電子束裝置 的英文怎麼說

中文拼音 [diànzishùzhuāngzhì]
電子束裝置 英文
electron beam device
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 束 : Ⅰ動詞1 （捆; 系） bind; tie 2 （控制; 約束）control; restrain Ⅱ量詞（用於捆在一起的東西） bundle;...
  • 裝 : Ⅰ名詞1 （服裝） dress; outfit; attire; clothing 2 （演員的化裝品） stage makeup and costume Ⅱ動詞...
  • 置 : 動詞1. （擱; 放） place; put; lay 2. （設立; 布置） set up; establish; arrange; fix up 3. （購置） buy; purchase
  • 電子 : [物理學] [電學] electron
  • 裝置 : 1 （機器設備的配件）installation; device; apparatus; equipment; arrangement; gear; appliance; rig...
  1. Vector scan electron beam system

    矢量掃描電子束裝置
  2. The experimental results show : the flattop phenomenon on the diode voltage pulse was very apparent for using the carbon fiber cathode, that is to say, the pulse duration of the diode voltage was widened ; moreover, under the condition of the same power of microwave, the pulse duration of the out - put microwave was prolonged by about 30 % ; the peak power of the microwave was enhanced by 3db

    通過在裝置上做的兩種陰極的對比實驗，結果顯示:碳纖維陰極的使用，改善了電子束質量，使輻射微波的脈寬增加了30 %以上，輻射主瓣方向上的功率密度提高了3db以上，頻譜分佈較純凈，實現了微波的高效輸出。
  3. Consider a beam of electrons impinging upon a double slit apparatus.

    設有一束電子射向一個雙縫裝置。
  4. Part 2 analyses beam landing shifts made by thermal deformations of a shadow mask and vibration of a new type of shadow mask - aperture grille. an automatic measurement system for cpt decolorization and a vibration measurement system for aperture grille are established. part 3 analyses the difference of perception and discrimination to color between the human eyes and ccd system, and develops a new method based on ccd technology to evaluate the screen white - balance

    主要內容分為三部分： （ 1 ）分析著屏電子束分佈與電子槍、偏轉系統及蔭罩之間的關系，研製自動測試裝置，為設計和改進相關結構提供依據； （ 2 ）分析蔭罩熱變形和振動對顯示屏色純度影響，建立了色純漂移自動測試裝置和張緊式蔭罩振動測試系統； （ 3 ）分析了人眼與ccd對彩色刺激的不同響應，建立了基於ccd的顯示器全屏色純均勻性測試方法。
  5. Calculation of protection dose at the labyrinthine outlet of electron beam irradiation apparatus

    電子束輻照裝置迷路出口處的防護劑量計算
  6. Based on the technical development and creation of electronic jacquard machine, new mechanical device is developed and applied to electronic jacquard machine and restraint design is used to simplify the determination of its shedding motion parameters to make the electronic jacquard shedding motion more accurate and easy

    摘要電子提花機的發展和應用體現在機構傳動和電氣技術兩個方面，經過電子提花機發展的技術積累和創新，研發了新結構的電子提花機，並利用約束設計思想來簡化對提花機開口裝置參數的計算，從而使電子提花機的開口設計便捷而準確。
  7. The paper mainly focused on the beam transport part of asipp key laboratory of ion beam bioengineering and it ' s component elements, for example, van de graff accelerator, bending magnet, magnetic quadruple lenses, beam shutter, collimator and so on. the laboratory has performed the milestone achievement that is beam passed the hole of lo ^ m diameter in experiments. many experimental results are discussed by theories according to experiments

    本文重點討論了中科院離子束生物工程學重點實驗室單粒子束裝置的束流傳輸部分，對主要部件進行了詳細的討論，如：靜電加速器、偏轉磁鐵、磁四極透鏡、束線開關、瞄準器等，實驗中已取得束流穿過10 m小孔的標志性成果，並運用相關理論結合具體實驗分析了實驗結果。
  8. Variable shaped electron beam exposure system

    可變電子束曝光裝置
  9. In order to obtain the tolerance requirement for the magnetic field homogeneity of the solenoids in electron cooling device, the source of the magnetic imperfection and its influence on the transverse temperature of electron beam were investigated by means of numerical simulation, and taking the space charge effect of electron beam into account

    摘要分析了直螺線管磁場缺陷的來源，考慮了電子束的空間電荷作用，採用數值方法模擬計算了磁場缺陷對電子束橫向溫度的影響，獲得了電子冷卻裝置中直螺線管磁場的均勻性要求。
  10. Practice for dosimetry in an electron - beam facility for radiation processing at energies between 300 kev and 25 mev

    能量在300kev和25mev之間的輻射處理用電子束裝置的劑量測定操作規程
  11. Guide for dosimetry in an electron beam facility for radiation processing at energies between 300kev and 25mev

    能量為300kev 25mev電子束輻射加工裝置劑量學導則
  12. In this paper, an ingot of niobium - niobium silicide based in - situ composites ( rmics ) was prepared by arc melting process, and nb - nb3si / nb5si3 in - situ composites with a uniformly orientated microstructure were produced in a high temperature gradient directional solidification apparatus named electron beam floating zone melting ( ebfzm ). the relationships between the processing parameters and the characteristics of the solidified microstructure have been investigated. the influence of the microstructure on the mechanical properties has been revealed and the rupture mechanism at room temperature has been discussed

    本文採用真空電弧自耗熔煉法制備了鈮?硅基rmics材料的母合金錠，並採用電子束區熔（ ebfzm ）高溫度梯度定向凝固裝置制備了定向效果良好的nb - nb _ 3si nb _ 5si _ 3共晶自生復合材料，並對其定向凝固工藝參數和組織之間的對應規律、組織特性進行了研究，探討了凝固組織對室溫力學性能的影響及其斷裂機制。
  13. A device for converting heterogeneous beam of radiation ( elec tromagnetic or particulate ) to homogeneous beam by absorption or refraction of unwanted components

    利用吸收或折射掉不需要的成分，把非單色光束（電磁的或粒子的）變成單色光束的裝置。
  14. The main topics in this thesis are as following : presenting details of the microbeam facility, mc 2000, microscope stage, venus - 1 language, modeling on the control program based on the requirements analysis, the control structure and flow chart, the main frame for the integrated program, utilizing acti vex control to implement serial communication between the computer and mc 2000, seamless integration between vb application and matlab, probing into some factors that may influence the controlling precision and providing some methods to solve them

    與此同時，對實驗過程中產生的一系列實驗數據進行必要的分析，為進一步進行離子束生物工程中的誘變方向性問題和估計低劑量電離輻射的生物體效應研究提供理論依據。作者承擔了微束裝置計算機控制系統的設計工作，完成了asipp微束裝置計算機控制系統的系統設計、主程序以及樣本架控制模塊的設計；提出並實現了提高裝置通量的相關優化策略等。
  15. The fast control power supply ( fcps ) of the tokamak is a dc supply with huge capacity to provide rapid magnetic field constraint to the plasma

    在托克馬克裝置中對等離子體進行磁約束的快控電源裝置是一個大容量直流電源。
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