通氣掃描 的英文怎麼說

中文拼音 [tōngqìsǎomiáo]
通氣掃描 英文
ventilation scan
  • 通 : 通量詞（用於動作）
  • 氣 : Ⅰ名詞1 （氣體） gas 2 （空氣） air 3 （氣息） breath 4 （自然界冷熱陰晴等現象） weather 5 （氣味...
  • 掃 : 掃構詞成分。
  • 描 : 動詞1. （照底樣畫） copy; depict; trace 2. （在原來顏色淡或需改正之處重復塗抹） retouch; touch up
  1. In this thesis, the oxygen sensitive materials and glucose sensitive materials had been developed by thermo - polymerization method including carrier covalence method and carrier covalence - cross linking method, and the properties had been investigated using the detection experiment of oxygen and spectrophotometer, at the mean time, the applications of oxygen sensitive materials in fiber optical gaseous oxygen sensor and fiber optical dis solved oxygen sensor, and that of biology sensitive materials in fiber optical dextrose sensor had been studied in this paper. major content of this work includes five aspects as follows : ( 1 ). oxygen sensitive materials had been prepared by carrier covalence method, and the preparation mechanism of the materials had been investigated by fi - ir, sem, and the detection experiment of oxygen

    本論文主要包括以下五個方面的內容： （ 1 ）載體共價法制備氧敏感材料：通過紅外光譜、掃描電鏡圖譜和氧測試實驗探討該氧敏感材料的制備機理，通過氧測試實驗評價該氧敏感材料的氧敏感性和穩定性，同時研究了各種因素對該氧敏感材料性能的影響（ 2 ）載體共價?交聯法制備氧敏感材料：通過紅外光譜、掃描電鏡圖譜和氧測試實驗探討該氧敏感材料的制備機理，通過氧測試實驗和分光光度計評價該氧敏感材料的氧敏感性和穩定性，同時研究了各種因素對該氧敏感材料性能的影響（ 3 ）氧敏感材料在光纖氣態氧傳感器中的應用：該傳感器的響應時間為10s ，檢測下限為5ppm ，檢測精度為0 . 5 ，具有較好的重復性和穩定性，遲滯較小，使用壽命至少為1年，適合各種環境下氣態氧濃度的檢測。
  2. The wind field retrieval data are obtained by plied muscat technique to transact the rude radial velocity data which were observed by dual - doppler radar volume scans

    該資料是用雙多普勒天氣雷達同步立體掃描數據，通過muscat技術，反演出風場。
  3. Firstly, the tio2 thin films are deposited by dc reactive magnetron sputtering apparatus, and characterlized by n & k analyzer1200, x - ray diffraction spectroscopy ( xrd ), scanning electronic microscopy ( sem ), alpha - step500. and it was analyzed that the effect on performance and structure of films with the change of argon flow, total gas pressure, the substrate - to - target distance and temperature

    第一、應用穩定的直流磁控濺射設備制備tio2減反射薄膜並通過n & kanalyzer1200薄膜光學分析儀、 x射線衍射分析（ xrd ） 、掃描電子顯微鏡（ sem ） 、 alpha - step500型臺階儀等儀器對薄膜進行表徵，分析氧分壓、總氣壓、工作溫度、靶基距等制備工藝參數對薄膜性能結構的影響。
  4. The primary theory of absorption and desorption was also explained. the effects of primary process parameters, such as hydrogen pressure, time and temperature on the magnetic properties of ndfeb have been researched. the structure and magnetic properties have been analyzed by means of optical metallographic microscopy, scanning electronic microscopy, x - ray diffraction analysis, infrared oxygen detector and magnetic properties measurement

    本文設計了燒結ndfeb的氫爆制粉設備，對設備調試以及使用過程中出現的主要問題進行了簡要的說明，提出了一系列解決方法；闡述了吸氫、脫氫的基本原理；研究了氫氣壓力、通氫時間、氫爆溫度等基本工藝參數對磁性能的影響；利用金相顯微鏡和掃描電子顯微鏡， x射線衍射分析，紅外線測氧分析及綜合磁性測量儀等手段分析了材料的組織結構和磁性能。
  5. Current researches, applications, preparation and structure of si3n4 are summarized in this paper. a new conclusion is drawn that silicon wafer can react with nitrogen at the temperature higher than 1100 and in super - pure nitrogen by direct - nitridation of silicon at the temperature from 800 to 1200. the prepared silicon nitride samples are tested by xps ( x - ray photoelectron spectroscopy ), sem ( scanning electron microscopy ), optical microscopy, xrd ( x - ray diffraction ) and edx ( energy dispersive x - ray analysis )

