電子束工藝 的英文怎麼說

中文拼音 [diànzishùgōngyì]
電子束工藝 英文
electron beam technology
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 束 : Ⅰ動詞1 （捆; 系） bind; tie 2 （控制; 約束）control; restrain Ⅱ量詞（用於捆在一起的東西） bundle;...
  • 工 : Ⅰ名詞1 （工人和工人階級） worker; workman; the working class 2 （工作; 生產勞動） work; labour 3 ...
  • 藝 : Ⅰ名詞1 （技能; 技術） skill 2 （藝術） art 3 [書面語] （準則） norm; standard; criterion4 [書面語...
  • 電子 : [物理學] [電學] electron
  1. Among the many remarkable final projects that have been proposed and presented at the end of the course have been a renaissance hourglass blown in the mit glass shop and set into a frame turned on our set shop lathe ; a four harness loom built by a student who then wove cloth on it ; a number of chain mail tunics and coifs ; a wide variety of costume and furniture pieces and electrified period lighting fixtures

    在以往的課程中，學生們構想並於期末展示出了很多優秀的作品，比如一個文藝復興時期的沙漏，它是學生在麻省理工學院的玻璃工作坊吹制、並在我們布景工作坊的車床上成形的；一臺由學生製作的四綜紡織機，製作者真正用它來織布；許多鎖子甲束腰外衣和頭巾；各式各樣的服飾、傢俱和電氣化時代的照明設備。
  2. Process specification for electron beam welding

    電子束焊接工藝規范
  3. By vacuum - electron - beam weld of ti3al and tc11 the technology of hot die forging, and then use different heat treatments, study the influence law of the different degree of deform, different heat treatments to the microstructure and properties

    採用熱模鍛技術，通過對tac - 1b 、 tc11進行不同程度的變形、真空電子束焊接，然後採用不同的熱處理工藝，研究熱加工工藝對合金組織，性能的影響規律。
  4. Therefore, in this paper, two directional solidification methods, czochralski method and electron - beam floating zone melting method, were used to obtain such material. the directional solidifition microstructures of si - tasi2 system was performed using neophot - 1, amray - 100b sem and jem - 2000cx tem analysis technique

    本文採用切克拉斯基法（ cz法）和電子束區熔法（ ebfzm ）兩種定向凝固方法制備該共晶自生復合材料；藉助金相技術、電鏡技術、圖象處理技術等多種分析測試手段，考察了si - tasi _ 2共晶定向凝固組織和及其相應的工藝規范。
  5. The results of the experiments show that the ti3al - tcll dual alloys, by vacuum - electron - beam weld, hot die forging and 680c / 12h, ac, heat treatments, have satisfied synthesis properties of intensity, plasticity, hardness. and also it is the feasiblie way. this will establish the supporting technology for the manufacture of the compress disk in the areoengine

    實驗結果表明，經真空電子束焊接ti _ 3al ? tc11雙合金經過熱模鍛造和680 12h ， ac或815 1h + 700 8h ， ac熱處理后，焊接區組織過渡均勻，可以使得焊縫處強度在室溫拉伸時高於ti _ 3al ，而在600拉伸時高於tc11合金，獲得強度、塑性、硬度均令人滿意的綜合性能，且是一條可行的工藝路線。
  6. This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide, after that, using eb - lithography and dry etching to fabricate photonic crystal holes, so can reduce the fabrication cost by a big range ; designed the moulding board, which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully, then an successful eb - lithography is realized on the structure, the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment, which grounded etching sacrificial layer by photonic crystal holes in next step

    提出採用紫外光刻工藝製作傳統波導結構之後，通過電子束曝光和干法刻蝕製作光子晶體小孔的工藝方案，大幅度減低了製作成本；設計出可形成空氣橋結構、並且適用於電子束曝光位置識別的光刻模板，在soi材料上成功製作出帶有空氣橋刻蝕預留槽以及接續光波導的結構，在該結構上成功實現了光子晶體帶隙波導的電子束曝光，帶隙波導與接續光波導位置接續良好；最後利用預留槽進行了刻蝕犧牲層的實驗，為下一步利用光子晶體小孔刻蝕犧牲層形成空氣橋結構打下了基礎。
  7. Ito substrate with an smooth surface of 0. 2nm rms roughness measured by afm was obtained by the developed pre - cleaning processing procedure. mbe growth of znsxse1 - x thin films on ito coated glass substrates were carried out using zns and se sources. the xrd 9 / 29 spectra resulted from these films indicated that the as - grown polycrystalline znsxse1 - x thin films had a preferred orientation along the ( 111 ) planes

