輝光電流 的英文怎麼說

中文拼音 [huīguāngdiànliú]
輝光電流 英文
glow current
  • 輝 : Ⅰ名詞（閃耀的光彩） brightness; splendour; brilliance Ⅱ動詞（照耀） shine
  • 光 : Ⅰ名詞1 （照耀在物體上、使人能看見物體的一種物質） light; ray 2 （景物） scenery 3 （光彩; 榮譽） ...
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 流 : Ⅰ動1 （液體移動; 流動） flow 2 （移動不定） drift; move; wander 3 （流傳; 傳播） spread 4 （向壞...
  • 電流 : current; galvanic current; electric current; electricity; current flow電流保護裝置 current protec...
  1. In this paper, we focus on the following three topics : ( i ) density distribution of dusty plasma in the low - pressure collisionless positive column the radial density distributions of electron, ion and dust particle in the low - pressure collisionless positive column are investigated with a fluid theory and a self - consistent dust - charging model

    本文著重以下三個方面的研究： （ ）低氣壓無碰撞輝光放電正柱區塵埃等離子體密度徑向分佈本文採用流體模型和自洽的塵埃充電模型，研究了低氣壓無碰撞輝光放電正柱區的電子密度、離子密度和塵埃粒子密度的徑向分佈。
  2. Basic function : single - side five blue light bulbs, electronic ballast ; led display timer, display total time and treatment time. lifting mobile pedestal, light treatment head can rotate with 30 、 60 、 90 angle

    基本配置：單面五支藍光燈管，電子鎮流器啟輝；計時器led顯示；可顯示累計時間；可顯示治療時間；升降移動式底座；光療頭可與水平方向成30 、 60 、 90轉動。
  3. In the thesis, most advanced, relative, foreign high - tech has been pursued. feasibility analysis has n ' t been carried out by synthesizing much relative knowledge such as electromagnetism theory, plasma technology, aerodynamics, electronic technology etc until the scheme is confirmed, that is, a uniform, one atmosphere, controllable, glow - charge surface plasma can be generated and flow can be accelerated by changing electric field

    本文追蹤目前國外最先進的技術，綜合電磁理論、等離子體技術、空氣動力學、電子技術等相關知識進行可行性分析，確定了研究方案，即利用電流體力學（ ehd ）方法在一個大氣壓下產生高效、均勻、可控的射頻輝光等離子體，同時，通過改變電場促使流動加速。
  4. In this thesis, active flow control with plasma has been investigated. a uniform, controllable, glow - charge surface plasma under one atmosphere has been generated successfully. and flow velocity has been induced in still air. consequently a new method about active flow control is discovered

    本文主要進行了在一個大氣壓下應用等離子體實現主動流動控制的研究，成功地在一個大氣壓下產生了均勻可控的射頻輝光等離子體，採用電流體（ ehd ）技術在靜止的空氣中誘導了流場，開創了主動流動控制的一條新思路。
  5. The results show that as the voltage rises, the tubes ’ discharge mechanism changes from glow discharge to arc discharge, the current rises suddenly and the voltage drops a lot

    結果表明，隨著電壓的升高，六硼化鑭放電管的放電機理由輝光放電轉變為弧光放電，放電電流突然迅速升高，管壓降大幅下降。
  6. The organic electroluminsecence devices : ito / tpd / alq3 / al were fabracated by reactive evaporating deposition and dc glow discharge plasma enhanced reactive evaporating ways. the effects of the organic film thickness on the electronic and optical property have been investigated

    使用真空蒸發沉積技術和直流輝光等離子體輔助反應蒸發沉積技術制備了四層結構的有機電致發光器件： ito / tpd / alq _ 3 / al ，對制得的器件進行了電學和光學性能的測試。
  7. No matter how different the discharge scheme is, low pressure discharge plasmas take a common characteristic of bright glow and is generally entitled as low temperature glow discharge. glow discharge plasma has been selected as a most suitable system for plasma diagnostics in laboratory and for application technology development because of its good stability and reproducibility

    利用n _ 2輝光放電中n _ 2 ~ +的發射光譜研究了放電空間的溫度分佈的變化規律，發現了直流放電的一些重要特性，如阻礙輝光與正常輝光的光譜差別。
  8. The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate

    採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。
  9. By means of resistance and capacitance coupled negative feedback method to control the plasma discharge development process and prevent the transition from glow discharge to spark discharge in a pin - to - plate static air plasma generator, a stable alternative current atmospheric glow discharge is produced successfully

    在靜態大氣壓空氣針板等離子體發生器中，採用阻容耦合負反饋方法控制等離子體放電發展過程，成功地抑制了輝光放電向火花放電的過渡，產生了穩定的交流輝光放電。
  10. A faint glow enveloping the high - field electrode in a corona discharge, often accompanied by streamers directed toward the low - field electrode

    電暈在電暈放電中在高壓電極出現的一種微弱光輝，常伴隨有朝向低壓電極的電流
  11. Therefore, the diagnostics of electrical and optical characteristic of plasma form the basic respects of plasma diagnostics. the author reports in detail in the dissertation the experimental investigation on the phenomena of some common discharge systems at typical operation status such as dc glow ; rf ( radio frequency ) glow and microwave ecr ( electron cyclotron resonance ) discharge

    創新之處： （ 1 ）提出了雙原子分子轉動分辨發射光譜的擬合方法，並利用擬合方法進行了氮氣直流輝光放電產生的第一負帶轉動分辨光譜和磁控濺射沉積cnx膜過程中cn基團的振動帶的轉動線型擬合，獲得了相應的轉動溫度。
  12. The normal glow discharge between the main electrodes and the rapid flow of the unpolluted gas mixtures are necessary conditions for the output of high average power for tea co2 laser

    主電極間正常的輝光放電以及使混合氣快速流動且不被污染是重復頻率teaco _ 2激光器實現高平均功率輸出的重要條件。
  13. New resources and new investment in the latest computer aided design and engineering facilities, in statistical process control and many other leading edge disciplines ? are ensuring that for aston martin, the future is every bit as bright as its illustrious past

    投資利用最先進的電腦輔助設計和製造設施，統計流程式控制制和其他最尖端領域的技術保證阿斯頓馬丁的未來就像輝煌的過去一樣充滿光明。
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