    通過矽片在800到1200各個溫度和各種氮氣氣氛下的氮化處理的實驗結果，報道了不同與其他研究者的氮化條件，矽片在氮氣保護的熱處理中的氮化條件為：高於1100的溫度和高純氮的氣氛條件，同時對該氮化硅薄膜進行了金相顯微鏡、掃描電鏡（ sem ） 、 x射線衍射儀（ xrd ） 、 x射線光電子譜（ xps ） 、 x射線能譜儀（ edx ）和抗氧化性等測試和分析。
  6. Interrelation study on pulmonary angiogram and radionuclide imaging in patients with pulmonary embolism

    通氣掃描在肺栓塞診斷價值相關性研究
  7. Using the microwave selective heating property for materials, by setup equivalent equation, and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd, three temperature distribution modes were established, including temperature distribution comprehensive mode of inhomogeneous plasma, temperature distribution composite mode of composite substrate materials, temperature distribution perturbation mode of composite materials, which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate. and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter. as an important part, this thesis researched the nucleation and growth of diamond films in mpcvd, systematically researched the effects of substrate pretreatment, methane concentration, deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd, characterized the films qualities in laser raman spectra ( raman ), x - ray diffraction ( xrd ), scanning electron microscopy ( sem ), infrared transmission spectra ( ir ), atomic force microscopy ( afm ), determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system

    該系統可通過沉積參數的精確控制，以控制沉積過程，減少金剛石膜生長過程中的缺陷，並採用光纖光譜儀檢測分析等離子體的可見光光譜以監測微波等離體化學氣相沉積過程；利用微波對材料的選擇加熱特性，通過構造等效方程，並首次將電磁場攝動理論引入到mpcvd的基片加熱材料的設計中，建立了非均勻等離子體溫度場綜合模型、復合介質基片材料的復合溫度場模型及復合介質材料溫度場攝動模型，為mpcvd的基片加熱系統設計提供了一條全新的技術路線以指導基片加熱材料的制備，並對基片加熱材料進行了設計和優選，以獲取大面積均勻的溫度場區，甚至獲得大於基片臺尺寸的均勻溫度區；作為研究重點之一，開展了微波等離體化學氣相沉積金剛石的成核與生長研究，系統地研究了在（ 100 ）單晶硅基片上mpcvd沉積金剛石膜的實驗過程中，基片預處理、甲烷濃度、沉積氣壓、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響，分別用raman光譜、 x射線衍射（ xrd ） 、掃描電鏡（ sem ） 、紅外透射光譜（ ir ） 、原子力顯微鏡（ afm ）對薄膜進行了表徵，確立了該系統上mpcvd金剛石膜的最佳的實驗工藝參數。
  8. The relationship between sputtering conditions and the depositional speed shows : with working pressure 1. 2 pa, sputtering power 180w, the depositional speed of tio2 thin film is 40nm / h, and increases with the increasing of sputtering power. it can be also founded that the depositional speed is nearly proportional to the working pressure : within the range of 0. 3pa to 1. 6pa, the depositional speed increases linearly with the increase of ar pressure. with the enhancement of the substrate ' s temperature of sputtering or annealing, the resulted thin films show a tendency of decreasing in thickness, and increasing in refractivity

    本實驗是採用磁控濺射方法，在不同的溫度下制備了tio _ 2薄膜，並對薄膜進行了不同溫度和時間的退火處理，通過原子力顯微鏡（ afm ） 、 x射線衍射（ xrd ） 、掃描電鏡（ sem ）等檢測手段對薄膜的表面形貌和組成結構進行了分析，結果如下： （ 1 ）濺射工藝條件與薄膜沉積速度的關系表明：採用1 . 2pa工作氣壓， 180w的射頻功率tio _ 2薄膜的沉積速率為40nm h ，並隨射頻功率的增加而提高，呈近似的線性關系，在0 . 3pa 1 . 6pa氣壓范圍中，氬氣壓強升高沉積速率迅速增加，濺射溫度提高和退火處理能使薄膜的厚度減小和折射率提高。
  9. The optimal parameters of making high silicon content aluminum alloys is : spray height is 220 - 230mm, spray angle is 30 ? the scanning velocity of atomizer is 30mm / s, the original offset of the substrate is 30mm, rotation velocity of the substrate is 120rpm, spray gas pressure is l. ompa, the diameter of the delivery tube is 3. 6mm, the drawing velocity of the substrate will be adjusted on - line with a plc on the basis of the spray

