電離氣體流 的英文怎麼說

中文拼音 [diànlíqìtǐliú]
電離氣體流 英文
ionized flow
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 離 : Ⅰ動詞1 （離開） leave; part from; be away from; separate 2 （背離） go against 3 （缺少） dispens...
  • 氣 : Ⅰ名詞1 （氣體） gas 2 （空氣） air 3 （氣息） breath 4 （自然界冷熱陰晴等現象） weather 5 （氣味...
  • 體 : 體構詞成分。
  • 流 : Ⅰ動1 （液體移動; 流動） flow 2 （移動不定） drift; move; wander 3 （流傳; 傳播） spread 4 （向壞...
  • 氣體 : gas; gaseous fluid
  1. In this paper, we focus on the following three topics : ( i ) density distribution of dusty plasma in the low - pressure collisionless positive column the radial density distributions of electron, ion and dust particle in the low - pressure collisionless positive column are investigated with a fluid theory and a self - consistent dust - charging model

    本文著重以下三個方面的研究： （ ）低氣壓無碰撞輝光放電正柱區塵埃等離子體密度徑向分佈本文採用流體模型和自洽的塵埃充電模型，研究了低氣壓無碰撞輝光放電正柱區的電子密度、離子密度和塵埃粒子密度的徑向分佈。
  2. Fluids for electrotechnical applications. gassing of insulating liquids under electrical stress and ionization

    電工裝置用流體.在電介質應力和電離作用下絕緣液體的氣體處理
  3. ( 2 ) the process of dc discharge in o2 / n2 mixtures with the different n2 concentration has been simulated. the dependences of number of collisions with the e / n and the energy of electron are given. it is analyzed stressfully that the process of electron - molecule collision with the e / n and the energy of electron in air at atmospheric pressure

    對于o _ 2 n _ 2混合氣體，模擬了不同配比條件下直流放電過程，得出了發生碰撞的粒子數隨e n 、電子能量的變化；著重分析了空氣中激發、電離、分解及分解電離碰撞的粒子數隨e n的變化，給出了電子漂移速度和平均電子能量隨e n的變化。
  4. In the thesis, most advanced, relative, foreign high - tech has been pursued. feasibility analysis has n ' t been carried out by synthesizing much relative knowledge such as electromagnetism theory, plasma technology, aerodynamics, electronic technology etc until the scheme is confirmed, that is, a uniform, one atmosphere, controllable, glow - charge surface plasma can be generated and flow can be accelerated by changing electric field

    本文追蹤目前國外最先進的技術，綜合電磁理論、等離子體技術、空氣動力學、電子技術等相關知識進行可行性分析，確定了研究方案，即利用電流體力學（ ehd ）方法在一個大氣壓下產生高效、均勻、可控的射頻輝光等離子體，同時，通過改變電場促使流動加速。
  5. In euv and soft x - ray band, the most often used detector is ion chamber with rare gas, from whose collective electrode we can directly calculate intensity of photon flux

    在極紫外和軟x射線波段常用的探測器是稀有氣體電離室，可以通過電離室收集極的收集電流直接計算出光子流強度。
  6. Then these separated interferograms can be recorded by ccd camera the experiments with the multi - frame interferometer was carried out on a small gas - puff z - pinch device with 23 kv working voltage and 210 ka peak current and about 2 risetime, and good results were obtained

    該套干涉儀在小型噴氣式z箍縮裝置上進行了實驗， z裝置的工作電壓23kv 、峰值電流210ka 、電流上升時間約2 。根據干涉圖條紋的移動數，可以計算出等離子體的電子密度和運動速度。
  7. With a careful theoretical analysis various physical parameters such as the gas density, temperature, and pressure, and the ultraviolet and ionizing radiation fluxes can be derived.

    通過仔細的理論分析，可以推導出如氣體密度、溫度和壓力等各種物理參量，以及紫外輻射和電離輻射的流量。
  8. Various flow mechanisms and interactions between electromagnetic field and high temperature ionized gas were covered in the fluid dynamic and electromagnetic equations, and various impact reactions were taken into account in the chemical dynamics model

    流體力學方程組和電磁場方程考慮了多種流動機理及電磁場與高溫電離氣體的相互作用，化學動力學模型考慮了各種碰撞反應。
  9. In this thesis, we have mainly studied the characteristics of chf3, c6h6 and cf4 electron cyclotron resonance ( ecr ) plasma using langmuir probe and optical emission spectroscopy ( oes ). the relative concentration of different radicals in chf3 plasma and the effect of chf3 / c6h6 ratio on bond configuration of a - c : f films were discussed. it was showed that h, f, c2 were the main radicals among radicals of h, f, c2, ch and f2 in chf3 ecr plasma

