電刻蝕器 的英文怎麼說
中文拼音 [diànkèshíqì]
電刻蝕器
英文
electric etcher-
At present, feas have potential for use as an electron source in a wide variety of applications, including microwave power amplifiers ( such as twts, klystron ), flat panel displays, electron microscopy, and electron beam lithography
目前，場致發射陣列陰極的應用領域十分廣泛，主要包括微波器件（應用於twts ， klystron等） 、平板顯示器（ feds ） 、電子顯微鏡及電子束刻蝕系統等。其中，應用研究的焦點主要集中在平板顯示器和射頻功率放大器。A driving signal with a dc bias voltage and ac voltage is usually necessary for sensing very small capacitance. the reliable operation conditions of the capacitive sensor for foreign acceleration had been researched with the assumption of the parallel comb plates. but the comb plates are actually not parallel for the reason of the drie process
前人在研究外界加速度信號對傳感器的作用時，假定驅動信號產生的靜電力作用在平行梳齒電容極板上，但是，在用drie工藝對硅進行刻蝕時會產生側蝕效應，從而得到的梳齒電容有一定的傾斜角度。The accelerometer which has simple fabricated process and high sensitivity and small parasitic capacitance and residual stress is hybrid integrated with the interface circuit using ic nude chip. so the density of the package is increased, and the noise of the sensing system is decreased. these found the base of capacitive accelerometer module using the mcm method
該傳感器製作工藝簡單，靈敏度高，支撐梁採用u型，減小了刻蝕后的殘余應力，用玻璃作為襯底，減小了襯底和硅可動質量塊間的寄生電容，且把傳感器晶元和用ic裸片製作的介面電路集成在一起，提高了封裝密度，減小了傳感器系統的噪聲，為採用mcm技術製作電容式加速度傳感器模塊打下了基礎。A different approach, named " two step growth approach " has been applied to fabricate an 8x8 photodiode array in the first time. the micro - processing procedures of this photodiode array including standard photolithography, a number of metallisation, wet - chemical etching and sic2 deposition for insulation were developed in this study
首次採用「兩步法」制備出了新穎的8 8zns肖特基光電二極體陣列，詳細研究並確定了制備該器件的標準光刻、金屬沉積、濕化學腐蝕、 sio _ 2絕緣層沉積等一系列微電子處理工藝。It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography
在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造，高分辨、大面積光柵和網格製造，在抗蝕劑性能測試、面形測量和計量等領域，干涉光刻技術都具有廣闊的應用前景。Inductively coupled plasma etching technology and its application in optoelectronic devices fabrication
刻蝕技術及其在光電子器件製作中的應用In the manufacture of semiconductor devices, a photographically reduced representation of a circuit or element as used to establish an etching pattern
在半導體器件製造中，以縮小的照相方式表示的電路或元件，用於建立刻蝕圖案。Topics on computer interface control technologies are discussed in detail, together with hardware design on control circuit, interpolation algorithm, and control software. all of our efforts are concentrated in one purpose - to establish a cnc system suitable for excimer laser micro fabrication. based on computer local bus tech.,
本文針對由反應式步進電機驅動的微加工工作臺控制和準分子激光器外觸發控制特點，就計算機介面控制技術、硬體控制電路設計、插補演算法求解、控制軟體實現以及準分子激光微刻蝕加工過程進行了較詳細的討論。分享友人