    採用分子束外延技術在ito導電玻璃上低溫沉積了zns _ xse _ （ 1 - x ）多晶薄膜，詳細研究了薄膜制備的工藝參數，在最佳沉積條件下，制備獲得了晶型為立方閃鋅礦，並具有（ 111 ）面高度定向生長結構的柱狀zns _ xse _ （ 1 - x ）多晶薄膜，其rms表面粗糙度最小可達1 . 2nm 。
  8. By studying and using conventional 1c process in combination with electron beam lithography ( ebl ), reactive ion etching ( rie ) and lift - off process, several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires, si quantum dots, double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes

    研究利用常規的硅集成電路工藝技術結合電子束光刻，反應離子刻蝕和剝離等技術制備半導體和金屬納米結構，很好地解決了普通光刻與電子束光刻的匹配問題，提高了加工效率，經過多次的工藝實驗，摸索出一套制備納米結構的工藝方法，首次用電子束光刻，反應離子刻蝕和剝離等技術制備出了多種納米結構（硅量子線、量子點，雙量子點和三叉指狀的金屬柵結構） 。
  9. It is proved by the intensity experiment of welding line that the welds of these two materials using explosive welding and vacuum electron beam self - material brazing are tolerable, nevertheless the welding technique could be improved basing on the study of microstructure of the joint layer

    通過強度實驗的研究，兩種工藝形成的焊縫強度都是可以滿足目前的應用要求的，但是，對電子束自釬焊可根據顯微研究的結果做進一步的工藝參數的改進。
  10. Tungsten oxide and nickel oxide films were prepared by electron beam evaporation method, and the effect of annealing techniques of the electrochromic properties of these films was discussed

    本論文利用電子束蒸發方法制備氧化鎢、氧化鎳薄膜的基礎上，研究了熱處理工藝對于薄膜電致變色性能的影響。
  11. Electron beam process and laser beam process for material treatment ; terms for processes and equipment

    材料處理用電子束工藝及激光工藝.工藝和設備的術語
  12. Problems of track planning and process planning for electron beam welding are studied deeply and systematically in this paper

    本論文以汽車鋁合金薄板零件的電子束焊裝過程的軌跡規劃與工藝規劃為主要研究內容，對其進行了較為深入系統的研究。
  13. Abstract : in the paper, the operation technology of electron beam evaporation plating aluminium - chromium alloy coating is studied the optimum technology is obtained by discussing the influence of votage, current on auter appearance, adhesion inner stress. the ingredients of coation and evaporation materials are analyzed, the results show that the chromium contents of coating are very different from that of evaporation materials, in the end, the corrosion - resistance of the coating consisting of different chromium contents is investigated

    文摘:本文研究了電子束蒸發鍍鋁-鉻合金塗層的制備工藝，通過討論不同的電壓、束流對膜層外觀、結合力、內應力的影響，確定了合適的陳鍍工藝，對塗層和膜料的成分進行了分析，表明塗層中鉻含量與膜料中鉻含量有較大差異，最後探討了不同含鉻量的塗層的耐蝕性。
  14. In this paper, an ingot of niobium - niobium silicide based in - situ composites ( rmics ) was prepared by arc melting process, and nb - nb3si / nb5si3 in - situ composites with a uniformly orientated microstructure were produced in a high temperature gradient directional solidification apparatus named electron beam floating zone melting ( ebfzm ). the relationships between the processing parameters and the characteristics of the solidified microstructure have been investigated. the influence of the microstructure on the mechanical properties has been revealed and the rupture mechanism at room temperature has been discussed

    本文採用真空電弧自耗熔煉法制備了鈮?硅基rmics材料的母合金錠，並採用電子束區熔（ ebfzm ）高溫度梯度定向凝固裝置制備了定向效果良好的nb - nb _ 3si nb _ 5si _ 3共晶自生復合材料，並對其定向凝固工藝參數和組織之間的對應規律、組織特性進行了研究，探討了凝固組織對室溫力學性能的影響及其斷裂機制。
  15. It is namely that the substrate temperature is about 250, the deposit rate must be slower than 10 a / s and the film thickness must be selected according to the optical and electronic needs of the films

    通過極差法確定了在電子束蒸發制備條件下得到的最佳光電性能的azo薄膜的工藝條件是：基片溫度在250左右、沉積速率不大於10a s 。
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