    通過對多層噴射沉積原理及工藝參數的研究，得出制備al - 22si - 3cu - 1mg合金的最佳工藝參數為：噴射高度為220mm - 230mm ，基底轉速為120rpm ，霧化器掃描速度為30mm / s ，基底下降轉速依據噴射情況由智能控制器進行實時調整，噴射角度為30 ，初始偏心距為30mm ，導流管直徑為3 . 6mm ，霧化氣壓為1 . 0mpa 。
  10. This research is aim at putting forwarding laser wavelength scanning interference testing method. processing and analyzing instantly - read interference pattern corresponding with continuous varying wavelength, the method overcomes the following disadvantage. for example, the longer referenced and measuring optical circuit in big - scale high - accuracy asphere testing, and the sensitive interferential system to the disturb, such as the oscillation of worklable, dithering of air, and so on

    研究的目的主要是針對大型高精度非球面面形檢測中干涉儀的參考光路和測量光路較長，干涉系統對工作臺振動和空氣抖動等外界干擾因素的影響敏感，干涉圖不穩定等問題，提出了激光波長掃描干涉測試方法，該方法通過對瞬間讀取的、與連續變化波長對應的干涉圖的處理和分析，克服了上述缺點，為大型高精度非球面的檢測提供了一種適用的方法。
  11. The paper studies mainly a new kind of measure method of aspheric surface - laser wavelength - scanning interference testing. this research is aimed at putting forwarding laser wavelength scanning interference testing method. processing and analyzing instantly - read interference pattern corresponding with continuous varying wavelength, the method overcomes the following disadvantage : the longer referenced and measuring optical circuit in big - scale high - accuracy asphere testing and the sensitive interferential system to the disturb, such as the oscillation of worktable, dithering of air, and so on

    研究的主要目的是針對在大型高精度非球面面形檢測中干涉儀的參考光路和測量光路較長，干涉系統對工作臺振動和空氣抖動等外界干擾因素的影響敏感，干涉圖不穩定等問題，提出了激光波長掃描干涉測試方法，該方法通過對瞬間讀取的、與連續變化波長對應的干涉圖的處理和分析，克服了上述缺點，為大型高精度非球面的檢測提供了一種適用的方法。
  12. In chapter three, the mechanism responsible for scanning probe field - induced oxidation in ambient air is attributed to an electrochemical process, i. e., anodic oxidation or anodization, after the analyses is given of a surface of a sample exposed to air. the effects of biases, tip speeds on morphology of field - induced oxidation, are introduced and deduced in the form of kinetics formula of oxidation growth

    第三章首先通過分析大氣環境下掃描探針場致氧化加工的基本特性，得出掃描探針場致氧化的加工機理為電化學陽極氧化反應；引進大氣狀態下場致氧化的動力學方程，推導出偏置電壓與場致氧化物的幾何形態兩者之間的關系、掃描探針移動速度與場致氧化物的幾何形態兩者之間的關系。
  13. In this paper, the growth technology is presented for epitaxial silicon carbide films on sapphire with a buffer layer by atmospheric - pressure chemical vapor deposition ( apcvd ) process. the effect of temperature and precursors flow rates on the growth of silicon carbide films by chemical vapor deposition is analyzed. the structural properties of the films grown on sapphire compound substrate are studied by x - ray diffraction ( xrd ), x - ray photospectroscopy ( xps ) and photoluminescence spectroscopy

    本論文提出了在藍寶石上引入一層緩沖層材料形成復合襯底，採用常壓化學氣相淀積（ apcvd ）方法在其上異質外延生長sic薄膜的技術，分析了cvd法生長sic的物理化學過程，通過實驗提出sic薄膜生長的工藝條件，並通過x射線衍射（ xrd ） 、 x射線光電子能譜（ xps ） 、光致發光譜（ pl譜）和掃描電鏡（ sem ）對外延薄膜的結構性質進行分析。
分享友人
分享到 Line

分享到臉書