    重點研究了chf _ 3 、 cf _ 4和chf _ 3 c _ 6h _ 6放電等離子體中基團的分佈；分析了不同基團的相對密度隨宏觀放電條件（微波輸入功率、放電氣壓、源氣體流量比）的變化規律；探討了等離子體中各種基團的生成途徑；在不同源氣體流量比的條件下沉積了a - c ： f薄膜並通過傅立葉變化紅外吸收光譜（ ftir ）的測量得到了薄膜中鍵結構的信息；分析了a - c ： f薄膜的沉積速率及其鍵結構與等離子體空間基團分佈狀態之間的關聯。
  10. The study of the interaction of magnetic fields and electrically conducting liquids or gases, such as molten metal or plasma

    磁流體動力學對磁場和導電的液體或氣體，諸如熔化的金屬或者等離子區之間的相互作用的研究
  11. In this thesis, active flow control with plasma has been investigated. a uniform, controllable, glow - charge surface plasma under one atmosphere has been generated successfully. and flow velocity has been induced in still air. consequently a new method about active flow control is discovered

    本文主要進行了在一個大氣壓下應用等離子體實現主動流動控制的研究，成功地在一個大氣壓下產生了均勻可控的射頻輝光等離子體，採用電流體（ ehd ）技術在靜止的空氣中誘導了流場，開創了主動流動控制的一條新思路。
  12. The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate

    採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。
  13. By means of resistance and capacitance coupled negative feedback method to control the plasma discharge development process and prevent the transition from glow discharge to spark discharge in a pin - to - plate static air plasma generator, a stable alternative current atmospheric glow discharge is produced successfully

    在靜態大氣壓空氣針板等離子體發生器中，採用阻容耦合負反饋方法控制等離子體放電發展過程，成功地抑制了輝光放電向火花放電的過渡，產生了穩定的交流輝光放電。
  14. Numerical analysis of influence of penning gas composition on discharge characteristics in ac plasma display panel

    潘寧氣體組成對交流等離子體顯示器放電特性影響的數值分析
  15. To the cabin which is designed by the forth department chongqing communication college, the model which includes the air in the cabin, generator set and public muffler is built integer, meshed, and added by boundary condition and load. the normal k - model etc are used to be turbulence model of the air in cabin respectively, the turbulence model is calculated by simplef or simplen algorithm, and by the first order accurate msu or the second order accurate supg in advection discretization scheme

    論文對艙內空氣、發電機組和公用消聲器進行了整體建模和網格劃分，施加機組艙模型的邊界條件和載荷，採用標準k -等多個模型來分別模擬機組艙通風散熱的空氣湍流流動，採用simplef和simplen兩種不同的數值演算法以及一階msu和二階supg的對流項分離方案來對流動模型進行運算。
  16. In this paper, the electromagnetic problems of the passive feedback coils that restrain the vertical displacement of plasma in fusion device is discussed and the induced currents on the passive feedback coils, the eddy currents magnetic field and the electrical parameters of coils are also analyzed

    本文研究了聚變裝置中用於抑制等離子體垂直位移的被動反饋線圈電磁問題，分析了被動反饋線圈感應電流分佈、渦流磁場及線圈電氣參數等問題。
  17. Isobaric identification with gf - tof method is based on the different time of flight caused by the different energy loss. the resolution of gf - tof is mainly affected by two factors. first, the rises time of current pulse from start and stop detector

    Gf - tof方法對同量異位素的分辨取決于e的不同而產生的時間不同，時間分辨僅來源於定時探測器電流脈沖上升時間的快慢和離子在氣體介質中的能量離散。
  18. Abstract : this paper describes the thermal effects of a coaxial rf - excitedco2 laser ， based on the balance equations of electron density and energy ， current continuity equation ， and heat conduction equation. depende ncies of the spatial distributions of gas temperature on some discharge parameters arediscussed

    文摘:通過求解放電等離子體中的帶電粒子密度和能量的平衡方程、電流連續性方程以及熱傳導方程，研究了同軸射頻（ rf ）激勵co2激光器中放電混合氣體的溫度效應，分析了有關放電參數對溫度分佈的影響。
  19. Standard test method for available cyanide with ligand displacement and flow injection analysis utilizing gas diffusion separation and amperometric detection

    用氣體擴散分離和電流計探測法對有效氰化物進行配位位移和流量注入分析的標準試驗方法
  20. We combined the cvd technique with the pecvd technique by adding a dc or rf electric field to the reacting region of cvd device, and improved the inputting method of reaction gases, then had executed a diamond film growth system. the advantages of our system are : ( 1 ) reaction power, which can enhance the density of the plasma in the reacting region, is supplied with the heat filament and the dc electric field, or with the heat filament and the rf electric field both of them can be controlled precisely and they are complementary to each other

    將熱絲cvd技術與pecvd技術相結合，在薄膜的成核和生長階段分別給反應區再施加一個直流和射頻電場，同時改進反應氣體的進氣方式，製成具有下列兩大特點的金剛石薄膜生長系統： （ 1 ）反應功率由熱絲和直流電場或熱絲和射頻電場共同提供，兩者互相補充，可精確控制，大大提高了反應區的等離子體密度； （ 2 ）能精確控制反應氣體的分佈、流量及流速。
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