cyclotron resonance ) discharge

    創新之處： （ 1 ）提出了雙原子分子轉動分辨發射光譜的擬合方法，並利用擬合方法進行了氮氣直流輝光放電產生的第一負帶轉動分辨光譜和磁控濺射沉積cnx膜過程中cn基團的振動帶的轉動線型擬合，獲得了相應的轉動溫度。
  16. So we applied low temperature techniques to manufacture the sense film of qcm sensors. at low temperature and low pressure, with n - butylamine as the carbon source material, and with dry hydrogen as the carrying gas, we applied r. f. glow discharge plasma to preparation the working film for the qcm sensors

    在「實驗與分析」一章中較為詳細地闡述了採用等離子體化學氣相淀積的方法，以正丁胺作為碳源物質，通過射頻輝光放電在低溫低壓條件下制得了正丁胺等離子體淀積膜。
  17. The main results of this article are : ( 1 ) the software that is to simulate the transportation of ions in rf glow discharge, in which a simple method to determine the original states of the ions ( original velocities and positions ) is recommended

    本論文的主要結果有： （ 1 ）編寫了射頻輝光放電過程中入射離子的輸運模擬程序，並提出了一種簡單的決定離子初始狀態（位置、速度）的方法。
  18. The main purpose of this article - is to simulate the whole process of the generation and transportation of the vapor phase particles of the film in rf magnetron sputtering, which contains transportation of ions in rf glow discharge, sputtering of target and transportation of sputtered atoms, via models that are established on the basis of the physics of sheath theory for the rf magnetron glow discharge, sputtering theory and transportation theory

    本論文對射頻磁控濺射中入射離子的產生和輸運、離子對靶材的濺射、濺射原子的輸運過程進行了綜合考慮，根據射頻輝光放電的陰極殼層理論、粒子的輸運理論、離子對靶材的濺射理論建立模型，進行了計算機模擬。
  19. Discharge conditions at which depth profile analysis of tinplate had good depth resolution were selected by researching spectrometric behaviors of tinplate at different discharge conditions

    摘要通過研究不同放電條件下鍍錫鋼板的光譜行為，確定了具有較好深度解析度的放電條件，建立了鍍錫鋼板的輝光放電發射光譜定量深度分析方法。
  20. The plasma technique is well used to treat with the surface of macromolecule material, less to treat with the surface of organic coating

    為了對塗膜表面進行有目的的改性，低溫低壓的條件下採用射頻輝光放電的氫氣等離子體處理三乙醇胺塗膜表面。
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