透析膜片 的英文怎麼說
中文拼音 [tòuxīmópiān]
透析膜片
英文
dialysing flat film-
The results indicate that ( a ) before heat treatment, with the increasing of substrate temperatures, content of lower valency ( tij + ) decreases, the stoichiometric proportion of o / ti in all samples is about 2 ; the films have amorphous incompact columnar fiber structure, and with the increasing of substrate temperature, the size of columnar fiber increases ; the films have good hyalescence in visible range and great absorbability at the wavelength of 350nm ; optical constants of the films are calculated from the transmittance spectrums in visible range by mathematical analysis of the orders of interference, the results show that the refractive ind
研究結果表明， （ a ）熱處理前，隨著基片溫度的增加，薄膜中的低價氧化鈦含量逐漸減少，化學計量比趨于o ti = 2 ；薄膜具有非晶態不緻密的柱狀纖維結構，柱狀纖維的尺寸隨基片溫度的升高而增加;薄膜在可見光范圍內透明，在波長為35onzn時嚴重吸收，利用干涉級次法分析了薄膜的光學常數，結果表明，薄膜的折射率隨基片溫度的升高而增加，根據計算結果得到了tioz薄膜在不同基片溫度下的折射率色散曲線。For xrd, ellipsometry examinations, single - side - polished si ( lll ) wafers were used as substrates and for resistance measurement, glass was used and for infrared examination, double - side - polished si ( lll ) wafers were used and for ultraviolet - visible spectrophotometry, double - side - polished quartz wafers were used and for tem micrograph and electron diffraction pattern observation, cu nets deposited by formvar film were used. the cu - mgf2 cermet films were from 50 to 600nm thick
用於xrd分析、橢偏測量的單拋si （ 111 ）晶片和電阻測試的載玻片上淀積膜厚約為600nm ；用於ir測試的雙拋si （ 111 ）晶片和uv測試的石英玻璃片上淀積膜厚約為250nm ；用於透射電鏡分析的樣品則淀積在400目銅網上的支撐formvar膜上，膜厚約為50 100nm 。The expression vector pse380 - / iy / was constructed and transformed into e. coli dh5a, expressing hyl gene by adding iptg into the broth. the expression of hyl gene showed a 120kda protein band on sds - page gel and was found to have capability to degrade ha molecules derived from a microorganism dissolved in 0. 1 m acetate buffer solution ( ph4. 0 )
經轉化大腸桿菌dh5a和iptg誘導表達後用sds - page電泳分析，獲得一條約120kda的表達條帶； iptg誘導表達后提取原生質膜測定透明質酸分解酶活力，表明該hyl片段的產物能夠在體外分解細菌來源的ha 。採用兩種策略滅活hyl基因。In order to make clear the effects of fe3o4 on composite film structure, the thickness, porosity, average and maximum pore size, pore size distribution of different films are measured. surface morphology is studied by scan electronics microscope ( sem ). the characterizing results of film micro - morphology showed that pore structure of fe3o4 / pvdf composite film were better than those of pvdf host film
為進一步分析fe3o4的原位生成對復合膜結構的影響，測定了pvdf基膜和復合膜的膜厚；採用干濕膜重法測試了膜樣品的孔隙率；採用泡點壓力法流體滲透法相結合，對比測試了膜樣品的最大孔徑、孔徑分佈及平均孔徑；通過掃描電子顯微鏡（ sem ）照片分析，對比研究了pvdf基體膜和fe3o4 / pvdf復合膜的表面形貌。Using the microwave selective heating property for materials, by setup equivalent equation, and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd, three temperature distribution modes were established, including temperature distribution comprehensive mode of inhomogeneous plasma, temperature distribution composite mode of composite substrate materials, temperature distribution perturbation mode of composite materials, which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate. and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter. as an important part, this thesis researched the nucleation and growth of diamond films in mpcvd, systematically researched the effects of substrate pretreatment, methane concentration, deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd, characterized the films qualities in laser raman spectra ( raman ), x - ray diffraction ( xrd ), scanning electron microscopy ( sem ), infrared transmission spectra ( ir ), atomic force microscopy ( afm ), determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system
該系統可通過沉積參數的精確控制，以控制沉積過程，減少金剛石膜生長過程中的缺陷，並採用光纖光譜儀檢測分析等離子體的可見光光譜以監測微波等離體化學氣相沉積過程；利用微波對材料的選擇加熱特性，通過構造等效方程，並首次將電磁場攝動理論引入到mpcvd的基片加熱材料的設計中，建立了非均勻等離子體溫度場綜合模型、復合介質基片材料的復合溫度場模型及復合介質材料溫度場攝動模型，為mpcvd的基片加熱系統設計提供了一條全新的技術路線以指導基片加熱材料的制備，並對基片加熱材料進行了設計和優選，以獲取大面積均勻的溫度場區，甚至獲得大於基片臺尺寸的均勻溫度區；作為研究重點之一，開展了微波等離體化學氣相沉積金剛石的成核與生長研究，系統地研究了在（ 100 ）單晶硅基片上mpcvd沉積金剛石膜的實驗過程中，基片預處理、甲烷濃度、沉積氣壓、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響，分別用raman光譜、 x射線衍射（ xrd ） 、掃描電鏡（ sem ） 、紅外透射光譜（ ir ） 、原子力顯微鏡（ afm ）對薄膜進行了表徵，確立了該系統上mpcvd金剛石膜的最佳的實驗工藝參數。Sio2 optical anti - reflective thin films with micropores were prepared with esam method. the optical properties of pdda / sio2 complex films against the changes in temperature in the processof heat treatment were studied. after heat treated at 520 c, the light transmittance at certain wavelengths of the thin improved greatly. the chemical bond structures of the optical thin films was studied with ft - ir, and surface analysis of the thin films was carried out using xps and their anti - scratching performances were studied
用esam法制備了sio _ 2多孔光學增透薄膜，研究了pdda sio _ 2納米復合薄膜在熱處理過程中光學性能隨溫度的變化規律，發現520熱處理后一定波長下的光透過率大大增強；用ft - ir研究了熱處理后的薄膜的組成，用xps進行了表面分析，研究了薄膜的耐機械擦傷強度，發現1 ~ #薄膜的耐機械擦傷強度較小，甚至小於相應的pdda sio _ 2納米復合薄膜的耐機械擦傷強度，而2 ~ #薄膜的耐機械擦傷強度則大大增強，即使用刀片平刮也只略有損傷。In addition, whether and how the bl receptor photl regulate ca2 + - channels in the pm has not been investigated. in present study we aimed to identify ca2 + channels involved in bl signaling cascade. the patch clamp technique was applied to record the channels on the hypocotyl protoplasma of wild type and photoreceptor mutant of arabidopsis thaliana
採用膜片鉗技術在擬南芥下胚軸原生質體質膜上記錄並鑒定到一種超極化激活的鈣離子通透性通道，對其特性分析發現photl - 5突變體與野生型擬南芥的質膜鈣離子通透性通道電流有顯著差異，該差異可能是二者對胞外鈣表現不同反應的原因。Study on metabolism of estrogen tablet in postmenopausal women with end stage renal failure receiving perttoneal dialysis
戊酸雌二醇片在腎功能衰竭腹膜透析絕經婦女體內的代謝研究分享友人